JPS5337300B1 - - Google Patents
Info
- Publication number
- JPS5337300B1 JPS5337300B1 JP2994871A JP2994871A JPS5337300B1 JP S5337300 B1 JPS5337300 B1 JP S5337300B1 JP 2994871 A JP2994871 A JP 2994871A JP 2994871 A JP2994871 A JP 2994871A JP S5337300 B1 JPS5337300 B1 JP S5337300B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H10P34/40—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
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- H10P95/00—
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
- Y10S438/948—Radiation resist
- Y10S438/949—Energy beam treating radiation resist on semiconductor
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Electron Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US4567670A | 1970-06-12 | 1970-06-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5337300B1 true JPS5337300B1 (enExample) | 1978-10-07 |
Family
ID=21939278
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2994871A Pending JPS5337300B1 (enExample) | 1970-06-12 | 1971-05-07 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3649393A (enExample) |
| JP (1) | JPS5337300B1 (enExample) |
| DE (1) | DE2119527A1 (enExample) |
| FR (1) | FR2095201B1 (enExample) |
| GB (1) | GB1276076A (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3830686A (en) * | 1972-04-10 | 1974-08-20 | W Lehrer | Photomasks and method of fabrication thereof |
| US3930857A (en) * | 1973-05-03 | 1976-01-06 | International Business Machines Corporation | Resist process |
| US3922184A (en) * | 1973-12-26 | 1975-11-25 | Ibm | Method for forming openings through insulative layers in the fabrication of integrated circuits |
| FR2279135A1 (fr) * | 1974-07-19 | 1976-02-13 | Ibm | Procede de fabrication d'un masque pour lithographie aux rayons x |
| US3961101A (en) * | 1974-09-16 | 1976-06-01 | Rca Corporation | Process for improved development of electron-beam-sensitive resist films |
| US3961100A (en) * | 1974-09-16 | 1976-06-01 | Rca Corporation | Method for developing electron beam sensitive resist films |
| US4001061A (en) * | 1975-03-05 | 1977-01-04 | International Business Machines Corporation | Single lithography for multiple-layer bubble domain devices |
| US4035226A (en) * | 1975-04-14 | 1977-07-12 | Rca Corporation | Method of preparing portions of a semiconductor wafer surface for further processing |
| US3997367A (en) * | 1975-11-20 | 1976-12-14 | Bell Telephone Laboratories, Incorporated | Method for making transistors |
| US4040891A (en) * | 1976-06-30 | 1977-08-09 | Ibm Corporation | Etching process utilizing the same positive photoresist layer for two etching steps |
| DE2757931A1 (de) * | 1977-12-24 | 1979-07-12 | Licentia Gmbh | Verfahren zum herstellen von positiven aetzresistenten masken |
| JPS5626450A (en) * | 1979-08-13 | 1981-03-14 | Hitachi Ltd | Manufacture of semiconductor device |
| US4337132A (en) * | 1980-11-14 | 1982-06-29 | Rockwell International Corporation | Ion etching process with minimized redeposition |
| US4684436A (en) * | 1986-10-29 | 1987-08-04 | International Business Machines Corp. | Method of simultaneously etching personality and select |
| US5213916A (en) * | 1990-10-30 | 1993-05-25 | International Business Machines Corporation | Method of making a gray level mask |
| US5789300A (en) * | 1997-02-25 | 1998-08-04 | Advanced Micro Devices, Inc. | Method of making IGFETs in densely and sparsely populated areas of a substrate |
| US5985766A (en) | 1997-02-27 | 1999-11-16 | Micron Technology, Inc. | Semiconductor processing methods of forming a contact opening |
| US6759173B2 (en) | 2000-10-26 | 2004-07-06 | Shipley Company, L.L.C. | Single mask process for patterning microchip having grayscale and micromachined features |
| TWI475705B (zh) * | 2009-07-23 | 2015-03-01 | Kuo Ching Chiang | 具有聚光元件及高有效面積之太陽能電池及其製造方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1541596A (fr) * | 1966-10-24 | 1968-10-04 | Westinghouse Electric Corp | Procédé de délimitation de petites surfaces dans la fabrication d'éléments microélectroniques |
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1970
- 1970-06-12 US US45676A patent/US3649393A/en not_active Expired - Lifetime
-
1971
- 1971-04-20 FR FR7115068A patent/FR2095201B1/fr not_active Expired
- 1971-04-22 DE DE19712119527 patent/DE2119527A1/de not_active Withdrawn
- 1971-05-07 GB GB03622/71A patent/GB1276076A/en not_active Expired
- 1971-05-07 JP JP2994871A patent/JPS5337300B1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2095201A1 (enExample) | 1972-02-11 |
| GB1276076A (en) | 1972-06-01 |
| US3649393A (en) | 1972-03-14 |
| FR2095201B1 (enExample) | 1976-05-28 |
| DE2119527A1 (de) | 1971-12-16 |