GB1170458A - Photoreprographic Composition, Reproduction Material Coated Therewith and Printing Plates Produced from said Material - Google Patents

Photoreprographic Composition, Reproduction Material Coated Therewith and Printing Plates Produced from said Material

Info

Publication number
GB1170458A
GB1170458A GB653467A GB653467A GB1170458A GB 1170458 A GB1170458 A GB 1170458A GB 653467 A GB653467 A GB 653467A GB 653467 A GB653467 A GB 653467A GB 1170458 A GB1170458 A GB 1170458A
Authority
GB
United Kingdom
Prior art keywords
composition
support
photoreprographic
diazide
naphthylamine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB653467A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of GB1170458A publication Critical patent/GB1170458A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0223—Iminoquinonediazides; Para-quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
GB653467A 1966-02-12 1967-02-10 Photoreprographic Composition, Reproduction Material Coated Therewith and Printing Plates Produced from said Material Expired GB1170458A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK0058406 1966-02-12

Publications (1)

Publication Number Publication Date
GB1170458A true GB1170458A (en) 1969-11-12

Family

ID=7228676

Family Applications (1)

Application Number Title Priority Date Filing Date
GB653467A Expired GB1170458A (en) 1966-02-12 1967-02-10 Photoreprographic Composition, Reproduction Material Coated Therewith and Printing Plates Produced from said Material

Country Status (9)

Country Link
AT (1) AT272380B (zh)
BE (1) BE693873A (zh)
CH (1) CH485256A (zh)
DE (1) DE1522496A1 (zh)
ES (1) ES336736A1 (zh)
FR (1) FR1510796A (zh)
GB (1) GB1170458A (zh)
NL (1) NL6701622A (zh)
SE (1) SE333098B (zh)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1981001756A1 (en) * 1979-12-07 1981-06-25 Minnesota Mining & Mfg Diazonium imaging system
US4394433A (en) 1979-12-07 1983-07-19 Minnesota Mining And Manufacturing Company Diazonium imaging system
US4564581A (en) * 1981-06-19 1986-01-14 Sericol Group Limited Process of preparing screen stencil using diazo photosensitive compositions with acidic p-H indicator
US4578341A (en) * 1981-03-24 1986-03-25 Sensitisers (Research) Ltd. Acidic photosensitive relief image-forming materials with indicator pigment or dye
WO1986007473A1 (en) * 1985-06-03 1986-12-18 Fairmount Chemical Co., Inc. Contrast enhancement layer
US4828960A (en) * 1985-01-07 1989-05-09 Honeywell Inc. Reflection limiting photoresist composition with two azo dyes

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1347759A (en) * 1971-06-17 1974-02-27 Howson Algraphy Ltd Light sensitive materials
JPS5562444A (en) * 1978-11-02 1980-05-10 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS58211141A (ja) * 1982-06-02 1983-12-08 Fuji Photo Film Co Ltd ネガ型感光性平版印刷版
GB2196143B (en) * 1986-10-08 1990-03-28 Canon Kk Recording medium and process for forming color image with use of the same

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1981001756A1 (en) * 1979-12-07 1981-06-25 Minnesota Mining & Mfg Diazonium imaging system
US4394433A (en) 1979-12-07 1983-07-19 Minnesota Mining And Manufacturing Company Diazonium imaging system
US4578341A (en) * 1981-03-24 1986-03-25 Sensitisers (Research) Ltd. Acidic photosensitive relief image-forming materials with indicator pigment or dye
US4564581A (en) * 1981-06-19 1986-01-14 Sericol Group Limited Process of preparing screen stencil using diazo photosensitive compositions with acidic p-H indicator
US4828960A (en) * 1985-01-07 1989-05-09 Honeywell Inc. Reflection limiting photoresist composition with two azo dyes
WO1986007473A1 (en) * 1985-06-03 1986-12-18 Fairmount Chemical Co., Inc. Contrast enhancement layer
US4672021A (en) * 1985-06-03 1987-06-09 Fairmount Chemical Company Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder

Also Published As

Publication number Publication date
DE1522496A1 (de) 1969-09-11
ES336736A1 (es) 1968-01-01
AT272380B (de) 1969-07-10
NL6701622A (zh) 1967-08-14
CH485256A (de) 1970-01-31
SE333098B (zh) 1971-03-01
FR1510796A (fr) 1968-01-19
BE693873A (zh) 1967-08-09

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