GB1270496A - Ion source for slow-ion sputtering - Google Patents

Ion source for slow-ion sputtering

Info

Publication number
GB1270496A
GB1270496A GB49277/70A GB4927770A GB1270496A GB 1270496 A GB1270496 A GB 1270496A GB 49277/70 A GB49277/70 A GB 49277/70A GB 4927770 A GB4927770 A GB 4927770A GB 1270496 A GB1270496 A GB 1270496A
Authority
GB
United Kingdom
Prior art keywords
anode
ion
target
cathode
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB49277/70A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Electronics UK Ltd
Original Assignee
Philips Electronic and Associated Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electronic and Associated Industries Ltd filed Critical Philips Electronic and Associated Industries Ltd
Publication of GB1270496A publication Critical patent/GB1270496A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
  • Particle Accelerators (AREA)
GB49277/70A 1969-10-21 1970-10-16 Ion source for slow-ion sputtering Expired GB1270496A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1953659A DE1953659C3 (de) 1969-10-21 1969-10-21 Ionenquelle für die Zerstäubung mit langsamen Ionen

Publications (1)

Publication Number Publication Date
GB1270496A true GB1270496A (en) 1972-04-12

Family

ID=5749151

Family Applications (1)

Application Number Title Priority Date Filing Date
GB49277/70A Expired GB1270496A (en) 1969-10-21 1970-10-16 Ion source for slow-ion sputtering

Country Status (8)

Country Link
US (1) US3719582A (enrdf_load_stackoverflow)
JP (1) JPS513119B1 (enrdf_load_stackoverflow)
AU (1) AU2023570A (enrdf_load_stackoverflow)
CH (1) CH515341A (enrdf_load_stackoverflow)
DE (1) DE1953659C3 (enrdf_load_stackoverflow)
FR (1) FR2066179A5 (enrdf_load_stackoverflow)
GB (1) GB1270496A (enrdf_load_stackoverflow)
NL (1) NL7015117A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EA015719B1 (ru) * 2008-02-13 2011-10-31 Александр Криманов Метод и устройство управления потоком ионов

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
DE2621824C2 (de) * 1976-05-17 1982-04-29 Hitachi, Ltd., Tokyo Mikrowellen-Entladungs-Ionenquelle
JPS5623290U (enrdf_load_stackoverflow) * 1979-07-25 1981-03-02
US4512867A (en) * 1981-11-24 1985-04-23 Andreev Anatoly A Method and apparatus for controlling plasma generation in vapor deposition
JPS60190493U (ja) * 1984-05-30 1985-12-17 ダイセル化学工業株式会社 仮付治具
US5215640A (en) * 1987-02-03 1993-06-01 Balzers Ag Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices
DE3707545A1 (de) * 1987-02-03 1988-08-11 Balzers Hochvakuum Anordnung zur stabilisierung eines lichtbogens zwischen einer anode und einer kathode
CA2065581C (en) 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
DE69929184D1 (de) * 1998-05-14 2006-02-02 Kaufman & Robinson Inc Verfahren zur sputterbeschichtung
CN112635287A (zh) * 2020-12-23 2021-04-09 长沙元戎科技有限责任公司 一种新型离子源等离子体中和器

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EA015719B1 (ru) * 2008-02-13 2011-10-31 Александр Криманов Метод и устройство управления потоком ионов

Also Published As

Publication number Publication date
DE1953659C3 (de) 1979-01-25
FR2066179A5 (enrdf_load_stackoverflow) 1971-08-06
US3719582A (en) 1973-03-06
DE1953659A1 (de) 1971-04-29
NL7015117A (enrdf_load_stackoverflow) 1971-04-23
DE1953659B2 (de) 1978-05-18
CH515341A (de) 1971-11-15
JPS513119B1 (enrdf_load_stackoverflow) 1976-01-31
AU2023570A (en) 1972-03-30

Similar Documents

Publication Publication Date Title
US4166018A (en) Sputtering process and apparatus
US3884793A (en) Electrode type glow discharge apparatus
US2146025A (en) Coating by cathode disintegration
US4370217A (en) Target assembly comprising, for use in a magnetron-type sputtering device, a magnetic target plate and permanent magnet pieces
US3594295A (en) Rf sputtering of insulator materials
US3514391A (en) Sputtering apparatus with finned anode
GB2359189A (en) Method and apparatus for ionized physical vapor deposition
GB1113579A (en) Improvements in and relating to the sputtering of substances by means of electric arc discharges
US4414086A (en) Magnetic targets for use in sputter coating apparatus
US3408283A (en) High current duoplasmatron having an apertured anode positioned in the low pressure region
US3913320A (en) Electron-bombardment ion sources
US4163151A (en) Separated ion source
US2920235A (en) Method and apparatus for producing intense energetic gas discharges
US6156170A (en) Magnetron sputtering apparatus
GB1270496A (en) Ion source for slow-ion sputtering
GB1233404A (enrdf_load_stackoverflow)
US4716340A (en) Pre-ionization aided sputter gun
US5531877A (en) Microwave-enhanced sputtering configuration
GB1226004A (enrdf_load_stackoverflow)
GB1191223A (en) Magnetically Confined Electrical Discharge Getter Ion Vacuum Pumps
US4175029A (en) Apparatus for ion plasma coating of articles
GB1476293A (en) Continuous ionization injector for low pressure gas dis charge device
US3282816A (en) Process of cathode sputtering from a cylindrical cathode
US3530057A (en) Sputtering
GB1119277A (en) Improvements in or relating to sputtering apparatus