GB1284708A - Electron beam apparatus - Google Patents
Electron beam apparatusInfo
- Publication number
- GB1284708A GB1284708A GB21245/71A GB2124571A GB1284708A GB 1284708 A GB1284708 A GB 1284708A GB 21245/71 A GB21245/71 A GB 21245/71A GB 2124571 A GB2124571 A GB 2124571A GB 1284708 A GB1284708 A GB 1284708A
- Authority
- GB
- United Kingdom
- Prior art keywords
- specimen
- electrode
- derived
- electric field
- function generator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
- H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
Abstract
1284708 Electron microscopes SIEMENS AG 19 April 1971 [7 Feb 1970] 21245/71 Heading HID In a scanning electron microscope an electric field is provided to remove secondary electrons and back-scattered electrons from the vicinity of the specimen so that the output derived from the specimen current corresponds to the secondary electron emission. In Fig. 1 an electrode E2 is arranged in front of the specimen P and biased positively by a source Q2, and is in the form of a disc with an aperture large enough not to affect the electron beam E. The output signal is derived across the resistance R and varies inversely with the secondary emission from the specimen; the signal may be inverted to give a positive image. The specimen may be tiltable towards some other detecting system, e.g. an X-ray detector, and a magnetic field may be applied parallel to the surface of the specimen to assist in the removal of secondary electrons. In a modification, Fig. 2 (not shown), electrode E2 is omitted and the positive terminal of Q1 is connected to the envelope W and to the lens L. In another modification, Fig. 3 (not shown), the electrode E2 is in the form of a plate with a knife edge and is movable parallel to the plane of the specimen to adjust the contrast by altering the direction of the electric field. A similar third electrode (E3) may also be provided and is connected to a negative potential relative to the specimen; it may be stationary or may be moved along with the second'electrode E2. The electric field and/or the magnetic field at the surface of the specimen may be varied periodically by a function generator which also controls a phase-sensitive detector in the output circuit. In one such arrangement, Fig.4 (not shown), the function generator is connected between E2 and a plate electrode arranged behind the specimen; two resistances are connected across the function generator and their junction is earthed. The output is derived from the specimen and is fed via a capacitor to the phase-sensitive detector.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2005682A DE2005682C3 (en) | 1970-02-07 | 1970-02-07 | Device for extracting the secondary electrons in a scanning electron microscope or an electron beam microanalyser |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1284708A true GB1284708A (en) | 1972-08-09 |
Family
ID=5761726
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB21245/71A Expired GB1284708A (en) | 1970-02-07 | 1971-04-19 | Electron beam apparatus |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3736422A (en) |
| CH (1) | CH524140A (en) |
| DE (1) | DE2005682C3 (en) |
| FR (1) | FR2078240A5 (en) |
| GB (1) | GB1284708A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2186737A (en) * | 1986-02-18 | 1987-08-19 | Cambridge Instr Ltd | Specimen chamber for scanning electron beam instruments |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1403946A (en) * | 1973-05-23 | 1975-08-28 | Mullard Ltd | Spectroscopy |
| JPS5428710B2 (en) * | 1972-11-01 | 1979-09-18 | ||
| GB1447983A (en) * | 1973-01-10 | 1976-09-02 | Nat Res Dev | Detector for electron microscopes |
| US4086491A (en) * | 1977-02-04 | 1978-04-25 | The United States Of America As Represented By The Secretary Of The Navy | Direct measurement of the electron beam of a scanning electron microscope |
| DE2922325A1 (en) * | 1979-06-01 | 1980-12-11 | Philips Patentverwaltung | GRID ELECTRON MICROSCOPE |
| EP0263839A1 (en) * | 1986-02-18 | 1988-04-20 | Cambridge Instruments Limited | Specimen chamber for scanning electron beam instruments |
| US4933552A (en) * | 1988-10-06 | 1990-06-12 | International Business Machines Corporation | Inspection system utilizing retarding field back scattered electron collection |
| JP2927627B2 (en) * | 1992-10-20 | 1999-07-28 | 株式会社日立製作所 | Scanning electron microscope |
| JP3194552B2 (en) * | 1993-06-24 | 2001-07-30 | 富士通株式会社 | Charged particle beam exposure system |
| JP3251875B2 (en) * | 1996-05-10 | 2002-01-28 | 株式会社東芝 | Charged particle beam exposure system |
| JP3564958B2 (en) | 1997-08-07 | 2004-09-15 | 株式会社日立製作所 | Inspection method and inspection apparatus using electron beam |
| DE69901787T2 (en) * | 1999-03-31 | 2002-11-21 | Advantest Corp | Method and device for mapping a surface potential |
| US6586736B1 (en) * | 1999-09-10 | 2003-07-01 | Kla-Tencor, Corporation | Scanning electron beam microscope having an electrode for controlling charge build up during scanning of a sample |
| US6664546B1 (en) | 2000-02-10 | 2003-12-16 | Kla-Tencor | In-situ probe for optimizing electron beam inspection and metrology based on surface potential |
| JP2004513477A (en) * | 2000-10-31 | 2004-04-30 | フェイ カンパニ | SEM with adjustable final electrode for electrostatic objective |
| JP4443167B2 (en) | 2003-08-25 | 2010-03-31 | 株式会社日立製作所 | Scanning electron microscope |
| EP1648018B1 (en) * | 2004-10-14 | 2017-02-22 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Focussing lens and charged particle beam device for non zero landing angle operation |
| JP5645386B2 (en) * | 2009-09-30 | 2014-12-24 | 株式会社日立製作所 | Electromagnetic field application device |
| DE102010011059A1 (en) | 2010-03-11 | 2011-09-15 | Global Beam Technologies Ag | Method and device for producing a component |
| WO2012109340A1 (en) | 2011-02-08 | 2012-08-16 | Atti International Services Company, Inc. | Electron beam profile measurement system and method with "moms" |
| JP5852474B2 (en) | 2012-03-01 | 2016-02-03 | 株式会社日立ハイテクノロジーズ | Charged particle beam equipment |
| US9564291B1 (en) | 2014-01-27 | 2017-02-07 | Mochii, Inc. | Hybrid charged-particle beam and light beam microscopy |
| US9997331B1 (en) * | 2014-01-27 | 2018-06-12 | Mochii, Inc. | Charged-particle beam microscopy |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3103584A (en) * | 1963-09-10 | Electron microanalyzer system | ||
| NL285495A (en) * | 1961-11-18 | |||
| US3158733A (en) * | 1962-09-12 | 1964-11-24 | Nat Res Corp | Focus control for electron beam heating |
| US3315157A (en) * | 1963-07-22 | 1967-04-18 | Hitachi Ltd | Apparatus for impedance measurement through the use of electron beam probes |
| GB1128107A (en) * | 1965-06-23 | 1968-09-25 | Hitachi Ltd | Scanning electron microscope |
-
1970
- 1970-02-07 DE DE2005682A patent/DE2005682C3/en not_active Expired
-
1971
- 1971-01-22 CH CH95671A patent/CH524140A/en not_active IP Right Cessation
- 1971-02-05 FR FR7103906A patent/FR2078240A5/fr not_active Expired
- 1971-02-08 US US00112919A patent/US3736422A/en not_active Expired - Lifetime
- 1971-04-19 GB GB21245/71A patent/GB1284708A/en not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2186737A (en) * | 1986-02-18 | 1987-08-19 | Cambridge Instr Ltd | Specimen chamber for scanning electron beam instruments |
| GB2186737B (en) * | 1986-02-18 | 1990-07-04 | Cambridge Instr Ltd | Improvements relating to specimen chambers for scanning electron beam instruments |
Also Published As
| Publication number | Publication date |
|---|---|
| US3736422A (en) | 1973-05-29 |
| DE2005682C3 (en) | 1974-05-09 |
| DE2005682B2 (en) | 1973-10-18 |
| DE2005682A1 (en) | 1971-09-09 |
| FR2078240A5 (en) | 1971-11-05 |
| CH524140A (en) | 1972-06-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| 435 | Patent endorsed 'licences of right' on the date specified (sect. 35/1949) | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |