GB1116674A - Naphthoquinone diazide sulphofluoride - Google Patents

Naphthoquinone diazide sulphofluoride

Info

Publication number
GB1116674A
GB1116674A GB8727/66A GB872766A GB1116674A GB 1116674 A GB1116674 A GB 1116674A GB 8727/66 A GB8727/66 A GB 8727/66A GB 872766 A GB872766 A GB 872766A GB 1116674 A GB1116674 A GB 1116674A
Authority
GB
United Kingdom
Prior art keywords
sulphofluoride
naphthoquinone diazide
treating
sulphonic acid
diazide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8727/66A
Other languages
English (en)
Inventor
Gerard Albert Delzenne
Urbain Leopold Laridon
Johan Lodewijk Verelst
Hugo Vital Van Goethem
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Gevaert NV
Original Assignee
Agfa Gevaert NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert NV filed Critical Agfa Gevaert NV
Priority to GB8727/66A priority Critical patent/GB1116674A/en
Priority to NL6701699A priority patent/NL6701699A/xx
Priority to US614544A priority patent/US3495979A/en
Priority to FR94745A priority patent/FR1511335A/fr
Priority to CH267267A priority patent/CH472059A/fr
Priority to DE19671522458 priority patent/DE1522458A1/de
Priority to BE694653D priority patent/BE694653A/xx
Publication of GB1116674A publication Critical patent/GB1116674A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
GB8727/66A 1966-02-28 1966-02-28 Naphthoquinone diazide sulphofluoride Expired GB1116674A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
GB8727/66A GB1116674A (en) 1966-02-28 1966-02-28 Naphthoquinone diazide sulphofluoride
NL6701699A NL6701699A (enExample) 1966-02-28 1967-02-03
US614544A US3495979A (en) 1966-02-28 1967-02-08 Copying material for use in the photochemical preparation of printing plates
FR94745A FR1511335A (fr) 1966-02-28 1967-02-09 Matériel de copie utilisé dans la préparation photochimique de planches d'impression
CH267267A CH472059A (fr) 1966-02-28 1967-02-23 Matériel de copie utilisable dans la préparation photochimique de planches d'impression
DE19671522458 DE1522458A1 (de) 1966-02-28 1967-02-24 Material und Verfahren zur Herstellung von Druckformen
BE694653D BE694653A (enExample) 1966-02-28 1967-02-27

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8727/66A GB1116674A (en) 1966-02-28 1966-02-28 Naphthoquinone diazide sulphofluoride

Publications (1)

Publication Number Publication Date
GB1116674A true GB1116674A (en) 1968-06-12

Family

ID=9858093

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8727/66A Expired GB1116674A (en) 1966-02-28 1966-02-28 Naphthoquinone diazide sulphofluoride

Country Status (7)

Country Link
US (1) US3495979A (enExample)
BE (1) BE694653A (enExample)
CH (1) CH472059A (enExample)
DE (1) DE1522458A1 (enExample)
FR (1) FR1511335A (enExample)
GB (1) GB1116674A (enExample)
NL (1) NL6701699A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2127175A (en) * 1982-09-07 1984-04-04 Letraset International Ltd Manufacture of signs

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3637384A (en) * 1969-02-17 1972-01-25 Gaf Corp Positive-working diazo-oxide terpolymer photoresists
US3984250A (en) * 1970-02-12 1976-10-05 Eastman Kodak Company Light-sensitive diazoketone and azide compositions and photographic elements
NL165852C (nl) * 1970-09-29 1981-05-15 Hoechst Ag Werkwijze voor het vervaardigen van een reprografisch kopieermateriaal door een lichtgevoelige laag aan te brengen op een drager.
US3890153A (en) * 1971-03-13 1975-06-17 Philips Corp Positive-acting napthoquinone diazide photosensitive composition
US3920455A (en) * 1971-05-28 1975-11-18 Polychrome Corp Light-sensitive compositions and materials with O-naphthoquinone diazide sulfonyl esters
JPS4833905A (enExample) * 1971-09-02 1973-05-15
US3900325A (en) * 1972-06-12 1975-08-19 Shipley Co Light sensitive quinone diazide composition with n-3-oxohydrocarbon substituted acrylamide
US4164421A (en) * 1972-12-09 1979-08-14 Fuji Photo Film Co., Ltd. Photocurable composition containing an o-quinonodiazide for printing plate
DE2331377C2 (de) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Kopiermaterial
US4123279A (en) * 1974-03-25 1978-10-31 Fuji Photo Film Co., Ltd. Light-sensitive o-quinonediazide containing planographic printing plate
US4259430A (en) * 1974-05-01 1981-03-31 International Business Machines Corporation Photoresist O-quinone diazide containing composition and resist mask formation process
US4093461A (en) * 1975-07-18 1978-06-06 Gaf Corporation Positive working thermally stable photoresist composition, article and method of using
US4339522A (en) * 1979-06-18 1982-07-13 International Business Machines Corporation Ultra-violet lithographic resist composition and process
US4284706A (en) * 1979-12-03 1981-08-18 International Business Machines Corporation Lithographic resist composition for a lift-off process
US4379830A (en) * 1981-10-06 1983-04-12 Polychrome Corporation Developer for positive photolithographic articles
JPS63265242A (ja) * 1987-04-23 1988-11-01 Fuji Photo Film Co Ltd 多色画像形成方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1847513A (en) * 1932-03-01 Pbocess pob pbepabing diazonitjm pittoro-sttlphonates
US807422A (en) * 1905-09-15 1905-12-12 Kalle And Company Ag Zinc azonaphthol dye and process of making same.
US1444469A (en) * 1917-05-31 1923-02-06 Firm Of Kalle & Co Ag Manufacture of light copy paper
DE462399C (de) * 1926-11-12 1928-07-10 Kalle & Co Akt Ges Verfahren zur Herstellung von Diazolichtbildern unter Anwendung von Metallsalzen
NL46296C (enExample) * 1930-02-05
US2436697A (en) * 1944-07-31 1948-02-24 American Cyanamid Co Sulfofluorides of azoic dyestuffs
NL199484A (enExample) * 1954-08-20
DE1447015B2 (de) * 1963-10-03 1973-03-15 Kalle Ag, 6202 Wiesbaden-Biebrich Lichtempfindliche schichten zur herstellung von druckformen

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2127175A (en) * 1982-09-07 1984-04-04 Letraset International Ltd Manufacture of signs

Also Published As

Publication number Publication date
DE1522458A1 (de) 1969-07-31
BE694653A (enExample) 1967-08-28
NL6701699A (enExample) 1967-04-25
US3495979A (en) 1970-02-17
FR1511335A (fr) 1968-01-26
CH472059A (fr) 1969-04-30

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