JPS528991A - Gas phase reacting apparatus - Google Patents

Gas phase reacting apparatus

Info

Publication number
JPS528991A
JPS528991A JP8442975A JP8442975A JPS528991A JP S528991 A JPS528991 A JP S528991A JP 8442975 A JP8442975 A JP 8442975A JP 8442975 A JP8442975 A JP 8442975A JP S528991 A JPS528991 A JP S528991A
Authority
JP
Japan
Prior art keywords
gas phase
reacting apparatus
phase reacting
film
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8442975A
Other languages
Japanese (ja)
Other versions
JPS5830386B2 (en
Inventor
Shoichi Kitane
Toshio Yonezawa
Shinichi Yamamoto
Shigeyuki Sawamukai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP8442975A priority Critical patent/JPS5830386B2/en
Publication of JPS528991A publication Critical patent/JPS528991A/en
Publication of JPS5830386B2 publication Critical patent/JPS5830386B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45502—Flow conditions in reaction chamber
    • C23C16/45508—Radial flow
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/4558—Perforated rings

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:An apparatus for forming a film on a semiconductor substrate by gas phase reaction.
JP8442975A 1975-07-11 1975-07-11 Kisouhan no Souchi Expired JPS5830386B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8442975A JPS5830386B2 (en) 1975-07-11 1975-07-11 Kisouhan no Souchi

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8442975A JPS5830386B2 (en) 1975-07-11 1975-07-11 Kisouhan no Souchi

Publications (2)

Publication Number Publication Date
JPS528991A true JPS528991A (en) 1977-01-24
JPS5830386B2 JPS5830386B2 (en) 1983-06-29

Family

ID=13830327

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8442975A Expired JPS5830386B2 (en) 1975-07-11 1975-07-11 Kisouhan no Souchi

Country Status (1)

Country Link
JP (1) JPS5830386B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03212933A (en) * 1990-01-18 1991-09-18 Tokyo Electron Ltd Heat treatment method
JPH0557588U (en) * 1992-01-14 1993-07-30 エスエムシー株式会社 Connector for fluid pressure equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03212933A (en) * 1990-01-18 1991-09-18 Tokyo Electron Ltd Heat treatment method
JPH0557588U (en) * 1992-01-14 1993-07-30 エスエムシー株式会社 Connector for fluid pressure equipment

Also Published As

Publication number Publication date
JPS5830386B2 (en) 1983-06-29

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