GB1169991A - Improvements in or relating to Cathode Sputtering Apparatus - Google Patents

Improvements in or relating to Cathode Sputtering Apparatus

Info

Publication number
GB1169991A
GB1169991A GB525367A GB525367A GB1169991A GB 1169991 A GB1169991 A GB 1169991A GB 525367 A GB525367 A GB 525367A GB 525367 A GB525367 A GB 525367A GB 1169991 A GB1169991 A GB 1169991A
Authority
GB
United Kingdom
Prior art keywords
cathode
constituents
produced
nickel
sputtering apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB525367A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of GB1169991A publication Critical patent/GB1169991A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1,169,991. Cathode sputtering apparatus. SIEMENS A. G. Feb. 3, 1967 [Feb. 4, 1966], No. 5253/67. Heading C7F. To obtain a predetermined mix of several constituents in a layer formed by sputtering, a cathode having a surface formed by separate areas of the constituents is used in a sputtering apparatus in which a plasma is produced other than by a potential between the cathode and anode. The surface areas of the constituents are so chosen that, with the rates of release of the individual constituents taken into account, the desired result is obtained. One constituent may be a disc, with the remaining constituents mounted on it in an array, or the cathode may comprise a disc divided into sectors and a rotatable body which is of one constituent and can be turned to selectively mask the constituents in the sectors of the disc. For example iron and nickel sectors may be masked by a nickel body, and the nickel body may be moved to adjust the composition of the iron-nickel alloy layer produced. The individual components of the cathode may be insulated from one another and placed at differing potentials, so that by connecting certain only of them as the cathode and placing the others at the potential of the anode, then changing the connections, laminated layers of differing composition can be produced. For example nickel-iron layers may be separated by layers of copper. The plasma in the sputtering apparatus may be produced by electron beams within the sputtering vessel. Alternatively the apparatus may comprise a cathode near one end of a slotted cylindrical anode which is surrounded by a container and penetrated, when in use, by a high-frequency magnetic field directed axially in relation to it, so that a ring discharge plasma is produced.
GB525367A 1966-02-04 1967-02-03 Improvements in or relating to Cathode Sputtering Apparatus Expired GB1169991A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DES0101807 1966-02-04

Publications (1)

Publication Number Publication Date
GB1169991A true GB1169991A (en) 1969-11-12

Family

ID=7524009

Family Applications (1)

Application Number Title Priority Date Filing Date
GB525367A Expired GB1169991A (en) 1966-02-04 1967-02-03 Improvements in or relating to Cathode Sputtering Apparatus

Country Status (4)

Country Link
DE (1) DE1515314C2 (en)
FR (1) FR1518811A (en)
GB (1) GB1169991A (en)
NL (1) NL6618296A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3030320A1 (en) * 1980-08-11 1982-03-11 W.C. Heraeus Gmbh, 6450 Hanau Composite targets for cathodic sputtering - where shrink-fits are used to hold one target material in corresp. recesses or holes in other target material

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2940369C2 (en) * 1979-10-05 1982-10-21 W.C. Heraeus Gmbh, 6450 Hanau Target
GB2102027A (en) * 1981-07-18 1983-01-26 Gen Eng Radcliffe 1979 Target for magnetically enhanced sputtering of chromium-iron alloy

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE465699C (en) * 1926-07-22 1928-09-21 Ernst Albers Schoenberg Dr Cathode consisting of pieces of different metals for the production of electrical resistors
DE542404C (en) * 1929-03-06 1932-01-23 Steatit Magnesia Akt Ges Process for the production of high value resistors
GB830391A (en) * 1955-10-28 1960-03-16 Edwards High Vacuum Ltd Improvements in or relating to cathodic sputtering of metal and dielectric films

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3030320A1 (en) * 1980-08-11 1982-03-11 W.C. Heraeus Gmbh, 6450 Hanau Composite targets for cathodic sputtering - where shrink-fits are used to hold one target material in corresp. recesses or holes in other target material

Also Published As

Publication number Publication date
FR1518811A (en) 1968-03-29
DE1515314C2 (en) 1973-12-13
NL6618296A (en) 1967-08-07
DE1515314B1 (en) 1973-05-30

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