IL33382A0 - Light-sensitive reproduction material for use in the preparation of a planographic printing form - Google Patents

Light-sensitive reproduction material for use in the preparation of a planographic printing form

Info

Publication number
IL33382A0
IL33382A0 IL33382A IL3338269A IL33382A0 IL 33382 A0 IL33382 A0 IL 33382A0 IL 33382 A IL33382 A IL 33382A IL 3338269 A IL3338269 A IL 3338269A IL 33382 A0 IL33382 A0 IL 33382A0
Authority
IL
Israel
Prior art keywords
preparation
light
planographic printing
printing form
reproduction material
Prior art date
Application number
IL33382A
Other languages
English (en)
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19681813444 external-priority patent/DE1813444C3/de
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of IL33382A0 publication Critical patent/IL33382A0/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G03C1/61—Compositions containing diazo compounds as photosensitive substances with non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
IL33382A 1968-12-09 1969-11-19 Light-sensitive reproduction material for use in the preparation of a planographic printing form IL33382A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19681813444 DE1813444C3 (de) 1968-12-09 Lichtdruckplatte zum Herstellen einer Lichtdruckform

Publications (1)

Publication Number Publication Date
IL33382A0 true IL33382A0 (en) 1970-01-29

Family

ID=5715631

Family Applications (1)

Application Number Title Priority Date Filing Date
IL33382A IL33382A0 (en) 1968-12-09 1969-11-19 Light-sensitive reproduction material for use in the preparation of a planographic printing form

Country Status (9)

Country Link
AT (1) AT289152B (enrdf_load_stackoverflow)
BE (1) BE741742A (enrdf_load_stackoverflow)
BR (1) BR6914851D0 (enrdf_load_stackoverflow)
CA (1) CA933407A (enrdf_load_stackoverflow)
CH (1) CH519731A (enrdf_load_stackoverflow)
FR (1) FR2025640A1 (enrdf_load_stackoverflow)
GB (1) GB1294105A (enrdf_load_stackoverflow)
IL (1) IL33382A0 (enrdf_load_stackoverflow)
NL (1) NL6917728A (enrdf_load_stackoverflow)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3891443A (en) * 1973-02-01 1975-06-24 Polychrome Corp Mat finish photosensitive relief plates
DE2926236A1 (de) * 1979-06-29 1981-01-15 Hoechst Ag Lichtempfindliches, positiv arbeitendes kopiermaterial mit rauher oberflaeche
DE2926235A1 (de) * 1979-06-29 1981-01-08 Hoechst Ag Photopolymerisierbares kopiermaterial und verfahren zur herstellung von reliefbildern
EP0041984B1 (en) * 1979-12-07 1984-09-19 Minnesota Mining And Manufacturing Company Diazonium imaging system
JPS56156831A (en) * 1980-05-09 1981-12-03 Fuji Photo Film Co Ltd Photosensitive printing plate
IE56083B1 (en) * 1982-11-01 1991-04-10 Microsi Inc Aryl nitrones
EP0161660B1 (en) * 1984-05-14 1991-10-09 Kabushiki Kaisha Toshiba Pattern forming method and composition for pattern formation to be used therefor
US5173390A (en) * 1986-06-27 1992-12-22 Texas Instruments Incorporated Water soluble contrast enhancement composition and method of use
US4997742A (en) * 1986-06-27 1991-03-05 Texas Instruments Inc. Water soluble contrast enhancement composition with 1-oxy-2 diazonaphthalene sulfonamide salt and polyvinyl alcohol
DE3718416A1 (de) * 1987-06-02 1988-12-15 Hoechst Ag Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden, daraus hergestelltes aufzeichnungsmaterial und dessen verwendung

Also Published As

Publication number Publication date
AT289152B (de) 1971-04-13
GB1294105A (en) 1972-10-25
BE741742A (enrdf_load_stackoverflow) 1970-05-14
BR6914851D0 (pt) 1973-01-11
NL6917728A (enrdf_load_stackoverflow) 1970-06-11
FR2025640A1 (enrdf_load_stackoverflow) 1970-09-11
DE1813444A1 (de) 1970-06-25
DE1813444B2 (de) 1976-07-22
CA933407A (en) 1973-09-11
CH519731A (de) 1972-02-29

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