GB1058050A - Masking apparatus - Google Patents

Masking apparatus

Info

Publication number
GB1058050A
GB1058050A GB4381665A GB4381665A GB1058050A GB 1058050 A GB1058050 A GB 1058050A GB 4381665 A GB4381665 A GB 4381665A GB 4381665 A GB4381665 A GB 4381665A GB 1058050 A GB1058050 A GB 1058050A
Authority
GB
United Kingdom
Prior art keywords
plate
substrate
moved
frame
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4381665A
Inventor
Stanley Carden Shepard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STC PLC
Original Assignee
Standard Telephone and Cables PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Standard Telephone and Cables PLC filed Critical Standard Telephone and Cables PLC
Priority to GB4381665A priority Critical patent/GB1058050A/en
Publication of GB1058050A publication Critical patent/GB1058050A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)

Abstract

<PICT:1058050/C6-C7/1> In the vapour deposition of a metal or dielectric material on a substrate which is moved on a frame through a series of vacuum chambers separated by seals, the frame is moved intermittently by a reciprocating slide, Fig.3 (not shown), and the substrate 47 is supported in a hole 50 in a plate 22 by lugs 51 on a plate 46. A mask 14 is carried by a support 48 and is moved vertically through the hole in the plate 22 to allow it to be clamped against the substrate, and inclined guides 37 position the substrate correctly. The subtrate is heated before or during coating by a plate 15. To form a capacitance-resistance network, Au or Cr is deposited on the base, then a Ni-Cr alloy, followed by Al, silicon monoxide and Al.
GB4381665A 1965-10-15 1965-10-15 Masking apparatus Expired GB1058050A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB4381665A GB1058050A (en) 1965-10-15 1965-10-15 Masking apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4381665A GB1058050A (en) 1965-10-15 1965-10-15 Masking apparatus

Publications (1)

Publication Number Publication Date
GB1058050A true GB1058050A (en) 1967-02-08

Family

ID=10430415

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4381665A Expired GB1058050A (en) 1965-10-15 1965-10-15 Masking apparatus

Country Status (1)

Country Link
GB (1) GB1058050A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3747558A (en) * 1972-11-03 1973-07-24 Us Air Force Cross-mounted mask changer with thickness monitoring
WO2013026493A1 (en) * 2011-08-25 2013-02-28 Applied Materials, Inc. Corner cut mask

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3747558A (en) * 1972-11-03 1973-07-24 Us Air Force Cross-mounted mask changer with thickness monitoring
WO2013026493A1 (en) * 2011-08-25 2013-02-28 Applied Materials, Inc. Corner cut mask
CN103781935A (en) * 2011-08-25 2014-05-07 应用材料公司 Corner cut mask
JP2014529011A (en) * 2011-08-25 2014-10-30 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Mask structure, apparatus and method for depositing a layer on a rectangular substrate
CN103781935B (en) * 2011-08-25 2017-07-11 应用材料公司 To sedimentary in the mask structure on substrate, device and method

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