FR2824902B1 - Procede et agencement pour la determination sans contact de caracteristiques de produits - Google Patents

Procede et agencement pour la determination sans contact de caracteristiques de produits

Info

Publication number
FR2824902B1
FR2824902B1 FR0205910A FR0205910A FR2824902B1 FR 2824902 B1 FR2824902 B1 FR 2824902B1 FR 0205910 A FR0205910 A FR 0205910A FR 0205910 A FR0205910 A FR 0205910A FR 2824902 B1 FR2824902 B1 FR 2824902B1
Authority
FR
France
Prior art keywords
arrangement
product characteristics
contact determination
determination
contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0205910A
Other languages
English (en)
Other versions
FR2824902A1 (fr
Inventor
Matthias Patzwald
Rudolf Kessler
Waltraud Kessler
Angela Schindler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jenoptik AG
Original Assignee
Carl Zeiss Jena GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Jena GmbH filed Critical Carl Zeiss Jena GmbH
Publication of FR2824902A1 publication Critical patent/FR2824902A1/fr
Application granted granted Critical
Publication of FR2824902B1 publication Critical patent/FR2824902B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G01B11/0633—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection using one or more discrete wavelengths
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3563—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing solids; Preparation of samples therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3563—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing solids; Preparation of samples therefor
    • G01N2021/3568—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing solids; Preparation of samples therefor applied to semiconductors, e.g. Silicon
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/359—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using near infrared light

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
FR0205910A 2001-05-15 2002-05-14 Procede et agencement pour la determination sans contact de caracteristiques de produits Expired - Fee Related FR2824902B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10123470A DE10123470B4 (de) 2001-05-15 2001-05-15 Verfahren und Anordnung zur berührungslosen Ermittlung von Produkteigenschaften

Publications (2)

Publication Number Publication Date
FR2824902A1 FR2824902A1 (fr) 2002-11-22
FR2824902B1 true FR2824902B1 (fr) 2004-02-13

Family

ID=7684770

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0205910A Expired - Fee Related FR2824902B1 (fr) 2001-05-15 2002-05-14 Procede et agencement pour la determination sans contact de caracteristiques de produits

Country Status (4)

Country Link
US (1) US7012698B2 (fr)
DE (1) DE10123470B4 (fr)
FR (1) FR2824902B1 (fr)
GB (1) GB2380258B (fr)

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US6674533B2 (en) * 2000-12-21 2004-01-06 Joseph K. Price Anodizing system with a coating thickness monitor and an anodized product
US7274463B2 (en) * 2003-12-30 2007-09-25 Sensory Analytics Anodizing system with a coating thickness monitor and an anodized product
US7391557B1 (en) * 2003-03-28 2008-06-24 Applied Photonics Worldwide, Inc. Mobile terawatt femtosecond laser system (MTFLS) for long range spectral sensing and identification of bioaerosols and chemical agents in the atmosphere
US7271921B2 (en) * 2003-07-23 2007-09-18 Kla-Tencor Technologies Corporation Method and apparatus for determining surface layer thickness using continuous multi-wavelength surface scanning
JP2006214935A (ja) * 2005-02-04 2006-08-17 Omron Corp 薄膜検査装置および薄膜検査方法
WO2006122276A1 (fr) * 2005-05-11 2006-11-16 University Of North Texas Instrument, systeme et procede pour mesures atmospheriques automatisees peu onereuses
JP2007027478A (ja) * 2005-07-19 2007-02-01 Sharp Corp エッチング方法およびエッチング装置
DE102005050432A1 (de) * 2005-10-21 2007-05-03 Rap.Id Particle Systems Gmbh Vorrichtung und Verfahren zur Charakterisierung von Gleitmittel und Hydrophobierungsfilmen in pharmazeutischen Behältnissen bezüglich Dicke und Homogenität
EP2128603A1 (fr) * 2008-05-29 2009-12-02 Applied Materials, Inc. Procédé pour déterminer une propriété optique d'une couche optique
WO2009143921A1 (fr) * 2008-05-29 2009-12-03 Applied Materials, Inc Procédé permettant de déterminer une propriété optique d'une couche optique
US20090296100A1 (en) * 2008-05-29 2009-12-03 Applied Materials, Inc. Method for determining an optical property of an optical layer
US20100006785A1 (en) * 2008-07-14 2010-01-14 Moshe Finarov Method and apparatus for thin film quality control
JP5712787B2 (ja) * 2011-05-18 2015-05-07 日立化成株式会社 調光フィルムの硬化率の測定方法、調光フィルムの製造方法、及び調光フィルム
DE102012010794A1 (de) * 2011-09-02 2013-03-07 Leybold Optics Gmbh Testglaswechseln
US8829518B2 (en) 2011-09-13 2014-09-09 International Business Machines Corporation Test structure and calibration method
US8830464B2 (en) * 2012-11-06 2014-09-09 Kla-Tencor Corporation Film thickness, refractive index, and extinction coefficient determination for film curve creation and defect sizing in real time
US20160320310A1 (en) * 2013-12-26 2016-11-03 Posco Apparatus for simultaneously measuring whiteness and coating amount
DE102014223745A1 (de) * 2014-11-20 2016-05-25 Bundesdruckerei Gmbh Verfahren und Vorrichtung zur Erfassung von abgestrahltem Licht sowie Verfahren zur Herstellung
CN106841098B (zh) * 2016-07-29 2019-08-06 重庆医科大学 一种判别顺式与反式几何异构体的近红外光谱分析方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60122333A (ja) * 1983-12-07 1985-06-29 Univ Tohoku 偏光解析装置
JPH01230241A (ja) * 1988-03-10 1989-09-13 Oki Electric Ind Co Ltd 埋込拡散層の不良検出方法
FR2640040B1 (fr) * 1988-12-05 1994-10-28 Micro Controle Procede et dispositif de mesure optique
DE69021813T2 (de) * 1989-09-25 1996-05-23 Jasco Corp Apparat und Verfahren für die Ausmessung von dünnen mehrschichtigen Lagen.
WO1992015924A1 (fr) * 1991-03-04 1992-09-17 Site Services, Inc. Procedes de photolithographie et d'analyse de developpement
JPH05302816A (ja) * 1992-04-28 1993-11-16 Jasco Corp 半導体膜厚測定装置
US5365340A (en) * 1992-12-10 1994-11-15 Hughes Aircraft Company Apparatus and method for measuring the thickness of thin films
JP2840181B2 (ja) * 1993-08-20 1998-12-24 大日本スクリーン製造株式会社 多層膜試料の膜厚測定方法
US5555472A (en) * 1993-12-22 1996-09-10 Integrated Process Equipment Corp. Method and apparatus for measuring film thickness in multilayer thin film stack by comparison to a reference library of theoretical signatures
US5604581A (en) * 1994-10-07 1997-02-18 On-Line Technologies, Inc. Film thickness and free carrier concentration analysis method and apparatus
GB2301884A (en) * 1995-06-06 1996-12-18 Holtronic Technologies Ltd Characterising multilayer thin film systems by interferometry
FR2748562B1 (fr) * 1996-05-10 1998-07-03 Sofie Instr Procede et dispositif a deux cameras d'observation pour des mesures tridimensionnelles d'une structure complexe
GB2335310B (en) * 1998-03-11 2001-09-19 Draftex Ind Ltd Force-responsive detectors and systems
US5889592A (en) * 1998-03-18 1999-03-30 Zawaideh; Emad Nondestructive optical techniques for simultaneously measuring optical constants and thicknesses of single and multilayer films
US6034772A (en) * 1998-10-29 2000-03-07 Eastman Kodak Company Method for processing interferometric measurement data
WO2000071971A1 (fr) * 1999-05-24 2000-11-30 Luxtron Corporation Techniques optiques de mesure d'epaisseurs de couche
US6570662B1 (en) * 1999-05-24 2003-05-27 Luxtron Corporation Optical techniques for measuring layer thicknesses and other surface characteristics of objects such as semiconductor wafers
GB2355310A (en) * 1999-09-28 2001-04-18 Ocular Sciences Ltd White light interferometer

Also Published As

Publication number Publication date
GB2380258A (en) 2003-04-02
DE10123470B4 (de) 2010-08-19
FR2824902A1 (fr) 2002-11-22
DE10123470A1 (de) 2002-11-21
GB0210854D0 (en) 2002-06-19
US20020191192A1 (en) 2002-12-19
GB2380258B (en) 2005-11-09
US7012698B2 (en) 2006-03-14

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Legal Events

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ST Notification of lapse

Effective date: 20140131