GB1304344A - - Google Patents
Info
- Publication number
- GB1304344A GB1304344A GB585569A GB1304344DA GB1304344A GB 1304344 A GB1304344 A GB 1304344A GB 585569 A GB585569 A GB 585569A GB 1304344D A GB1304344D A GB 1304344DA GB 1304344 A GB1304344 A GB 1304344A
- Authority
- GB
- United Kingdom
- Prior art keywords
- shield
- specimen
- electrons
- detector
- fields
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Measurement Of Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
1304344 Electron microscope J R BANBURY and W C NIXON 2 Feb 1970 [1 Feb 1969] 5855/69 Heading H1D In electron beam apparatus where in a finely focused electron beam impinges on the specimen surface S to be examined, the secondary electrons emitted are subjected to electrostatic and/or magnetic fields, for instance by polepiece P and electrostatic shield C, such that electrons of a given energy emerging in different directions are caused to diverge from one another over a greater solid angle than they would in the absence of such a field, the field accentuating the differences in the respective trajectories, and the entry window of detector D occupies only a fraction of the solid angle over which the electrons spread. The beam may be raster or line scanned and a two dimensional c.r.t. display formed, or the specimen may be moved, or both may be stationary while the specimen voltage or potential across a junction in it varied. Variations in secondary coefficient may be due to surface topography, bumps inclined away or toward the detector appearing dark or light respectively, changes in the nature of the material due to potential contrast (e.g. examination of semi-conductors, integrated circuits, and micro-circuit elements) or e.m. fields in or near the surface. Electron probe microanalysis in which primarily the resultant X-rays are analysed may also include means for constrast image production from secondary electrons. If the specimen surface is inclined to the beam the divergent will normally be away from the normal to the specimen. The divergent trajectories need not be continuously divergent, and the electrode potentials may be varied to change the operational mode. Shield C at 200 to 500 V for example need not be circular, member P could be an earthed shield covering the polepiece and the specimen covered by an earthed disc shield with an aperture to enhance predictability. Gauze G preceeding scintillator D may extend 60 to 120 degrees, e.g. 90 degrees and the major depth of the shield, normally metal. The gauze is preferably operationally adjustable to detect electrons over the selected axis length, by blanking off for instance, the signal representing particular energy direction combinations, and a velocity analyser may be included. D may be at several KV and connected to a photo-multiplier. Components may be C coated to reduce spurious emission due to back scattered primary electrons. Fig. 3 (not shown) is preferred for magnetic contrast variations with insulated grid or plate A at the polepiece, and other potentials as shown. B and E fields parallel to the specimen surface may be observed. Electric potential contrast may be monitored by the Fig. 4 (not shown) array. Electrode R may improve linearity between surface potential and detector signal and D.C. and A.C. voltages or microcircuits or circuit elements may be observed, e.g. stroboscopically. The beam may be incident up to 90 degrees, the detector shield system rotated, the beam entering through an apertured plate. Permanent or electromagnets may provide superposed B fields and two axially spaced toriodally wound electromagnets may replace shield C providing a wholly B field.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB585569 | 1969-02-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1304344A true GB1304344A (en) | 1973-01-24 |
Family
ID=9803896
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB585569A Expired GB1304344A (en) | 1969-02-01 | 1969-02-01 |
Country Status (5)
Country | Link |
---|---|
US (1) | US3694652A (en) |
JP (1) | JPS4830180B1 (en) |
DE (1) | DE2004256C3 (en) |
GB (1) | GB1304344A (en) |
NL (1) | NL7001404A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0208100A2 (en) * | 1985-05-31 | 1987-01-14 | Siemens Aktiengesellschaft | Reverse field electrostatic spectrometer for electron beam measuring techniques |
GB2215907A (en) * | 1987-07-14 | 1989-09-27 | Jeol Ltd | Charged particle apparatus |
GB2229854A (en) * | 1989-03-28 | 1990-10-03 | Robinson Vivian N E | Electron detector |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3961190A (en) * | 1975-03-06 | 1976-06-01 | International Business Machines Corporation | Voltage contrast detector for a scanning electron beam instrument |
AU521225B2 (en) * | 1977-04-19 | 1982-03-25 | Delalande S.A. | Alkylenedioxy phenyl derivatives |
KR850001390B1 (en) * | 1980-07-31 | 1985-09-24 | 니혼 덴시 가부시끼 가이샤 | Device for detecting secondary electron in a scanning electron microscope |
EP0178431B1 (en) * | 1984-09-18 | 1990-02-28 | ICT Integrated Circuit Testing Gesellschaft für HalbleiterprÀ¼ftechnik mbH | Counterfield spectrometer for electron beam measurement |
US4829243A (en) * | 1988-02-19 | 1989-05-09 | Microelectronics And Computer Technology Corporation | Electron beam testing of electronic components |
US4943769A (en) * | 1989-03-21 | 1990-07-24 | International Business Machines Corporation | Apparatus and method for opens/shorts testing of capacitively coupled networks in substrates using electron beams |
WO1999030345A1 (en) * | 1997-12-08 | 1999-06-17 | Philips Electron Optics B.V. | Environmental sem with a magnetic field for improved secondary electron detection |
DE19802848B4 (en) | 1998-01-26 | 2012-02-02 | Display Products Group,Inc. | Method and apparatus for testing a substrate |
US8633439B2 (en) * | 2011-07-01 | 2014-01-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | System and method for electromagnetic interference shielding for critical dimension-scanning electron microscope |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2418228A (en) * | 1943-10-08 | 1947-04-01 | Rca Corp | Electronic microanalyzer |
GB1128107A (en) * | 1965-06-23 | 1968-09-25 | Hitachi Ltd | Scanning electron microscope |
US3445708A (en) * | 1967-02-06 | 1969-05-20 | Gen Electric | Electron diffraction unit |
-
1969
- 1969-02-01 GB GB585569A patent/GB1304344A/en not_active Expired
-
1970
- 1970-01-30 DE DE2004256A patent/DE2004256C3/en not_active Expired
- 1970-01-30 US US7198A patent/US3694652A/en not_active Expired - Lifetime
- 1970-01-30 NL NL7001404A patent/NL7001404A/xx unknown
- 1970-01-31 JP JP45008394A patent/JPS4830180B1/ja active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0208100A2 (en) * | 1985-05-31 | 1987-01-14 | Siemens Aktiengesellschaft | Reverse field electrostatic spectrometer for electron beam measuring techniques |
EP0208100A3 (en) * | 1985-05-31 | 1988-11-23 | Siemens Aktiengesellschaft | Reverse field electrostatic spectrometer for electron beam measuring techniques |
GB2215907A (en) * | 1987-07-14 | 1989-09-27 | Jeol Ltd | Charged particle apparatus |
GB2215907B (en) * | 1987-07-14 | 1992-04-15 | Jeol Ltd | Apparatus using a charged-particle beam |
GB2229854A (en) * | 1989-03-28 | 1990-10-03 | Robinson Vivian N E | Electron detector |
US5043583A (en) * | 1989-03-28 | 1991-08-27 | Robinson Vivian N E | Electron detector |
GB2229854B (en) * | 1989-03-28 | 1993-10-27 | Robinson Vivian N E | Backscattered electron detector |
Also Published As
Publication number | Publication date |
---|---|
DE2004256C3 (en) | 1973-10-18 |
JPS4830180B1 (en) | 1973-09-18 |
DE2004256A1 (en) | 1970-08-06 |
DE2004256B2 (en) | 1973-03-29 |
NL7001404A (en) | 1970-08-04 |
US3694652A (en) | 1972-09-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PLNP | Patent lapsed through nonpayment of renewal fees |