GB1214675A - Improvements in or relating to equipment for glow discharge processing - Google Patents

Improvements in or relating to equipment for glow discharge processing

Info

Publication number
GB1214675A
GB1214675A GB1139368A GB1139368A GB1214675A GB 1214675 A GB1214675 A GB 1214675A GB 1139368 A GB1139368 A GB 1139368A GB 1139368 A GB1139368 A GB 1139368A GB 1214675 A GB1214675 A GB 1214675A
Authority
GB
United Kingdom
Prior art keywords
cathode
ion source
relating
equipment
bombarded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1139368A
Inventor
Terence James Mullahy
Peter Norgate
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GV Planer Ltd
Original Assignee
GV Planer Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GV Planer Ltd filed Critical GV Planer Ltd
Priority to GB1139368A priority Critical patent/GB1214675A/en
Publication of GB1214675A publication Critical patent/GB1214675A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1,214,675. Particle bombardment apparatus. G. V. PLANER Ltd. June 5, 1969 [March 8,1968] No.11393/68. Heading C7F. Apparatus for particle bombardment comprises an evacuable chamber 2 containing an ion source, e.g. electron emitter 8 acting with anode 9 in an Ar atmosphere, a cathode comprising the material 7 to be bombarded with or without a conducting carrier 6 for said material, and a conductive grid 4 maintained at substantially the same potential as said cathode and placed between said cathode and ion source such that on activation of the ion source with the chamber at reduced pressure the material is subjected to ion bombardment and surface removal. The apparatus may be used for accurate etching of a non-conductor 7 through a resist mask 10 or else the particles ejected from the material being bombarded may be coated onto a substrate, i.e. by cathode sputtering, Fig. 3 (not shown).
GB1139368A 1968-03-08 1968-03-08 Improvements in or relating to equipment for glow discharge processing Expired GB1214675A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB1139368A GB1214675A (en) 1968-03-08 1968-03-08 Improvements in or relating to equipment for glow discharge processing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1139368A GB1214675A (en) 1968-03-08 1968-03-08 Improvements in or relating to equipment for glow discharge processing

Publications (1)

Publication Number Publication Date
GB1214675A true GB1214675A (en) 1970-12-02

Family

ID=9985411

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1139368A Expired GB1214675A (en) 1968-03-08 1968-03-08 Improvements in or relating to equipment for glow discharge processing

Country Status (1)

Country Link
GB (1) GB1214675A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4309267A (en) * 1980-07-21 1982-01-05 Bell Telephone Laboratories, Incorporated Reactive sputter etching apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4309267A (en) * 1980-07-21 1982-01-05 Bell Telephone Laboratories, Incorporated Reactive sputter etching apparatus

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Legal Events

Date Code Title Description
PS Patent sealed
414B Case decided by the comptroller ** grants allowed (sect. 14/1949)
435 Patent endorsed 'licences of right' on the date specified (sect. 35/1949)
PCNP Patent ceased through non-payment of renewal fee