FR2930680B1 - Procede de fabrication d'une cellule photovoltaique a base de silicium en couches minces. - Google Patents
Procede de fabrication d'une cellule photovoltaique a base de silicium en couches minces.Info
- Publication number
- FR2930680B1 FR2930680B1 FR0802270A FR0802270A FR2930680B1 FR 2930680 B1 FR2930680 B1 FR 2930680B1 FR 0802270 A FR0802270 A FR 0802270A FR 0802270 A FR0802270 A FR 0802270A FR 2930680 B1 FR2930680 B1 FR 2930680B1
- Authority
- FR
- France
- Prior art keywords
- thin film
- photovoltaic cell
- film silicon
- manufacturing thin
- silicon photovoltaic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 229910052710 silicon Inorganic materials 0.000 title 1
- 239000010703 silicon Substances 0.000 title 1
- 239000010409 thin film Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
- H01L31/182—Special manufacturing methods for polycrystalline Si, e.g. Si ribbon, poly Si ingots, thin films of polycrystalline Si
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0368—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including polycrystalline semiconductors
- H01L31/03682—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including polycrystalline semiconductors including only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type
- H01L31/0745—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type comprising a AIVBIV heterojunction, e.g. Si/Ge, SiGe/Si or Si/SiC solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
- H01L31/1872—Recrystallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
- H01L31/202—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic Table
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/546—Polycrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Sustainable Energy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Photovoltaic Devices (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0802270A FR2930680B1 (fr) | 2008-04-23 | 2008-04-23 | Procede de fabrication d'une cellule photovoltaique a base de silicium en couches minces. |
EP09738349A EP2281313A2 (fr) | 2008-04-23 | 2009-04-20 | Procede de fabrication d'une cellule photovoltaïque a base de silicium en couches minces |
PCT/FR2009/000461 WO2009133315A2 (fr) | 2008-04-23 | 2009-04-20 | Procede de fabrication d'une cellule photovoltaïque a base de silicium en couches minces |
JP2011505554A JP2011519158A (ja) | 2008-04-23 | 2009-04-20 | シリコン系薄膜太陽電池の製造方法 |
KR1020107026108A KR20100136554A (ko) | 2008-04-23 | 2009-04-20 | 실리콘-계 박막 광기전성 셀의 제조방법 |
BRPI0911637-0A BRPI0911637A2 (pt) | 2008-04-23 | 2009-04-20 | processo de fabricação de uma célula fotovoltaica à base de silício em camadas |
US12/989,311 US8288196B2 (en) | 2008-04-23 | 2009-04-20 | Process for fabricating a silicon-based thin-film photovoltaic cell |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0802270A FR2930680B1 (fr) | 2008-04-23 | 2008-04-23 | Procede de fabrication d'une cellule photovoltaique a base de silicium en couches minces. |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2930680A1 FR2930680A1 (fr) | 2009-10-30 |
FR2930680B1 true FR2930680B1 (fr) | 2010-08-27 |
Family
ID=40342466
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0802270A Expired - Fee Related FR2930680B1 (fr) | 2008-04-23 | 2008-04-23 | Procede de fabrication d'une cellule photovoltaique a base de silicium en couches minces. |
Country Status (7)
Country | Link |
---|---|
US (1) | US8288196B2 (fr) |
EP (1) | EP2281313A2 (fr) |
JP (1) | JP2011519158A (fr) |
KR (1) | KR20100136554A (fr) |
BR (1) | BRPI0911637A2 (fr) |
FR (1) | FR2930680B1 (fr) |
WO (1) | WO2009133315A2 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8802485B2 (en) * | 2009-09-07 | 2014-08-12 | Tel Solar Ag | Method for manufacturing a photovoltaic cell structure |
US9018517B2 (en) | 2011-11-07 | 2015-04-28 | International Business Machines Corporation | Silicon heterojunction photovoltaic device with wide band gap emitter |
KR101879363B1 (ko) | 2017-01-17 | 2018-08-16 | 엘지전자 주식회사 | 태양 전지 제조 방법 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0416190B1 (fr) * | 1989-09-07 | 1994-06-01 | International Business Machines Corporation | Méthode de passivation des miroirs des diodes laser à semi-conducteur |
JPH06505368A (ja) * | 1991-01-17 | 1994-06-16 | クロスポイント・ソルーションズ・インコーポレイテッド | フィールドプログラム可能なゲートアレイに使用するための改良されたアンチヒューズ回路構造およびその製造方法 |
JPH06204137A (ja) * | 1992-10-19 | 1994-07-22 | Samsung Electron Co Ltd | 多結晶シリコン薄膜の製造方法 |
US5994164A (en) * | 1997-03-18 | 1999-11-30 | The Penn State Research Foundation | Nanostructure tailoring of material properties using controlled crystallization |
JP3814432B2 (ja) * | 1998-12-04 | 2006-08-30 | 三菱化学株式会社 | 化合物半導体発光素子 |
AU2002951838A0 (en) * | 2002-10-08 | 2002-10-24 | Unisearch Limited | Method of preparation for polycrystalline semiconductor films |
US7629236B2 (en) * | 2004-08-26 | 2009-12-08 | Alliance For Sustainable Energy, Llc | Method for passivating crystal silicon surfaces |
FR2883663B1 (fr) * | 2005-03-22 | 2007-05-11 | Commissariat Energie Atomique | Procede de fabrication d'une cellule photovoltaique a base de silicium en couche mince. |
US8795854B2 (en) * | 2005-08-01 | 2014-08-05 | Amit Goyal | Semiconductor-based, large-area, flexible, electronic devices on {110}<100> oriented substrates |
-
2008
- 2008-04-23 FR FR0802270A patent/FR2930680B1/fr not_active Expired - Fee Related
-
2009
- 2009-04-20 US US12/989,311 patent/US8288196B2/en not_active Expired - Fee Related
- 2009-04-20 EP EP09738349A patent/EP2281313A2/fr not_active Withdrawn
- 2009-04-20 KR KR1020107026108A patent/KR20100136554A/ko not_active Application Discontinuation
- 2009-04-20 WO PCT/FR2009/000461 patent/WO2009133315A2/fr active Application Filing
- 2009-04-20 JP JP2011505554A patent/JP2011519158A/ja not_active Withdrawn
- 2009-04-20 BR BRPI0911637-0A patent/BRPI0911637A2/pt not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US20110223711A1 (en) | 2011-09-15 |
US8288196B2 (en) | 2012-10-16 |
BRPI0911637A2 (pt) | 2018-03-27 |
EP2281313A2 (fr) | 2011-02-09 |
WO2009133315A2 (fr) | 2009-11-05 |
JP2011519158A (ja) | 2011-06-30 |
WO2009133315A3 (fr) | 2010-11-11 |
FR2930680A1 (fr) | 2009-10-30 |
KR20100136554A (ko) | 2010-12-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
TQ | Partial transmission of property | ||
TP | Transmission of property |
Owner name: COMMISSARIAT A L ENERGIE ATOMIQUE ET AUX ENERG, FR Effective date: 20111013 |
|
ST | Notification of lapse |
Effective date: 20131231 |