GB1294105A - Light-sensitive reproduction assembly and the preparation of a planographic printing forme therefrom - Google Patents

Light-sensitive reproduction assembly and the preparation of a planographic printing forme therefrom

Info

Publication number
GB1294105A
GB1294105A GB56366/69A GB5636669A GB1294105A GB 1294105 A GB1294105 A GB 1294105A GB 56366/69 A GB56366/69 A GB 56366/69A GB 5636669 A GB5636669 A GB 5636669A GB 1294105 A GB1294105 A GB 1294105A
Authority
GB
United Kingdom
Prior art keywords
light
layer
sensitive
dyes
sensitive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB56366/69A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19681813444 external-priority patent/DE1813444C3/de
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of GB1294105A publication Critical patent/GB1294105A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G03C1/61—Compositions containing diazo compounds as photosensitive substances with non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
GB56366/69A 1968-12-09 1969-11-18 Light-sensitive reproduction assembly and the preparation of a planographic printing forme therefrom Expired GB1294105A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19681813444 DE1813444C3 (de) 1968-12-09 Lichtdruckplatte zum Herstellen einer Lichtdruckform

Publications (1)

Publication Number Publication Date
GB1294105A true GB1294105A (en) 1972-10-25

Family

ID=5715631

Family Applications (1)

Application Number Title Priority Date Filing Date
GB56366/69A Expired GB1294105A (en) 1968-12-09 1969-11-18 Light-sensitive reproduction assembly and the preparation of a planographic printing forme therefrom

Country Status (9)

Country Link
AT (1) AT289152B (enrdf_load_stackoverflow)
BE (1) BE741742A (enrdf_load_stackoverflow)
BR (1) BR6914851D0 (enrdf_load_stackoverflow)
CA (1) CA933407A (enrdf_load_stackoverflow)
CH (1) CH519731A (enrdf_load_stackoverflow)
FR (1) FR2025640A1 (enrdf_load_stackoverflow)
GB (1) GB1294105A (enrdf_load_stackoverflow)
IL (1) IL33382A0 (enrdf_load_stackoverflow)
NL (1) NL6917728A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0041984A4 (en) * 1979-12-07 1982-05-10 Minnesota Mining & Mfg DIAZOPHOTOGRAPHIC SYSTEM.
GB2131190A (en) * 1982-11-01 1984-06-13 Gen Electric A method of enhancing the contrast of images and materials therefor
US4997742A (en) * 1986-06-27 1991-03-05 Texas Instruments Inc. Water soluble contrast enhancement composition with 1-oxy-2 diazonaphthalene sulfonamide salt and polyvinyl alcohol
US5173390A (en) * 1986-06-27 1992-12-22 Texas Instruments Incorporated Water soluble contrast enhancement composition and method of use
US5225310A (en) * 1987-06-02 1993-07-06 Hoechst Aktiengesellschaft Photosensitive mixture containing an ester or amide of 1,2-naphthoquinone diazide sulfonic or carboxylic acid, a phenolic binder resin and a bis-(4-hydroxyphenyl) speed enhancing compound

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3891443A (en) * 1973-02-01 1975-06-24 Polychrome Corp Mat finish photosensitive relief plates
DE2926236A1 (de) * 1979-06-29 1981-01-15 Hoechst Ag Lichtempfindliches, positiv arbeitendes kopiermaterial mit rauher oberflaeche
DE2926235A1 (de) * 1979-06-29 1981-01-08 Hoechst Ag Photopolymerisierbares kopiermaterial und verfahren zur herstellung von reliefbildern
JPS56156831A (en) * 1980-05-09 1981-12-03 Fuji Photo Film Co Ltd Photosensitive printing plate
EP0161660B1 (en) * 1984-05-14 1991-10-09 Kabushiki Kaisha Toshiba Pattern forming method and composition for pattern formation to be used therefor

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0041984A4 (en) * 1979-12-07 1982-05-10 Minnesota Mining & Mfg DIAZOPHOTOGRAPHIC SYSTEM.
GB2131190A (en) * 1982-11-01 1984-06-13 Gen Electric A method of enhancing the contrast of images and materials therefor
US4997742A (en) * 1986-06-27 1991-03-05 Texas Instruments Inc. Water soluble contrast enhancement composition with 1-oxy-2 diazonaphthalene sulfonamide salt and polyvinyl alcohol
US5173390A (en) * 1986-06-27 1992-12-22 Texas Instruments Incorporated Water soluble contrast enhancement composition and method of use
US5225310A (en) * 1987-06-02 1993-07-06 Hoechst Aktiengesellschaft Photosensitive mixture containing an ester or amide of 1,2-naphthoquinone diazide sulfonic or carboxylic acid, a phenolic binder resin and a bis-(4-hydroxyphenyl) speed enhancing compound

Also Published As

Publication number Publication date
AT289152B (de) 1971-04-13
BE741742A (enrdf_load_stackoverflow) 1970-05-14
BR6914851D0 (pt) 1973-01-11
NL6917728A (enrdf_load_stackoverflow) 1970-06-11
FR2025640A1 (enrdf_load_stackoverflow) 1970-09-11
DE1813444A1 (de) 1970-06-25
DE1813444B2 (de) 1976-07-22
CA933407A (en) 1973-09-11
CH519731A (de) 1972-02-29
IL33382A0 (en) 1970-01-29

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLE Entries relating assignments, transmissions, licences in the register of patents
PCNP Patent ceased through non-payment of renewal fee