FR2864703B1 - Dispositif a diode photoemettrice organique, transistor a film mince pour celui-ci et leurs procedes de fabrication - Google Patents

Dispositif a diode photoemettrice organique, transistor a film mince pour celui-ci et leurs procedes de fabrication

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Publication number
FR2864703B1
FR2864703B1 FR0315564A FR0315564A FR2864703B1 FR 2864703 B1 FR2864703 B1 FR 2864703B1 FR 0315564 A FR0315564 A FR 0315564A FR 0315564 A FR0315564 A FR 0315564A FR 2864703 B1 FR2864703 B1 FR 2864703B1
Authority
FR
France
Prior art keywords
photodegrading
organic
methods
thin film
film transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
FR0315564A
Other languages
English (en)
Other versions
FR2864703A1 (fr
Inventor
Juhn Suk Yoo
Jae Yong Park
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Display Co Ltd
Original Assignee
LG Philips LCD Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR10-2002-0040409A external-priority patent/KR100473226B1/ko
Priority to US10/609,024 priority Critical patent/US6933529B2/en
Priority to CN03146362.2A priority patent/CN1477910B/zh
Priority to JP2003272877A priority patent/JP4044014B2/ja
Priority to DE10359248A priority patent/DE10359248B4/de
Priority to GB0329643A priority patent/GB2409571B/en
Application filed by LG Philips LCD Co Ltd filed Critical LG Philips LCD Co Ltd
Priority to FR0315564A priority patent/FR2864703B1/fr
Publication of FR2864703A1 publication Critical patent/FR2864703A1/fr
Publication of FR2864703B1 publication Critical patent/FR2864703B1/fr
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78696—Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the structure of the channel, e.g. multichannel, transverse or longitudinal shape, length or width, doping structure, or the overlap or alignment between the channel and the gate, the source or the drain, or the contacting structure of the channel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/417—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
    • H01L29/41725—Source or drain electrodes for field effect devices
    • H01L29/41733—Source or drain electrodes for field effect devices for thin film transistors with insulated gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409—Unipolar field-effect transistors
    • H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
    • H01L29/66742—Thin film unipolar transistors
    • H01L29/6675—Amorphous silicon or polysilicon transistors
    • H01L29/66765—Lateral single gate single channel transistors with inverted structure, i.e. the channel layer is formed after the gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
    • H01L29/78618—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure
    • H01L29/78621—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure with LDD structure or an extension or an offset region or characterised by the doping profile
    • H01L29/78624—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure with LDD structure or an extension or an offset region or characterised by the doping profile the source and the drain regions being asymmetrical
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Thin Film Transistor (AREA)
FR0315564A 2002-07-11 2003-12-30 Dispositif a diode photoemettrice organique, transistor a film mince pour celui-ci et leurs procedes de fabrication Expired - Lifetime FR2864703B1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
US10/609,024 US6933529B2 (en) 2002-07-11 2003-06-30 Active matrix type organic light emitting diode device and thin film transistor thereof
CN03146362.2A CN1477910B (zh) 2002-07-11 2003-07-10 有源矩阵型有机发光二极管器件及其薄膜晶体管
JP2003272877A JP4044014B2 (ja) 2002-07-11 2003-07-10 アクティブマトリクス型有機電界発光素子用薄膜トランジスタ
DE10359248A DE10359248B4 (de) 2002-07-11 2003-12-17 Verfahren, bei dem eine Aktivmatrixvorrichtung mit organischen Lichtemissionsdioden hergestellt wird
GB0329643A GB2409571B (en) 2002-07-11 2003-12-22 Active matrix type organic light emitting diode device and thin film transistor thereof
FR0315564A FR2864703B1 (fr) 2002-07-11 2003-12-30 Dispositif a diode photoemettrice organique, transistor a film mince pour celui-ci et leurs procedes de fabrication

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR10-2002-0040409A KR100473226B1 (ko) 2002-07-11 2002-07-11 액티브 매트릭스형 유기전계발광 소자
DE10359248A DE10359248B4 (de) 2002-07-11 2003-12-17 Verfahren, bei dem eine Aktivmatrixvorrichtung mit organischen Lichtemissionsdioden hergestellt wird
GB0329643A GB2409571B (en) 2002-07-11 2003-12-22 Active matrix type organic light emitting diode device and thin film transistor thereof
FR0315564A FR2864703B1 (fr) 2002-07-11 2003-12-30 Dispositif a diode photoemettrice organique, transistor a film mince pour celui-ci et leurs procedes de fabrication

Publications (2)

Publication Number Publication Date
FR2864703A1 FR2864703A1 (fr) 2005-07-01
FR2864703B1 true FR2864703B1 (fr) 2006-05-05

Family

ID=34831255

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0315564A Expired - Lifetime FR2864703B1 (fr) 2002-07-11 2003-12-30 Dispositif a diode photoemettrice organique, transistor a film mince pour celui-ci et leurs procedes de fabrication

Country Status (6)

Country Link
US (1) US6933529B2 (fr)
JP (1) JP4044014B2 (fr)
CN (1) CN1477910B (fr)
DE (1) DE10359248B4 (fr)
FR (1) FR2864703B1 (fr)
GB (1) GB2409571B (fr)

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US6753654B2 (en) * 2001-02-21 2004-06-22 Semiconductor Energy Laboratory Co., Ltd. Light emitting device and electronic appliance
KR100542997B1 (ko) * 2003-08-07 2006-01-20 삼성에스디아이 주식회사 평판표시장치 및 그의 제조방법
NL1025134C2 (nl) * 2003-12-24 2005-08-26 Lg Philips Lcd Co Organische licht emitterende diode-inrichting van de soort met actieve matrix en daarvoor bestemde dunne-filmtransistor.
JP4561096B2 (ja) * 2003-12-26 2010-10-13 ソニー株式会社 ディスプレイ装置
KR100560796B1 (ko) * 2004-06-24 2006-03-13 삼성에스디아이 주식회사 유기 박막트랜지스터 및 그의 제조방법
JP5152448B2 (ja) * 2004-09-21 2013-02-27 カシオ計算機株式会社 画素駆動回路及び画像表示装置
JP4543315B2 (ja) * 2004-09-27 2010-09-15 カシオ計算機株式会社 画素駆動回路及び画像表示装置
US20060138403A1 (en) * 2004-12-29 2006-06-29 Gang Yu Organic electronic devices including pixels
KR101142996B1 (ko) * 2004-12-31 2012-05-08 재단법인서울대학교산학협력재단 표시 장치 및 그 구동 방법
TWI249970B (en) * 2005-01-12 2006-02-21 Delta Optoelectronics Inc Method for driving pixel of active display and system thereof
CN100362396C (zh) * 2005-02-25 2008-01-16 友达光电股份有限公司 双面显示面板
JP4962682B2 (ja) * 2005-03-16 2012-06-27 カシオ計算機株式会社 発光駆動回路及び表示装置
KR100624314B1 (ko) * 2005-06-22 2006-09-19 삼성에스디아이 주식회사 발광표시장치 및 박막트랜지스터
JP2007035964A (ja) * 2005-07-27 2007-02-08 Sony Corp 薄膜トランジスタとその製造方法、及び表示装置
KR100659112B1 (ko) * 2005-11-22 2006-12-19 삼성에스디아이 주식회사 유기 박막 트랜지스터 및 이의 제조 방법, 이를 구비한평판 디스플레이 장치
KR101227142B1 (ko) * 2006-05-17 2013-01-28 엘지디스플레이 주식회사 전계발광소자 및 그 제조방법
JP5008412B2 (ja) * 2007-02-01 2012-08-22 エルジー ディスプレイ カンパニー リミテッド 画像表示装置、および画像表示装置の駆動方法
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JP5607728B2 (ja) * 2010-05-07 2014-10-15 パナソニック株式会社 有機ｅｌ表示パネル及びその製造方法
CN102405539B (zh) * 2010-05-07 2015-08-12 株式会社日本有机雷特显示器 有机电致发光显示面板及其制造方法
CN102394240B (zh) * 2011-11-18 2013-07-03 贵州大学 一种tft-led彩色阵列显示基板及其制造方法
KR101949225B1 (ko) * 2012-04-16 2019-04-26 삼성디스플레이 주식회사 박막 트랜지스터 및 이를 포함하는 표시 장치
US8658444B2 (en) 2012-05-16 2014-02-25 International Business Machines Corporation Semiconductor active matrix on buried insulator
JP2014086705A (ja) * 2012-10-26 2014-05-12 Nippon Hoso Kyokai <Nhk> 薄膜トランジスタの製造方法および薄膜デバイス
KR101966238B1 (ko) * 2012-12-14 2019-04-05 엘지디스플레이 주식회사 유기발광다이오드 표시장치 및 그 제조방법
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Also Published As

Publication number Publication date
US6933529B2 (en) 2005-08-23
CN1477910B (zh) 2011-09-28
US20040142502A1 (en) 2004-07-22
DE10359248B4 (de) 2011-04-28
JP4044014B2 (ja) 2008-02-06
CN1477910A (zh) 2004-02-25
FR2864703A1 (fr) 2005-07-01
GB2409571B (en) 2007-01-10
DE10359248A1 (de) 2005-07-28
GB2409571A (en) 2005-06-29
JP2004096100A (ja) 2004-03-25
GB0329643D0 (en) 2004-01-28

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