FR2704949B1 - Procédé pour la fabrication de capteurs et capteur fabriqué selon ce procédé. - Google Patents

Procédé pour la fabrication de capteurs et capteur fabriqué selon ce procédé.

Info

Publication number
FR2704949B1
FR2704949B1 FR9405245A FR9405245A FR2704949B1 FR 2704949 B1 FR2704949 B1 FR 2704949B1 FR 9405245 A FR9405245 A FR 9405245A FR 9405245 A FR9405245 A FR 9405245A FR 2704949 B1 FR2704949 B1 FR 2704949B1
Authority
FR
France
Prior art keywords
sensor made
manufacturing sensors
sensors
manufacturing
sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
FR9405245A
Other languages
English (en)
Other versions
FR2704949A1 (fr
Inventor
Gerhard Benz
Jiri Marek
Frank Bantien
Horst Muenzel
Franz Laermer
Michael Offenberg
Andrea Schilp
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch GmbH filed Critical Robert Bosch GmbH
Publication of FR2704949A1 publication Critical patent/FR2704949A1/fr
Application granted granted Critical
Publication of FR2704949B1 publication Critical patent/FR2704949B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/125—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by capacitive pick-up
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/0802—Details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P2015/0805—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
    • G01P2015/0808—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate
    • G01P2015/0811—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate for one single degree of freedom of movement of the mass
    • G01P2015/0817—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate for one single degree of freedom of movement of the mass for pivoting movement of the mass, e.g. in-plane pendulum
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P2015/0805—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
    • G01P2015/0822—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass
    • G01P2015/0825—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass for one single degree of freedom of movement of the mass
    • G01P2015/0828—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass for one single degree of freedom of movement of the mass the mass being of the paddle type being suspended at one of its longitudinal ends

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Pressure Sensors (AREA)
  • Weting (AREA)
FR9405245A 1993-05-06 1994-04-29 Procédé pour la fabrication de capteurs et capteur fabriqué selon ce procédé. Expired - Lifetime FR2704949B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4315012A DE4315012B4 (de) 1993-05-06 1993-05-06 Verfahren zur Herstellung von Sensoren und Sensor

Publications (2)

Publication Number Publication Date
FR2704949A1 FR2704949A1 (fr) 1994-11-10
FR2704949B1 true FR2704949B1 (fr) 1998-02-06

Family

ID=6487341

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9405245A Expired - Lifetime FR2704949B1 (fr) 1993-05-06 1994-04-29 Procédé pour la fabrication de capteurs et capteur fabriqué selon ce procédé.

Country Status (4)

Country Link
US (1) US5616523A (fr)
JP (1) JPH06349806A (fr)
DE (1) DE4315012B4 (fr)
FR (1) FR2704949B1 (fr)

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DE19506400C1 (de) * 1995-02-23 1996-03-14 Siemens Ag Verfahren zum Freiätzen (Separieren) mikromechanischer Funktionselemente
DE19509868A1 (de) * 1995-03-17 1996-09-19 Siemens Ag Mikromechanisches Halbleiterbauelement
DE19547584A1 (de) * 1995-12-20 1997-07-03 Cms Mikrosysteme Gmbh Chemnitz Mikromechanisches Array und Verfahren zu dessen Herstellung
FR2736934B1 (fr) * 1995-07-21 1997-08-22 Commissariat Energie Atomique Procede de fabrication d'une structure avec une couche utile maintenue a distance d'un substrat par des butees, et de desolidarisation d'une telle couche
DE19539049A1 (de) * 1995-10-20 1997-04-24 Bosch Gmbh Robert Verfahren zur Herstellung eines Coriolis-Drehratensensors
TW317651B (en) * 1996-12-19 1997-10-11 Mos Electronics Taiwan Inc Method of preventing wafer edge region from generating peeling phenomena
DE19701843C1 (de) * 1997-01-21 1998-04-30 Bosch Gmbh Robert Verfahren zur Herstellung von mikromechanischen Strukturen
US6199430B1 (en) 1997-06-17 2001-03-13 Denso Corporation Acceleration sensor with ring-shaped movable electrode
US6074890A (en) * 1998-01-08 2000-06-13 Rockwell Science Center, Llc Method of fabricating suspended single crystal silicon micro electro mechanical system (MEMS) devices
DE19903380B4 (de) 1998-02-02 2007-10-18 Denso Corp., Kariya Halbleitersensoren für eine physikalische Grösse und ihre Herstellungsverfahren
JP4003326B2 (ja) 1998-02-12 2007-11-07 株式会社デンソー 半導体力学量センサおよびその製造方法
JP3846094B2 (ja) 1998-03-17 2006-11-15 株式会社デンソー 半導体装置の製造方法
US6287885B1 (en) 1998-05-08 2001-09-11 Denso Corporation Method for manufacturing semiconductor dynamic quantity sensor
US6291875B1 (en) 1998-06-24 2001-09-18 Analog Devices Imi, Inc. Microfabricated structures with electrical isolation and interconnections
GB9819821D0 (en) 1998-09-12 1998-11-04 Secr Defence Improvements relating to micro-machining
JP2000133814A (ja) * 1998-10-22 2000-05-12 Toyota Motor Corp 半導体装置
JP2000206142A (ja) 1998-11-13 2000-07-28 Denso Corp 半導体力学量センサおよびその製造方法
JP4238437B2 (ja) 1999-01-25 2009-03-18 株式会社デンソー 半導体力学量センサとその製造方法
US6433401B1 (en) 1999-04-06 2002-08-13 Analog Devices Imi, Inc. Microfabricated structures with trench-isolation using bonded-substrates and cavities
US6703679B1 (en) 1999-08-31 2004-03-09 Analog Devices, Imi, Inc. Low-resistivity microelectromechanical structures with co-fabricated integrated circuit
US6868726B2 (en) * 2000-01-20 2005-03-22 Analog Devices Imi, Inc. Position sensing with improved linearity
US6440766B1 (en) 2000-02-16 2002-08-27 Analog Devices Imi, Inc. Microfabrication using germanium-based release masks
DE10034315C2 (de) * 2000-07-14 2002-11-28 Infineon Technologies Ag Analog-Digital-Wandler
US7122395B2 (en) * 2002-12-23 2006-10-17 Motorola, Inc. Method of forming semiconductor devices through epitaxy
US6916728B2 (en) * 2002-12-23 2005-07-12 Freescale Semiconductor, Inc. Method for forming a semiconductor structure through epitaxial growth
US6770506B2 (en) * 2002-12-23 2004-08-03 Motorola, Inc. Release etch method for micromachined sensors
JP4386002B2 (ja) * 2004-07-06 2009-12-16 株式会社デンソー 半導体力学量センサの製造方法
JP4591000B2 (ja) * 2004-09-16 2010-12-01 株式会社デンソー 半導体力学量センサおよびその製造方法
JP2006167849A (ja) * 2004-12-15 2006-06-29 Denso Corp マイクロ構造体の製造方法
US7069784B1 (en) * 2004-12-29 2006-07-04 Honeywell International Inc. Pendulous in-plane MEMS accelerometer device
US7412892B1 (en) 2007-06-06 2008-08-19 Measurement Specialties, Inc. Method of making pressure transducer and apparatus
DE102008003242B4 (de) 2008-01-04 2017-03-30 Robert Bosch Gmbh Mikromechanisches Bauelement und Verfahren zur Herstellung eines mikromechanischen Bauelements
JP2009216693A (ja) 2008-02-13 2009-09-24 Denso Corp 物理量センサ
JP4557034B2 (ja) * 2008-04-01 2010-10-06 株式会社デンソー 半導体力学量センサおよびその製造方法
JP4640459B2 (ja) * 2008-07-04 2011-03-02 ソニー株式会社 角速度センサ
JP2010060398A (ja) * 2008-09-03 2010-03-18 Alps Electric Co Ltd ジャイロセンサ及びその製造方法
JP2010127763A (ja) * 2008-11-27 2010-06-10 Hitachi Ltd 半導体力学量検出センサ及びそれを用いた制御装置
US8648432B2 (en) * 2011-11-28 2014-02-11 Texas Instruments Deutschland Gmbh Fully embedded micromechanical device, system on chip and method for manufacturing the same
DE102014204727A1 (de) * 2014-03-14 2015-09-17 Robert Bosch Gmbh Inertialsensor und Herstellungsverfahren zum Herstellen eines Inertialsensors
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Also Published As

Publication number Publication date
US5616523A (en) 1997-04-01
DE4315012B4 (de) 2007-01-11
JPH06349806A (ja) 1994-12-22
DE4315012A1 (de) 1994-11-10
FR2704949A1 (fr) 1994-11-10

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