GB1201732A - Manufacture of semiconductor elements - Google Patents
Manufacture of semiconductor elementsInfo
- Publication number
- GB1201732A GB1201732A GB2114068A GB2114068A GB1201732A GB 1201732 A GB1201732 A GB 1201732A GB 2114068 A GB2114068 A GB 2114068A GB 2114068 A GB2114068 A GB 2114068A GB 1201732 A GB1201732 A GB 1201732A
- Authority
- GB
- United Kingdom
- Prior art keywords
- junction
- wafer
- portions
- alloying
- junction portions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 abstract 4
- 238000005275 alloying Methods 0.000 abstract 3
- 238000009792 diffusion process Methods 0.000 abstract 2
- 230000002093 peripheral effect Effects 0.000 abstract 2
- 239000000956 alloy Substances 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 238000000926 separation method Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
- H01L21/3043—Making grooves, e.g. cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Light Receiving Elements (AREA)
Abstract
1,201,732. Semi-conductor devices. WESTINGHOUSE BRAKE & SIGNAL CO. LIMITED. 24 April, 1969 [3 May, 1968], No. 21140/68. Addition to 1,182,820. Heading H1K. A semi-conductor wafer 1, Fig. 5, is provided with a first PN junction 6 parallel to its major faces and a plurality of PN junction portions 7, each of which comprises a central part parallel to the junction 6 and a peripheral part extending towards the major surface 2 of the wafer, and is then cut into discrete elements by an array of sloping-sided criss-cross cuts positioned such that the peripheral portions of the junction portions 7 emerge on the side walls of the separated elements. The cutting method is as disclosed in Specification 1,182,820. In the process illustrated by Fig. 5 the junction portions 7 are formed by selective diffusion or alloying through a mask into the surface 2. The separated elements may comprise diodes, but a three-electrode PNPN device may be formed by alloying Au/Sb to the upper surface 2 to form a further junction, apertures being left in the alloy material to allow control electrodes to be applied to the zones 31. Fig. 3 illustrates an alternative method of forming the junction portions 7. In this case the first treatment on the wafer comprises selective etching of the upper surface to form an array of recesses 4. The entire surface of the wafer is then subjected to a non-selective diffusion or alloying process to define the flat junction 6 and the junction portions 7, which line the recesses 4. A plug 10 of Au/Sb having therethrough a bore 11 is then placed in each recess and alloyed to the wafer to define a third junction 13 adjacent each recess 4. Separation is then carried out as previously and each element is provided with electrodes.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2114068A GB1201732A (en) | 1967-06-27 | 1968-05-03 | Manufacture of semiconductor elements |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2956067 | 1967-06-27 | ||
GB2989267A GB1182820A (en) | 1967-06-27 | 1967-06-27 | Manufacture of Semiconductor Elements. |
GB2114068A GB1201732A (en) | 1967-06-27 | 1968-05-03 | Manufacture of semiconductor elements |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1201732A true GB1201732A (en) | 1970-08-12 |
Family
ID=33162704
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB2114068A Expired GB1201732A (en) | 1967-06-27 | 1968-05-03 | Manufacture of semiconductor elements |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1201732A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2340128A1 (en) * | 1973-08-08 | 1975-02-20 | Semikron Gleichrichterbau | SEMICONDUCTOR COMPONENT |
-
1968
- 1968-05-03 GB GB2114068A patent/GB1201732A/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2340128A1 (en) * | 1973-08-08 | 1975-02-20 | Semikron Gleichrichterbau | SEMICONDUCTOR COMPONENT |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
435 | Patent endorsed 'licences of right' on the date specified (sect. 35/1949) | ||
PLNP | Patent lapsed through nonpayment of renewal fees |