GB1175272A - Methods of Fabricating Semiconductor Devices. - Google Patents

Methods of Fabricating Semiconductor Devices.

Info

Publication number
GB1175272A
GB1175272A GB3932/67A GB393267A GB1175272A GB 1175272 A GB1175272 A GB 1175272A GB 3932/67 A GB3932/67 A GB 3932/67A GB 393267 A GB393267 A GB 393267A GB 1175272 A GB1175272 A GB 1175272A
Authority
GB
United Kingdom
Prior art keywords
layer
semi
conductor
aqueous solution
cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3932/67A
Other languages
English (en)
Inventor
Victor Charles Garbarini
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of GB1175272A publication Critical patent/GB1175272A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/04—Etching of light metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/14—Etching locally
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00—Subject matter not provided for in other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/60—Wet etching
    • H10P50/61—Electrolytic etching
    • H10P50/613—Electrolytic etching of Group IV materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/43—Encapsulations, e.g. protective coatings characterised by their materials comprising oxides, nitrides or carbides, e.g. ceramics or glasses

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
  • Electrodes Of Semiconductors (AREA)
GB3932/67A 1966-03-10 1967-01-26 Methods of Fabricating Semiconductor Devices. Expired GB1175272A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US533288A US3409523A (en) 1966-03-10 1966-03-10 Electroetching an aluminum plated semiconductor in a tetraalkylammonium hydroxide electrolyte

Publications (1)

Publication Number Publication Date
GB1175272A true GB1175272A (en) 1969-12-23

Family

ID=24125298

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3932/67A Expired GB1175272A (en) 1966-03-10 1967-01-26 Methods of Fabricating Semiconductor Devices.

Country Status (9)

Country Link
US (1) US3409523A (https=)
BE (1) BE693904A (https=)
DE (1) DE1614995B1 (https=)
ES (1) ES337928A1 (https=)
FR (1) FR1514460A (https=)
GB (1) GB1175272A (https=)
IL (1) IL27294A (https=)
NL (1) NL136512C (https=)
SE (1) SE308847B (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2000190A (en) * 1977-06-14 1979-01-04 Sony Corp Methods of electrolytically etching ferrite bodies and magnetic transducer heads including bodies so etched

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7002117A (https=) * 1970-02-14 1971-08-17
US3775274A (en) * 1970-06-30 1973-11-27 Hughes Aircraft Co Electrolytic anticompromise process
US3678348A (en) * 1970-11-23 1972-07-18 Communications Transistor Corp Method and apparatus for etching fine line patterns in metal on semiconductive devices
JPS5232234B2 (https=) * 1971-10-11 1977-08-19
US4339340A (en) 1975-11-26 1982-07-13 Tokyo Shibaura Electric Co., Ltd. Surface-treating agent adapted for intermediate products of a semiconductor device
FR2407746A1 (fr) * 1977-11-07 1979-06-01 Commissariat Energie Atomique Electrode pour cellule d'electrolyse, notamment pour cellule d'affichage electrolytique et son procede de fabrication
US4215497A (en) * 1978-08-04 1980-08-05 Levy John C Tag
DE3406542A1 (de) * 1984-02-23 1985-08-29 Telefunken electronic GmbH, 7100 Heilbronn Verfahren zum herstellen eines halbleiterbauelementes
US4821096A (en) * 1985-12-23 1989-04-11 Intel Corporation Excess energy protection device
CN103849923A (zh) * 2014-03-07 2014-06-11 王夔 一种铝合金型材表面图案处理方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE540052A (https=) * 1955-06-13
DE1015541B (de) * 1956-02-09 1957-09-12 Licentia Gmbh Verfahren zum AEtzen elektrisch unsymmetrisch leitender Halbleiteranordnungen
US3160539A (en) * 1958-09-08 1964-12-08 Trw Semiconductors Inc Surface treatment of silicon
FR1380991A (fr) * 1963-01-29 1964-12-04 Rca Corp Procédé de fabrication de dispositifs semi-conducteurs

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2000190A (en) * 1977-06-14 1979-01-04 Sony Corp Methods of electrolytically etching ferrite bodies and magnetic transducer heads including bodies so etched
GB2000190B (en) * 1977-06-14 1982-03-17 Sony Corp Methods of electrolytically etching ferrite bodies and magnetic transducer heads including bodies so etched

Also Published As

Publication number Publication date
SE308847B (https=) 1969-02-24
FR1514460A (fr) 1968-02-23
NL136512C (https=) 1972-09-15
US3409523A (en) 1968-11-05
ES337928A1 (es) 1968-03-16
IL27294A (en) 1970-08-19
BE693904A (https=) 1967-07-17
DE1614995B1 (de) 1971-03-11
NL6701708A (https=) 1967-09-11

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees