FR2858460B1 - Structure semiconducteur-sur-isolant contrainte ayant une tenue des contraintes aux hautes temperatures - Google Patents
Structure semiconducteur-sur-isolant contrainte ayant une tenue des contraintes aux hautes temperaturesInfo
- Publication number
- FR2858460B1 FR2858460B1 FR0309377A FR0309377A FR2858460B1 FR 2858460 B1 FR2858460 B1 FR 2858460B1 FR 0309377 A FR0309377 A FR 0309377A FR 0309377 A FR0309377 A FR 0309377A FR 2858460 B1 FR2858460 B1 FR 2858460B1
- Authority
- FR
- France
- Prior art keywords
- over
- high temperatures
- insulating structure
- stress resistance
- strength semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76251—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Recrystallisation Techniques (AREA)
- Element Separation (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0309377A FR2858460B1 (fr) | 2003-07-30 | 2003-07-30 | Structure semiconducteur-sur-isolant contrainte ayant une tenue des contraintes aux hautes temperatures |
US10/700,896 US20050023610A1 (en) | 2003-07-30 | 2003-11-03 | Semiconductor-on-insulator structure having high-temperature elastic constraints |
JP2006521618A JP2007500434A (ja) | 2003-07-30 | 2004-07-28 | 高温応力に耐性のある応力付加絶縁体上半導体構造 |
CNA2004800217427A CN1830078A (zh) | 2003-07-30 | 2004-07-28 | 抗高温应力的应力绝缘体上半导体结构 |
PCT/FR2004/002018 WO2005013317A2 (fr) | 2003-07-30 | 2004-07-28 | Structure semiconducteur-sur-isolant contrainte ayant une tenue des contraintes aux hautes temperatures |
EP04767800A EP1654757A2 (fr) | 2003-07-30 | 2004-07-28 | Structure semiconducteur-sur-isolant contrainte ayant une tenue des contraintes aux hautes temperatures |
KR1020067001759A KR20060056955A (ko) | 2003-07-30 | 2004-07-28 | 고온 내응력성 피응력 SeOI 구조체 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0309377A FR2858460B1 (fr) | 2003-07-30 | 2003-07-30 | Structure semiconducteur-sur-isolant contrainte ayant une tenue des contraintes aux hautes temperatures |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2858460A1 FR2858460A1 (fr) | 2005-02-04 |
FR2858460B1 true FR2858460B1 (fr) | 2005-10-14 |
Family
ID=34043669
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0309377A Expired - Fee Related FR2858460B1 (fr) | 2003-07-30 | 2003-07-30 | Structure semiconducteur-sur-isolant contrainte ayant une tenue des contraintes aux hautes temperatures |
Country Status (7)
Country | Link |
---|---|
US (1) | US20050023610A1 (fr) |
EP (1) | EP1654757A2 (fr) |
JP (1) | JP2007500434A (fr) |
KR (1) | KR20060056955A (fr) |
CN (1) | CN1830078A (fr) |
FR (1) | FR2858460B1 (fr) |
WO (1) | WO2005013317A2 (fr) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2881877B1 (fr) * | 2005-02-04 | 2007-08-31 | Soitec Silicon On Insulator | Transistor a effet de champ multi-grille a canal multi-couche |
CN102402125A (zh) * | 2010-09-16 | 2012-04-04 | 上海华虹Nec电子有限公司 | 用于制造锗硅碳器件中的光刻标记结构及其制备方法 |
CN103367392A (zh) * | 2012-03-27 | 2013-10-23 | 中国科学院微电子研究所 | 绝缘体上半导体结构及其制造方法 |
US9105689B1 (en) * | 2014-03-24 | 2015-08-11 | Silanna Semiconductor U.S.A., Inc. | Bonded semiconductor structure with SiGeC layer as etch stop |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5547787A (en) * | 1992-04-22 | 1996-08-20 | Kabushiki Kaisha Toshiba | Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask |
US5461243A (en) * | 1993-10-29 | 1995-10-24 | International Business Machines Corporation | Substrate for tensilely strained semiconductor |
US5776743A (en) * | 1994-09-06 | 1998-07-07 | La Jolla Cancer Research Foundation | Method of sensitizing tumor cells with adenovirus E1A |
US5906951A (en) * | 1997-04-30 | 1999-05-25 | International Business Machines Corporation | Strained Si/SiGe layers on insulator |
JP3324469B2 (ja) * | 1997-09-26 | 2002-09-17 | 信越半導体株式会社 | Soiウエーハの製造方法ならびにこの方法で製造されるsoiウエーハ |
FR2783254B1 (fr) * | 1998-09-10 | 2000-11-10 | France Telecom | Procede d'obtention d'une couche de germanium monocristallin sur un substrat de silicium monocristallin,et produits obtenus |
US6524935B1 (en) * | 2000-09-29 | 2003-02-25 | International Business Machines Corporation | Preparation of strained Si/SiGe on insulator by hydrogen induced layer transfer technique |
US6603156B2 (en) * | 2001-03-31 | 2003-08-05 | International Business Machines Corporation | Strained silicon on insulator structures |
US6940089B2 (en) * | 2001-04-04 | 2005-09-06 | Massachusetts Institute Of Technology | Semiconductor device structure |
-
2003
- 2003-07-30 FR FR0309377A patent/FR2858460B1/fr not_active Expired - Fee Related
- 2003-11-03 US US10/700,896 patent/US20050023610A1/en not_active Abandoned
-
2004
- 2004-07-28 CN CNA2004800217427A patent/CN1830078A/zh active Pending
- 2004-07-28 WO PCT/FR2004/002018 patent/WO2005013317A2/fr not_active Application Discontinuation
- 2004-07-28 EP EP04767800A patent/EP1654757A2/fr not_active Withdrawn
- 2004-07-28 JP JP2006521618A patent/JP2007500434A/ja not_active Withdrawn
- 2004-07-28 KR KR1020067001759A patent/KR20060056955A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
JP2007500434A (ja) | 2007-01-11 |
EP1654757A2 (fr) | 2006-05-10 |
CN1830078A (zh) | 2006-09-06 |
WO2005013317A2 (fr) | 2005-02-10 |
WO2005013317A3 (fr) | 2005-03-31 |
FR2858460A1 (fr) | 2005-02-04 |
KR20060056955A (ko) | 2006-05-25 |
US20050023610A1 (en) | 2005-02-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |
Effective date: 20080331 |