FR2729400B1 - Procede et dispositif pour deposer une couche mince d'oxyde metallique, materiau ainsi obtenu, et element de pile a combustible incluant ce materiau - Google Patents
Procede et dispositif pour deposer une couche mince d'oxyde metallique, materiau ainsi obtenu, et element de pile a combustible incluant ce materiauInfo
- Publication number
- FR2729400B1 FR2729400B1 FR9500518A FR9500518A FR2729400B1 FR 2729400 B1 FR2729400 B1 FR 2729400B1 FR 9500518 A FR9500518 A FR 9500518A FR 9500518 A FR9500518 A FR 9500518A FR 2729400 B1 FR2729400 B1 FR 2729400B1
- Authority
- FR
- France
- Prior art keywords
- depositing
- fuel cell
- metal oxide
- thin layer
- element including
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/86—Inert electrodes with catalytic activity, e.g. for fuel cells
- H01M4/90—Selection of catalytic material
- H01M4/9016—Oxides, hydroxides or oxygenated metallic salts
- H01M4/9025—Oxides specially used in fuel cell operating at high temperature, e.g. SOFC
- H01M4/9033—Complex oxides, optionally doped, of the type M1MeO3, M1 being an alkaline earth metal or a rare earth, Me being a metal, e.g. perovskites
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/452—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M8/00—Fuel cells; Manufacture thereof
- H01M8/10—Fuel cells with solid electrolytes
- H01M8/12—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte
- H01M8/1231—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte with both reactants being gaseous or vaporised
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/50—Fuel cells
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Electrochemistry (AREA)
- Dispersion Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Inorganic Chemistry (AREA)
- Inert Electrodes (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9500518A FR2729400B1 (fr) | 1995-01-18 | 1995-01-18 | Procede et dispositif pour deposer une couche mince d'oxyde metallique, materiau ainsi obtenu, et element de pile a combustible incluant ce materiau |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9500518A FR2729400B1 (fr) | 1995-01-18 | 1995-01-18 | Procede et dispositif pour deposer une couche mince d'oxyde metallique, materiau ainsi obtenu, et element de pile a combustible incluant ce materiau |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2729400A1 FR2729400A1 (fr) | 1996-07-19 |
FR2729400B1 true FR2729400B1 (fr) | 1997-04-04 |
Family
ID=9475229
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR9500518A Expired - Fee Related FR2729400B1 (fr) | 1995-01-18 | 1995-01-18 | Procede et dispositif pour deposer une couche mince d'oxyde metallique, materiau ainsi obtenu, et element de pile a combustible incluant ce materiau |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2729400B1 (fr) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6349668B1 (en) * | 1998-04-27 | 2002-02-26 | Msp Corporation | Method and apparatus for thin film deposition on large area substrates |
JP3596416B2 (ja) * | 2000-03-29 | 2004-12-02 | セイコーエプソン株式会社 | セラミックスの製造方法およびその製造装置 |
EP1344272A2 (fr) | 2000-08-30 | 2003-09-17 | Siemens Aktiengesellschaft | Procede de production d'une pile a combustible en ceramique solide |
DE102013100084A1 (de) * | 2013-01-07 | 2014-07-10 | Reinhausen Plasma Gmbh | Verfahren zur herstellung zumindest einer schicht einer feststoffbasierten dünnschichtbatterie, plasma-pulver-sprüher hierfür und feststoffbasierte dünnschichtbatterie |
CN103094592B (zh) * | 2013-01-21 | 2015-02-04 | 江苏大学 | 一种等离子碱性燃料电池 |
FR3014115B1 (fr) | 2013-12-02 | 2017-04-28 | Office National Detudes Et De Rech Aerospatiales Onera | Procede et systeme de depot d'oxyde sur un composant poreux |
FR3013996B1 (fr) * | 2013-12-02 | 2017-04-28 | Office National Detudes Et De Rech Aerospatiales Onera | Procede de reparation locale de barrieres thermiques |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3827069A1 (de) * | 1987-11-21 | 1989-06-08 | Asea Brown Boveri | Verfahren zur herstellung eines supraleiters |
JPH07106898B2 (ja) * | 1988-06-01 | 1995-11-15 | 株式会社フジクラ | 酸化物系超電導体の製造方法 |
JPH02243504A (ja) * | 1989-03-16 | 1990-09-27 | Kobe Steel Ltd | 高温超電導薄膜の製造方法 |
US5120703A (en) * | 1990-04-17 | 1992-06-09 | Alfred University | Process for preparing oxide superconducting films by radio-frequency generated aerosol-plasma deposition in atmosphere |
JPH0689736A (ja) * | 1992-09-09 | 1994-03-29 | Mitsubishi Heavy Ind Ltd | 表面を多孔性とした固体電解質 |
-
1995
- 1995-01-18 FR FR9500518A patent/FR2729400B1/fr not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2729400A1 (fr) | 1996-07-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |