GB1295465A - - Google Patents

Info

Publication number
GB1295465A
GB1295465A GB1295465DA GB1295465A GB 1295465 A GB1295465 A GB 1295465A GB 1295465D A GB1295465D A GB 1295465DA GB 1295465 A GB1295465 A GB 1295465A
Authority
GB
United Kingdom
Prior art keywords
electrode
ion beam
extractor
beam apparatus
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1295465A publication Critical patent/GB1295465A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
GB1295465D 1969-11-11 1969-11-11 Expired GB1295465A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB5503969 1969-11-11

Publications (1)

Publication Number Publication Date
GB1295465A true GB1295465A (fr) 1972-11-08

Family

ID=10472776

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1295465D Expired GB1295465A (fr) 1969-11-11 1969-11-11

Country Status (1)

Country Link
GB (1) GB1295465A (fr)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5296122A (en) * 1989-03-29 1994-03-22 Teruaki Katsube Apparatus for forming thin film
US5741404A (en) * 1996-05-24 1998-04-21 Micron Technology, Inc. Multi-planar angulated sputtering target and method of use for filling openings
WO2002048424A1 (fr) * 2000-12-14 2002-06-20 Nordiko Limited Dispositif de pulverisation par faisceaux ioniques
WO2008009898A1 (fr) * 2006-07-20 2008-01-24 Aviza Technology Limited Sources d'ions
US8400063B2 (en) 2006-07-20 2013-03-19 Aviza Technology Limited Plasma sources
US8425741B2 (en) 2006-07-20 2013-04-23 Aviza Technology Limited Ion deposition apparatus having rotatable carousel for supporting a plurality of targets

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5296122A (en) * 1989-03-29 1994-03-22 Teruaki Katsube Apparatus for forming thin film
US5741404A (en) * 1996-05-24 1998-04-21 Micron Technology, Inc. Multi-planar angulated sputtering target and method of use for filling openings
WO2002048424A1 (fr) * 2000-12-14 2002-06-20 Nordiko Limited Dispositif de pulverisation par faisceaux ioniques
WO2008009898A1 (fr) * 2006-07-20 2008-01-24 Aviza Technology Limited Sources d'ions
CN101490789B (zh) * 2006-07-20 2011-04-13 阿维扎技术有限公司 离子源
US8354652B2 (en) 2006-07-20 2013-01-15 Aviza Technology Limited Ion source including separate support systems for accelerator grids
US8400063B2 (en) 2006-07-20 2013-03-19 Aviza Technology Limited Plasma sources
US8425741B2 (en) 2006-07-20 2013-04-23 Aviza Technology Limited Ion deposition apparatus having rotatable carousel for supporting a plurality of targets

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees