GB1251732A - - Google Patents

Info

Publication number
GB1251732A
GB1251732A GB1251732DA GB1251732A GB 1251732 A GB1251732 A GB 1251732A GB 1251732D A GB1251732D A GB 1251732DA GB 1251732 A GB1251732 A GB 1251732A
Authority
GB
United Kingdom
Prior art keywords
guard
guard region
transistor
annular
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1251732A publication Critical patent/GB1251732A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0603Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
    • H01L29/0607Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
    • H01L29/0638Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for preventing surface leakage due to surface inversion layer, e.g. with channel stopper

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Electrodes Of Semiconductors (AREA)
GB1251732D 1968-10-11 1969-09-26 Expired GB1251732A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US76689468A 1968-10-11 1968-10-11

Publications (1)

Publication Number Publication Date
GB1251732A true GB1251732A (xx) 1971-10-27

Family

ID=25077853

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1251732D Expired GB1251732A (xx) 1968-10-11 1969-09-26

Country Status (8)

Country Link
JP (1) JPS4941957B1 (xx)
BE (1) BE740085A (xx)
CH (1) CH494474A (xx)
DE (1) DE1948052C3 (xx)
FR (1) FR2020370B1 (xx)
GB (1) GB1251732A (xx)
NL (1) NL164159C (xx)
SE (1) SE359403B (xx)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2240427A (en) * 1990-01-25 1991-07-31 Nissan Motor Guard rings for semiconductor devices

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3440500A (en) * 1966-09-26 1969-04-22 Itt High frequency field effect transistor
FR1538402A (fr) * 1967-06-30 1968-09-06 Radiotechnique Coprim Rtc Procédé de fabrication de dispositifs semi-conducteurs intégrés

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2240427A (en) * 1990-01-25 1991-07-31 Nissan Motor Guard rings for semiconductor devices
US5184204A (en) * 1990-01-25 1993-02-02 Nissan Motor Co., Ltd. Semiconductor device with high surge endurance
GB2240427B (en) * 1990-01-25 1993-11-24 Nissan Motor Semiconductor device with high surge endurance

Also Published As

Publication number Publication date
DE1948052B2 (de) 1973-11-08
NL164159C (nl) 1980-11-17
CH494474A (de) 1970-07-31
FR2020370B1 (xx) 1973-11-16
SE359403B (xx) 1973-08-27
JPS4941957B1 (xx) 1974-11-12
DE1948052C3 (de) 1975-03-06
BE740085A (xx) 1970-03-16
NL6914376A (xx) 1970-04-14
FR2020370A1 (xx) 1970-07-10
DE1948052A1 (de) 1970-04-16
NL164159B (nl) 1980-06-16

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee