GB1036115A - Improvements in and relating to the production of metal layers or films - Google Patents
Improvements in and relating to the production of metal layers or filmsInfo
- Publication number
- GB1036115A GB1036115A GB2951463A GB2951463A GB1036115A GB 1036115 A GB1036115 A GB 1036115A GB 2951463 A GB2951463 A GB 2951463A GB 2951463 A GB2951463 A GB 2951463A GB 1036115 A GB1036115 A GB 1036115A
- Authority
- GB
- United Kingdom
- Prior art keywords
- metal
- films
- relating
- production
- metal layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Weting (AREA)
Abstract
<PICT:1036115/C6-C7/1> A metal film 60 e.g. of Al or Au is selectively deposited by evaporation on to a supporting surface 6, particularly for producing metallized patterns in minute electric circuit elements and semiconductor devices e.g. silicon double diffused planar transistors (as shown, see Division H1), by coating portions of the surface with a vaporizable material, e.g. a photoresist 17 covering an oxide coating 8, and vaporizing the material during metal deposition to inhibit the formation of an adherent deposit of metal on the surface portions. Alternatively the whole surface may be coated with a vaporizable material and material from areas on which metal is to be deposited locally removed, e.g by etching.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US21260362A | 1962-07-26 | 1962-07-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1036115A true GB1036115A (en) | 1966-07-13 |
Family
ID=22791711
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB2951463A Expired GB1036115A (en) | 1962-07-26 | 1963-07-25 | Improvements in and relating to the production of metal layers or films |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB1036115A (en) |
-
1963
- 1963-07-25 GB GB2951463A patent/GB1036115A/en not_active Expired
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