FR2851259B1 - Procede de fabrication de monocristaux hexagonaux et leur utilisation comme substrat pour des composants semi-conducteurs. - Google Patents

Procede de fabrication de monocristaux hexagonaux et leur utilisation comme substrat pour des composants semi-conducteurs.

Info

Publication number
FR2851259B1
FR2851259B1 FR0401612A FR0401612A FR2851259B1 FR 2851259 B1 FR2851259 B1 FR 2851259B1 FR 0401612 A FR0401612 A FR 0401612A FR 0401612 A FR0401612 A FR 0401612A FR 2851259 B1 FR2851259 B1 FR 2851259B1
Authority
FR
France
Prior art keywords
monocrystals
hexagonal
substrate
production
semiconductor components
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0401612A
Other languages
English (en)
Other versions
FR2851259A1 (fr
Inventor
Dirk Sprenger
Burkhard Speit
Markus Schweizer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Schott AG
Original Assignee
Schott Glaswerke AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE2003106801 external-priority patent/DE10306801A1/de
Application filed by Schott Glaswerke AG filed Critical Schott Glaswerke AG
Publication of FR2851259A1 publication Critical patent/FR2851259A1/fr
Application granted granted Critical
Publication of FR2851259B1 publication Critical patent/FR2851259B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/14Heating of the melt or the crystallised materials
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/36Single-crystal growth by pulling from a melt, e.g. Czochralski method characterised by the seed, e.g. its crystallographic orientation
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/16Oxides
    • C30B29/20Aluminium oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
FR0401612A 2003-02-18 2004-02-18 Procede de fabrication de monocristaux hexagonaux et leur utilisation comme substrat pour des composants semi-conducteurs. Expired - Fee Related FR2851259B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2003106801 DE10306801A1 (de) 2003-02-18 2003-02-18 Verfahren zur Herstellung von hexagonalen Einkristallen und deren Verwendung als Substrat für Halbleiterbauelemente
DE10309863 2003-03-06

Publications (2)

Publication Number Publication Date
FR2851259A1 FR2851259A1 (fr) 2004-08-20
FR2851259B1 true FR2851259B1 (fr) 2009-07-03

Family

ID=32773163

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0401612A Expired - Fee Related FR2851259B1 (fr) 2003-02-18 2004-02-18 Procede de fabrication de monocristaux hexagonaux et leur utilisation comme substrat pour des composants semi-conducteurs.

Country Status (4)

Country Link
US (1) US7255740B2 (fr)
JP (1) JP2004256388A (fr)
CH (1) CH696907A5 (fr)
FR (1) FR2851259B1 (fr)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004010377A1 (de) * 2004-03-03 2005-09-22 Schott Ag Herstellung von Substratwafern für defektarme Halbleiterbauteile, ihre Verwendung, sowie damit erhaltene Bauteile
US7307004B2 (en) * 2004-11-05 2007-12-11 National Taiwan University Method with mechanically strained silicon for enhancing speed of integrated circuits or devices
JP2011011950A (ja) * 2009-07-03 2011-01-20 Showa Denko Kk サファイア単結晶の製造方法、当該方法で得られたサファイア単結晶及びサファイア単結晶の加工方法
JP5729135B2 (ja) 2010-06-17 2015-06-03 株式会社Sumco サファイアシードおよびその製造方法、ならびにサファイア単結晶の製造方法
CN102021647B (zh) * 2010-10-22 2012-05-30 北京工业大学 一种快速生长厘米量级红宝石晶体的方法
KR101285935B1 (ko) * 2011-01-19 2013-07-12 주식회사 엘지실트론 저항 가열 사파이어 단결정 잉곳 성장장치, 저항 가열 사파이어 단결정 잉곳 제조방법, 사파이어 단결정 잉곳 및 사파이어 웨이퍼
CN102560623B (zh) * 2012-02-09 2015-06-24 常州亿晶光电科技有限公司 大尺寸蓝宝石单晶的制备方法
US10052848B2 (en) 2012-03-06 2018-08-21 Apple Inc. Sapphire laminates
US20130333611A1 (en) * 2012-06-14 2013-12-19 Tivra Corporation Lattice matching layer for use in a multilayer substrate structure
US9879357B2 (en) 2013-03-11 2018-01-30 Tivra Corporation Methods and systems for thin film deposition processes
US9221289B2 (en) 2012-07-27 2015-12-29 Apple Inc. Sapphire window
KR101420841B1 (ko) 2012-10-31 2014-07-17 주식회사 사파이어테크놀로지 사파이어 단결정 성장방법
US9232672B2 (en) 2013-01-10 2016-01-05 Apple Inc. Ceramic insert control mechanism
US9678540B2 (en) 2013-09-23 2017-06-13 Apple Inc. Electronic component embedded in ceramic material
US9632537B2 (en) 2013-09-23 2017-04-25 Apple Inc. Electronic component embedded in ceramic material
US9154678B2 (en) 2013-12-11 2015-10-06 Apple Inc. Cover glass arrangement for an electronic device
US9225056B2 (en) 2014-02-12 2015-12-29 Apple Inc. Antenna on sapphire structure
CN107407006B (zh) * 2015-03-26 2020-09-01 京瓷株式会社 蓝宝石部件、及蓝宝石部件的制造方法
US10406634B2 (en) 2015-07-01 2019-09-10 Apple Inc. Enhancing strength in laser cutting of ceramic components
WO2017168643A1 (fr) * 2016-03-30 2017-10-05 株式会社ニコン Oxyde d'aluminium, procédé de production d'oxyde d'aluminium et élément optique
CN113073388A (zh) * 2019-08-21 2021-07-06 眉山博雅新材料有限公司 一种晶体

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202901C (fr)
US3346344A (en) 1965-07-12 1967-10-10 Bell Telephone Labor Inc Growth of lithium niobate crystals
US3608050A (en) * 1969-09-12 1971-09-21 Union Carbide Corp Production of single crystal sapphire by carefully controlled cooling from a melt of alumina
US3715194A (en) * 1970-10-29 1973-02-06 Union Carbide Corp Melt grown alumina crystals and process therefor
DE2208150C3 (de) 1972-02-22 1978-03-30 Union Carbide Corp., New York, N.Y. (V.St.A.) Synthetischer Korund-Einkristall, Verfahren zu seiner Herstellung und Vorrichtung zur Durchführung des Verfahrens
JPS5795899A (en) * 1980-12-09 1982-06-14 Toshiba Ceramics Co Ltd Correcting method for deformed sapphire single crystal sheet
DD202901B1 (de) * 1981-07-15 1987-10-08 Akad Wissenschaften Ddr Anordnung zur zuechtung oxidischer einkristalle nach dem czochralski-verfahren
JPS59152289A (ja) * 1983-02-16 1984-08-30 Seiko Epson Corp スタ−ブル−サフアイヤの製造方法
US4595598A (en) * 1984-04-23 1986-06-17 Johnson & Johnson Dental Products Company Crystalline alumina composites
EP0161831B1 (fr) * 1984-04-23 1996-03-06 JOHNSON & JOHNSON DENTAL PRODUCTS COMPANY Bracket orthodontique en alumine cristalline
US4587035A (en) * 1985-05-20 1986-05-06 Union Carbide Corporation Process for enhancing Ti:Al2 O3 tunable laser crystal fluorescence by annealing
US4932865A (en) * 1988-07-18 1990-06-12 Union Carbide Chemicals And Plastics Company Inc. Crystalline orthodontic bracket
DE69208146T2 (de) * 1991-05-30 1996-06-20 Chichibu Cement Kk Rutil-Einkristalle sowie Verfahren zu deren Zuchtung
JP2002145700A (ja) * 2000-08-14 2002-05-22 Nippon Telegr & Teleph Corp <Ntt> サファイア基板および半導体素子ならびに電子部品および結晶成長方法
US6846434B2 (en) * 2001-12-04 2005-01-25 Landauer, Inc. Aluminum oxide material for optical data storage

Also Published As

Publication number Publication date
CH696907A5 (de) 2008-01-31
US7255740B2 (en) 2007-08-14
JP2004256388A (ja) 2004-09-16
FR2851259A1 (fr) 2004-08-20
US20040177802A1 (en) 2004-09-16

Similar Documents

Publication Publication Date Title
FR2851259B1 (fr) Procede de fabrication de monocristaux hexagonaux et leur utilisation comme substrat pour des composants semi-conducteurs.
GB2416623B (en) Substrate of gallium nitride single crystal and process for producing the same
HK1094279A1 (en) Gallium nitride semiconductor substrate and process for producing the same
TWI371782B (en) Nitride crystal, nitride crystal substrate, epilayer-containing nitride crystal substrate, semiconductor device and method of manufacturing the same
EP1785511A4 (fr) Plaquette de silicium, procede de fabrication de ladite plaquette et procede de croissance de cristal simple de silicium
EP1491560A4 (fr) Procede de production de composes a poids moleculaire eleve pour resine photosensible
EP1895573A4 (fr) Plaquette de monocristal en carbure de silicium et son procede de production
EP1909315A4 (fr) Plaque de silicium et procede de production de celle-ci
FR2892409B1 (fr) Procede de traitement d&#39;un substrat
DE60032352D1 (de) Vorrichtungen zur behandlung von ischämie durch die bildung eines fibrinpfropfens
FR2912259B1 (fr) Procede de fabrication d&#39;un substrat du type &#34;silicium sur isolant&#34;.
EP1970946A4 (fr) SUBSTRAT CRISTALLIN À L AlxGayIn1-x-yN, DISPOSITIF SEMI-CONDUCTEUR ET SON PROCÉDÉ DE FABRICATION
GB0222056D0 (en) Process for the manufacture of organic compounds
EP1852527A4 (fr) Monocristal de carbure de silicium, plaquette de monocristal de carbure de silicium et procede pour les produire
FR2846964B1 (fr) Procede de fabrication de 1,2-epoxy-3-chloropropane
FR2843061B1 (fr) Procede de polissage de tranche de materiau
IL162817A0 (en) Process for the manufacture of organic compounds
GB0204129D0 (en) Process for the manufacture of organic compounds
NO20033408D0 (no) Fremgangsmåte for fremstilling av krystallinske nanopartikler
NO20041850L (no) Fremgangsmate for dannelse av profenkrystaller
FR2826964B1 (fr) Procede de fabrication de (meth) acrylates silanes
GB0210234D0 (en) Process for the manufacture of organic compounds
FR2863773B1 (fr) Procede de fabrication de puces electroniques en silicium aminci
FR2869030B1 (fr) Procede de production d&#39;alpha-alumine particulaire
FR2815631B1 (fr) Procede de fabrication de (meth)acrylates de methylcyclohexyle

Legal Events

Date Code Title Description
TP Transmission of property
ST Notification of lapse

Effective date: 20101029