GB1197757A - Process for the Deposition of Metals. - Google Patents
Process for the Deposition of Metals.Info
- Publication number
- GB1197757A GB1197757A GB34826/67A GB3482667A GB1197757A GB 1197757 A GB1197757 A GB 1197757A GB 34826/67 A GB34826/67 A GB 34826/67A GB 3482667 A GB3482667 A GB 3482667A GB 1197757 A GB1197757 A GB 1197757A
- Authority
- GB
- United Kingdom
- Prior art keywords
- hydrogen
- substrate
- fed
- coated
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052751 metal Inorganic materials 0.000 title abstract 2
- 239000002184 metal Substances 0.000 title abstract 2
- 150000002739 metals Chemical group 0.000 title abstract 2
- 230000008021 deposition Effects 0.000 title 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 4
- 239000001257 hydrogen Substances 0.000 abstract 4
- 229910052739 hydrogen Inorganic materials 0.000 abstract 4
- 229910052804 chromium Inorganic materials 0.000 abstract 3
- 239000011651 chromium Substances 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- 229910052719 titanium Inorganic materials 0.000 abstract 3
- 239000010936 titanium Substances 0.000 abstract 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract 1
- 229910001069 Ti alloy Inorganic materials 0.000 abstract 1
- 229910052786 argon Inorganic materials 0.000 abstract 1
- 150000001805 chlorine compounds Chemical class 0.000 abstract 1
- XBWRJSSJWDOUSJ-UHFFFAOYSA-L chromium(ii) chloride Chemical compound Cl[Cr]Cl XBWRJSSJWDOUSJ-UHFFFAOYSA-L 0.000 abstract 1
- 239000001307 helium Substances 0.000 abstract 1
- 229910052734 helium Inorganic materials 0.000 abstract 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 229910001507 metal halide Inorganic materials 0.000 abstract 1
- 150000005309 metal halides Chemical class 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 230000004048 modification Effects 0.000 abstract 1
- 238000012986 modification Methods 0.000 abstract 1
- 229910052750 molybdenum Inorganic materials 0.000 abstract 1
- 229910052758 niobium Inorganic materials 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- -1 titanium halides Chemical class 0.000 abstract 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 abstract 1
- YONPGGFAJWQGJC-UHFFFAOYSA-K titanium(iii) chloride Chemical compound Cl[Ti](Cl)Cl YONPGGFAJWQGJC-UHFFFAOYSA-K 0.000 abstract 1
- 229910052721 tungsten Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US57996366A | 1966-09-16 | 1966-09-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1197757A true GB1197757A (en) | 1970-07-08 |
Family
ID=24319073
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB34826/67A Expired GB1197757A (en) | 1966-09-16 | 1967-07-28 | Process for the Deposition of Metals. |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3516850A (enrdf_load_stackoverflow) |
| DE (1) | DE1621362A1 (enrdf_load_stackoverflow) |
| FR (1) | FR1564488A (enrdf_load_stackoverflow) |
| GB (1) | GB1197757A (enrdf_load_stackoverflow) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3658577A (en) * | 1969-10-01 | 1972-04-25 | Gene F Wakefield | Vapor phase deposition of silicide refractory coatings |
| BE757500A (fr) * | 1969-10-14 | 1971-03-16 | Ncr Co | Four tubulaire destine au traitement de dispositifs semi-conducteurs |
| US3787233A (en) * | 1969-10-14 | 1974-01-22 | Ncr | METHOD OF GROWING MOBILE POSITIVE ION FREE SiO{11 {11 FILMS |
| FR2205583B1 (enrdf_load_stackoverflow) * | 1972-11-07 | 1975-09-12 | Commissariat Energie Atomique | |
| US4374163A (en) * | 1981-09-29 | 1983-02-15 | Westinghouse Electric Corp. | Method of vapor deposition |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2887407A (en) * | 1957-08-05 | 1959-05-19 | Manufacturers Chemical Corp | Preparation of diffusion coatings on metals |
| US3072498A (en) * | 1961-02-28 | 1963-01-08 | Texaco Inc | Method of tin plating copper |
| US3147154A (en) * | 1961-05-25 | 1964-09-01 | Texaco Inc | Method of depositing metal-containing material onto an extended surface |
| US3351487A (en) * | 1963-11-06 | 1967-11-07 | Dow Chemical Co | Process for plating permeable membrane |
| US3373018A (en) * | 1965-02-17 | 1968-03-12 | Allied Chem | Production of rigid shapes of refractory metals by decomposition of the metal hexafluoride in the interstices of a green compact |
-
1966
- 1966-09-16 US US579963A patent/US3516850A/en not_active Expired - Lifetime
-
1967
- 1967-07-28 GB GB34826/67A patent/GB1197757A/en not_active Expired
- 1967-08-02 FR FR1564488D patent/FR1564488A/fr not_active Expired
- 1967-08-02 DE DE19671621362 patent/DE1621362A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR1564488A (enrdf_load_stackoverflow) | 1969-04-25 |
| DE1621362A1 (de) | 1971-05-13 |
| US3516850A (en) | 1970-06-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |