GB1276076A - Etching film materials - Google Patents

Etching film materials

Info

Publication number
GB1276076A
GB1276076A GB03622/71A GB1362271A GB1276076A GB 1276076 A GB1276076 A GB 1276076A GB 03622/71 A GB03622/71 A GB 03622/71A GB 1362271 A GB1362271 A GB 1362271A GB 1276076 A GB1276076 A GB 1276076A
Authority
GB
United Kingdom
Prior art keywords
film
etching
area
photoresist
thick portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB03622/71A
Other languages
English (en)
Inventor
Michael Hatzakis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1276076A publication Critical patent/GB1276076A/en
Expired legal-status Critical Current

Links

Classifications

    • H10P34/40—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
    • H10P95/00—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/948—Radiation resist
    • Y10S438/949—Energy beam treating radiation resist on semiconductor

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electron Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
GB03622/71A 1970-06-12 1971-05-07 Etching film materials Expired GB1276076A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US4567670A 1970-06-12 1970-06-12

Publications (1)

Publication Number Publication Date
GB1276076A true GB1276076A (en) 1972-06-01

Family

ID=21939278

Family Applications (1)

Application Number Title Priority Date Filing Date
GB03622/71A Expired GB1276076A (en) 1970-06-12 1971-05-07 Etching film materials

Country Status (5)

Country Link
US (1) US3649393A (enExample)
JP (1) JPS5337300B1 (enExample)
DE (1) DE2119527A1 (enExample)
FR (1) FR2095201B1 (enExample)
GB (1) GB1276076A (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3830686A (en) * 1972-04-10 1974-08-20 W Lehrer Photomasks and method of fabrication thereof
US3930857A (en) * 1973-05-03 1976-01-06 International Business Machines Corporation Resist process
US3922184A (en) * 1973-12-26 1975-11-25 Ibm Method for forming openings through insulative layers in the fabrication of integrated circuits
FR2279135A1 (fr) * 1974-07-19 1976-02-13 Ibm Procede de fabrication d'un masque pour lithographie aux rayons x
US3961101A (en) * 1974-09-16 1976-06-01 Rca Corporation Process for improved development of electron-beam-sensitive resist films
US3961100A (en) * 1974-09-16 1976-06-01 Rca Corporation Method for developing electron beam sensitive resist films
US4001061A (en) * 1975-03-05 1977-01-04 International Business Machines Corporation Single lithography for multiple-layer bubble domain devices
US4035226A (en) * 1975-04-14 1977-07-12 Rca Corporation Method of preparing portions of a semiconductor wafer surface for further processing
US3997367A (en) * 1975-11-20 1976-12-14 Bell Telephone Laboratories, Incorporated Method for making transistors
US4040891A (en) * 1976-06-30 1977-08-09 Ibm Corporation Etching process utilizing the same positive photoresist layer for two etching steps
DE2757931A1 (de) * 1977-12-24 1979-07-12 Licentia Gmbh Verfahren zum herstellen von positiven aetzresistenten masken
JPS5626450A (en) * 1979-08-13 1981-03-14 Hitachi Ltd Manufacture of semiconductor device
US4337132A (en) * 1980-11-14 1982-06-29 Rockwell International Corporation Ion etching process with minimized redeposition
US4684436A (en) * 1986-10-29 1987-08-04 International Business Machines Corp. Method of simultaneously etching personality and select
US5213916A (en) * 1990-10-30 1993-05-25 International Business Machines Corporation Method of making a gray level mask
US5789300A (en) * 1997-02-25 1998-08-04 Advanced Micro Devices, Inc. Method of making IGFETs in densely and sparsely populated areas of a substrate
US5985766A (en) 1997-02-27 1999-11-16 Micron Technology, Inc. Semiconductor processing methods of forming a contact opening
US6759173B2 (en) 2000-10-26 2004-07-06 Shipley Company, L.L.C. Single mask process for patterning microchip having grayscale and micromachined features
TWI475705B (zh) * 2009-07-23 2015-03-01 Kuo Ching Chiang 具有聚光元件及高有效面積之太陽能電池及其製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1541596A (fr) * 1966-10-24 1968-10-04 Westinghouse Electric Corp Procédé de délimitation de petites surfaces dans la fabrication d'éléments microélectroniques

Also Published As

Publication number Publication date
FR2095201A1 (enExample) 1972-02-11
JPS5337300B1 (enExample) 1978-10-07
US3649393A (en) 1972-03-14
FR2095201B1 (enExample) 1976-05-28
DE2119527A1 (de) 1971-12-16

Similar Documents

Publication Publication Date Title
GB1276076A (en) Etching film materials
GB1523535A (en) Selfsupporting masks
GB1514109A (en) Method of making resist mask on a substrate
JPS5383617A (en) Recording material
GB1500606A (en) Electron beam positive resist
GB1302425A (enExample)
GB1459170A (en) Positive resist mask
JPS5239366A (en) Electronic gun device
EP0023988A3 (en) Electron beam sensitive resist composition, and method of forming positive and negative resist images
GB1330139A (en) Process for the burning-in of layers on printing plates
JPS55118633A (en) Exposing method for electron beam
JPS53147465A (en) Forming method of patterns for lift-off
GB1427593A (en) Forming a print-out image
GB1048559A (en) Improvements in or relating to electrical recording
JPS51120671A (en) Photomask fault processing method
GB1485097A (en) Coatings on a transparent substrate
JPS54141573A (en) Mask for exposure
JPS5229726A (en) Photosensitive material and method of forming image on it
JPS51114931A (en) Photoresist pattern formation method
GB1397481A (en) Exposure masks
JPS56112729A (en) Exposure of electron beam
JPS57115832A (en) Resist pattern formation for fine processing
JPS53120276A (en) Electron beam exposure method
JPS5587432A (en) Electron beam exposure method
JPS5772327A (en) Formation of resist pattern

Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee