FR2095201A1 - - Google Patents

Info

Publication number
FR2095201A1
FR2095201A1 FR7115068A FR7115068A FR2095201A1 FR 2095201 A1 FR2095201 A1 FR 2095201A1 FR 7115068 A FR7115068 A FR 7115068A FR 7115068 A FR7115068 A FR 7115068A FR 2095201 A1 FR2095201 A1 FR 2095201A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7115068A
Other languages
French (fr)
Other versions
FR2095201B1 (enExample
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2095201A1 publication Critical patent/FR2095201A1/fr
Application granted granted Critical
Publication of FR2095201B1 publication Critical patent/FR2095201B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H10P34/40—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
    • H10P95/00—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/948—Radiation resist
    • Y10S438/949—Energy beam treating radiation resist on semiconductor

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electron Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
FR7115068A 1970-06-12 1971-04-20 Expired FR2095201B1 (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US4567670A 1970-06-12 1970-06-12

Publications (2)

Publication Number Publication Date
FR2095201A1 true FR2095201A1 (enExample) 1972-02-11
FR2095201B1 FR2095201B1 (enExample) 1976-05-28

Family

ID=21939278

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7115068A Expired FR2095201B1 (enExample) 1970-06-12 1971-04-20

Country Status (5)

Country Link
US (1) US3649393A (enExample)
JP (1) JPS5337300B1 (enExample)
DE (1) DE2119527A1 (enExample)
FR (1) FR2095201B1 (enExample)
GB (1) GB1276076A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2652253A1 (de) * 1975-11-20 1977-06-02 Western Electric Co Verfahren zum herstellen von halbleiterbauelementen

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3830686A (en) * 1972-04-10 1974-08-20 W Lehrer Photomasks and method of fabrication thereof
US3930857A (en) * 1973-05-03 1976-01-06 International Business Machines Corporation Resist process
US3922184A (en) * 1973-12-26 1975-11-25 Ibm Method for forming openings through insulative layers in the fabrication of integrated circuits
FR2279135A1 (fr) * 1974-07-19 1976-02-13 Ibm Procede de fabrication d'un masque pour lithographie aux rayons x
US3961101A (en) * 1974-09-16 1976-06-01 Rca Corporation Process for improved development of electron-beam-sensitive resist films
US3961100A (en) * 1974-09-16 1976-06-01 Rca Corporation Method for developing electron beam sensitive resist films
US4001061A (en) * 1975-03-05 1977-01-04 International Business Machines Corporation Single lithography for multiple-layer bubble domain devices
US4035226A (en) * 1975-04-14 1977-07-12 Rca Corporation Method of preparing portions of a semiconductor wafer surface for further processing
US4040891A (en) * 1976-06-30 1977-08-09 Ibm Corporation Etching process utilizing the same positive photoresist layer for two etching steps
DE2757931A1 (de) * 1977-12-24 1979-07-12 Licentia Gmbh Verfahren zum herstellen von positiven aetzresistenten masken
JPS5626450A (en) * 1979-08-13 1981-03-14 Hitachi Ltd Manufacture of semiconductor device
US4337132A (en) * 1980-11-14 1982-06-29 Rockwell International Corporation Ion etching process with minimized redeposition
US4684436A (en) * 1986-10-29 1987-08-04 International Business Machines Corp. Method of simultaneously etching personality and select
US5213916A (en) * 1990-10-30 1993-05-25 International Business Machines Corporation Method of making a gray level mask
US5789300A (en) * 1997-02-25 1998-08-04 Advanced Micro Devices, Inc. Method of making IGFETs in densely and sparsely populated areas of a substrate
US5985766A (en) 1997-02-27 1999-11-16 Micron Technology, Inc. Semiconductor processing methods of forming a contact opening
US6759173B2 (en) 2000-10-26 2004-07-06 Shipley Company, L.L.C. Single mask process for patterning microchip having grayscale and micromachined features
TWI475705B (zh) * 2009-07-23 2015-03-01 Kuo Ching Chiang 具有聚光元件及高有效面積之太陽能電池及其製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1541596A (fr) * 1966-10-24 1968-10-04 Westinghouse Electric Corp Procédé de délimitation de petites surfaces dans la fabrication d'éléments microélectroniques

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1541596A (fr) * 1966-10-24 1968-10-04 Westinghouse Electric Corp Procédé de délimitation de petites surfaces dans la fabrication d'éléments microélectroniques

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
(REVUE AMERICAINE "JOURNAL OF THE ELECTROCHEMICAL SOCIETY",VOLUME 116,JUILLET 1969,"ELECTRON RESISTS FOR MICROCIRCUIT AND MASK PRODUCTION"M.HATZAKIS PAGES 1033-1037.) *
RESISTS FOR MICROCIRCUIT AND MASK PRODUCTION"M.HATZAKIS PAGES 1033-1037.) *
REVUE AMERICAINE "JOURNAL OF THE ELECTROCHEMICAL SOCIETY",VOLUME 116,JUILLET 1969,"ELECTRON *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2652253A1 (de) * 1975-11-20 1977-06-02 Western Electric Co Verfahren zum herstellen von halbleiterbauelementen

Also Published As

Publication number Publication date
GB1276076A (en) 1972-06-01
JPS5337300B1 (enExample) 1978-10-07
US3649393A (en) 1972-03-14
FR2095201B1 (enExample) 1976-05-28
DE2119527A1 (de) 1971-12-16

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Legal Events

Date Code Title Description
ST Notification of lapse