GB1023025A - Presensitized foil for planographic and offset printing - Google Patents
Presensitized foil for planographic and offset printingInfo
- Publication number
- GB1023025A GB1023025A GB12183/63A GB1218363A GB1023025A GB 1023025 A GB1023025 A GB 1023025A GB 12183/63 A GB12183/63 A GB 12183/63A GB 1218363 A GB1218363 A GB 1218363A GB 1023025 A GB1023025 A GB 1023025A
- Authority
- GB
- United Kingdom
- Prior art keywords
- aldehyde
- acid
- presensitized
- planographic
- foil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011888 foil Substances 0.000 title 1
- 238000007645 offset printing Methods 0.000 title 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 abstract 3
- 239000002253 acid Substances 0.000 abstract 3
- 150000001299 aldehydes Chemical class 0.000 abstract 3
- 150000002576 ketones Chemical class 0.000 abstract 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 abstract 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 abstract 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 abstract 2
- 239000012954 diazonium Substances 0.000 abstract 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 abstract 2
- KJPRLNWUNMBNBZ-QPJJXVBHSA-N (E)-cinnamaldehyde Chemical compound O=C\C=C\C1=CC=CC=C1 KJPRLNWUNMBNBZ-QPJJXVBHSA-N 0.000 abstract 1
- SQAINHDHICKHLX-UHFFFAOYSA-N 1-naphthaldehyde Chemical compound C1=CC=C2C(C=O)=CC=CC2=C1 SQAINHDHICKHLX-UHFFFAOYSA-N 0.000 abstract 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 abstract 1
- LCTONWCANYUPML-UHFFFAOYSA-N Pyruvic acid Chemical compound CC(=O)C(O)=O LCTONWCANYUPML-UHFFFAOYSA-N 0.000 abstract 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 229910052785 arsenic Inorganic materials 0.000 abstract 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 abstract 1
- 229940117916 cinnamic aldehyde Drugs 0.000 abstract 1
- KJPRLNWUNMBNBZ-UHFFFAOYSA-N cinnamic aldehyde Natural products O=CC=CC1=CC=CC=C1 KJPRLNWUNMBNBZ-UHFFFAOYSA-N 0.000 abstract 1
- 239000007859 condensation product Substances 0.000 abstract 1
- 150000001989 diazonium salts Chemical class 0.000 abstract 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 abstract 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 abstract 1
- QJZUKDFHGGYHMC-UHFFFAOYSA-N pyridine-3-carbaldehyde Chemical compound O=CC1=CC=CN=C1 QJZUKDFHGGYHMC-UHFFFAOYSA-N 0.000 abstract 1
- MGCGJBXTNWUHQE-UHFFFAOYSA-N quinoline-4-carbaldehyde Chemical compound C1=CC=C2C(C=O)=CC=NC2=C1 MGCGJBXTNWUHQE-UHFFFAOYSA-N 0.000 abstract 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract 1
- 229920002554 vinyl polymer Polymers 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2/00—Addition polymers of aldehydes or cyclic oligomers thereof or of ketones; Addition copolymers thereof with less than 50 molar percent of other substances
- C08G2/06—Catalysts
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G12/00—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G12/00—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen
- C08G12/02—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes
- C08G12/04—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with acyclic or carbocyclic compounds
- C08G12/06—Amines
- C08G12/08—Amines aromatic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2/00—Addition polymers of aldehydes or cyclic oligomers thereof or of ketones; Addition copolymers thereof with less than 50 molar percent of other substances
- C08G2/18—Copolymerisation of aldehydes or ketones
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK46366A DE1297474B (de) | 1962-04-03 | 1962-04-03 | Vorsensibilisierte Flachdruckplatte und Verfahren zu ihrer Herstellung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1023025A true GB1023025A (en) | 1966-03-16 |
Family
ID=7224172
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB12183/63A Expired GB1023025A (en) | 1962-04-03 | 1963-03-27 | Presensitized foil for planographic and offset printing |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US3235382A (en:Method) |
| AT (1) | AT242504B (en:Method) |
| BE (1) | BE630566A (en:Method) |
| CH (1) | CH446895A (en:Method) |
| DE (1) | DE1297474B (en:Method) |
| DK (1) | DK109304C (en:Method) |
| GB (1) | GB1023025A (en:Method) |
| LU (1) | LU43460A1 (en:Method) |
| NL (2) | NL136528C (en:Method) |
| SE (1) | SE339168B (en:Method) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1249688B (en:Method) * | 1962-05-02 | |||
| DE1299661B (de) * | 1964-02-27 | 1969-07-24 | Eastman Kodak Co | Verfahren zur Verbesserung der hydrophilen Eigenschaften der Traeger von fuer Flachdruckverfahren geeigneten Druckplatten |
| DE1447955C3 (de) * | 1965-01-02 | 1978-10-05 | Hoechst Ag, 6000 Frankfurt | Verfahren zur Herstellung einer vorsensibilisierten Druckplatte |
| US3469983A (en) * | 1965-07-06 | 1969-09-30 | Gaf Corp | Preparation of photopolymer lithographic offset paper plates |
| JPS4910841B1 (en:Method) * | 1965-12-18 | 1974-03-13 | ||
| US3719491A (en) * | 1968-06-18 | 1973-03-06 | Gaf Corp | Diazo-type reproduction process |
| US3867147A (en) * | 1969-05-20 | 1975-02-18 | Hoechst Co American | Light-sensitive diazo compounds and reproduction material employing the same |
| NL7109179A (en:Method) * | 1970-07-13 | 1972-01-17 | ||
| US4021243A (en) * | 1970-08-20 | 1977-05-03 | Hoechst Aktiengesellschaft | Diazo light-sensitive copying composition and process of using in the manufacture of screen printing stencils |
| US3847614A (en) * | 1971-09-13 | 1974-11-12 | Scott Paper Co | Diazo photopolymer composition and article comprising carboxylated resin |
| JPS516563B2 (en:Method) * | 1972-03-05 | 1976-02-28 | ||
| US3997349A (en) * | 1974-06-17 | 1976-12-14 | Minnesota Mining And Manufacturing Company | Light-sensitive development-free driographic printing plate |
| US4299907A (en) * | 1978-08-10 | 1981-11-10 | Polychrome Corporation | Storage stable photosensitive diazo lithographic printing plates |
| US4533619A (en) * | 1982-03-18 | 1985-08-06 | American Hoechst Corporation | Acid stabilizers for diazonium compound condensation products |
| US4544466A (en) * | 1983-12-06 | 1985-10-01 | Phillips Petroleum Company | Process of making U.V. cured polyurethanes using diazonium salt promoters |
| DE3418111A1 (de) * | 1984-05-16 | 1985-11-21 | Hoechst Ag, 6230 Frankfurt | Verfahren zur nachbehandlung von aluminiumoxidschichten mit phosphoroxo-anionen enthaltenden waessrigen loesungen und deren verwendung bei der herstellung von offsetdruckplattentraegern |
| US5122442A (en) * | 1989-07-28 | 1992-06-16 | Hoechst Celanese Corporation | Method for forming an image from a high speed screen printing composition on a screen mesh |
| JPH05142767A (ja) * | 1991-11-19 | 1993-06-11 | Toyo Gosei Kogyo Kk | 感光性組成物 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2679498A (en) * | 1954-05-25 | Atent office | ||
| NL35423C (en:Method) * | 1931-12-09 | |||
| DE596731C (de) * | 1932-05-23 | 1934-05-09 | Kalle & Co Akt Ges | Verfahren zur Darstellung von hoehermolekularen Diazoverbindungen |
| NL70798C (en:Method) * | 1948-10-15 |
-
0
- BE BE630566D patent/BE630566A/xx unknown
- NL NL290570D patent/NL290570A/xx unknown
- NL NL136528D patent/NL136528C/xx active
-
1962
- 1962-04-03 DE DEK46366A patent/DE1297474B/de not_active Withdrawn
-
1963
- 1963-03-27 GB GB12183/63A patent/GB1023025A/en not_active Expired
- 1963-04-01 US US269758A patent/US3235382A/en not_active Expired - Lifetime
- 1963-04-01 SE SE03576/63A patent/SE339168B/xx unknown
- 1963-04-01 LU LU43460D patent/LU43460A1/xx unknown
- 1963-04-02 DK DK151163AA patent/DK109304C/da active
- 1963-04-02 CH CH416763A patent/CH446895A/de unknown
- 1963-04-03 AT AT267963A patent/AT242504B/de active
Also Published As
| Publication number | Publication date |
|---|---|
| AT242504B (de) | 1965-09-27 |
| BE630566A (en:Method) | |
| US3235382A (en) | 1966-02-15 |
| NL290570A (en:Method) | |
| LU43460A1 (en:Method) | 1964-10-01 |
| SE339168B (en:Method) | 1971-09-27 |
| CH446895A (de) | 1967-11-15 |
| DE1297474B (de) | 1969-06-12 |
| NL136528C (en:Method) | |
| DK109304C (da) | 1968-04-08 |
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