FR2603017A1 - Appareil de remplissage ponderal de type rotatif - Google Patents
Appareil de remplissage ponderal de type rotatifInfo
- Publication number
- FR2603017A1 FR2603017A1 FR8711729A FR8711729A FR2603017A1 FR 2603017 A1 FR2603017 A1 FR 2603017A1 FR 8711729 A FR8711729 A FR 8711729A FR 8711729 A FR8711729 A FR 8711729A FR 2603017 A1 FR2603017 A1 FR 2603017A1
- Authority
- FR
- France
- Prior art keywords
- filling apparatus
- ponderal
- rotary
- type
- filling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
- B65B1/00—Packaging fluent solid material, e.g. powders, granular or loose fibrous material, loose masses of small articles, in individual containers or receptacles, e.g. bags, sacks, boxes, cartons, cans, or jars
- B65B1/30—Devices or methods for controlling or determining the quantity or quality or the material fed or filled
- B65B1/32—Devices or methods for controlling or determining the quantity or quality or the material fed or filled by weighing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
- B67C—CLEANING, FILLING WITH LIQUIDS OR SEMILIQUIDS, OR EMPTYING, OF BOTTLES, JARS, CANS, CASKS, BARRELS, OR SIMILAR CONTAINERS, NOT OTHERWISE PROVIDED FOR; FUNNELS
- B67C3/00—Bottling liquids or semiliquids; Filling jars or cans with liquids or semiliquids using bottling or like apparatus; Filling casks or barrels with liquids or semiliquids
- B67C3/02—Bottling liquids or semiliquids; Filling jars or cans with liquids or semiliquids using bottling or like apparatus
- B67C3/20—Bottling liquids or semiliquids; Filling jars or cans with liquids or semiliquids using bottling or like apparatus with provision for metering the liquids to be introduced, e.g. when adding syrups
- B67C3/202—Bottling liquids or semiliquids; Filling jars or cans with liquids or semiliquids using bottling or like apparatus with provision for metering the liquids to be introduced, e.g. when adding syrups by weighing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
- B65B1/00—Packaging fluent solid material, e.g. powders, granular or loose fibrous material, loose masses of small articles, in individual containers or receptacles, e.g. bags, sacks, boxes, cartons, cans, or jars
- B65B1/04—Methods of, or means for, filling the material into the containers or receptacles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
- B65B3/00—Packaging plastic material, semiliquids, liquids or mixed solids and liquids, in individual containers or receptacles, e.g. bags, sacks, boxes, cartons, cans, or jars
- B65B3/26—Methods or devices for controlling the quantity of the material fed or filled
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
- B65B3/00—Packaging plastic material, semiliquids, liquids or mixed solids and liquids, in individual containers or receptacles, e.g. bags, sacks, boxes, cartons, cans, or jars
- B65B3/26—Methods or devices for controlling the quantity of the material fed or filled
- B65B3/28—Methods or devices for controlling the quantity of the material fed or filled by weighing
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Quality & Reliability (AREA)
- Basic Packing Technique (AREA)
- Filling Of Jars Or Cans And Processes For Cleaning And Sealing Jars (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Weight Measurement For Supplying Or Discharging Of Specified Amounts Of Material (AREA)
Abstract
L'INVENTION CONCERNE LES APPAREILS DE REMPLISSAGE PONDERAL DE TYPE ROTATIF. ELLE SE RAPPORTE A UN APPAREIL COMPRENANT UNE BALANCE 2 DE ROBERVAL DONT L'EXTREMITE EXTERNE DU FLEAU 4 PORTE UNE TABLE 9 DE SUPPORT. UNE SECONDE BALANCE 2 DE ROBERVAL EST DISPOSEE AU-DESSOUS DE LA PREMIERE ET TRANSMET UN SIGNAL DE PESEE A UN ORGANE 56 DE COMMANDE. CELUI-CI RECOIT AUSSI UN SIGNAL D'UN ORGANE 57 QUI DETECTE LA VITESSE DE ROTATION DE L'APPAREIL, SI BIEN QUE LES VALEURS DE POIDS PEUVENT ETRE CORRIGEES DES EFFETS DE LA COMPOSANTE ASCENDANTE DE LA FORCE CENTRIFUGE. L'APPAREIL DONNE DONC LE POIDS VERITABLE DU CONTENU DU RECIPIENT 8 EN COURS DE REMPLISSAGE. APPLICATION AU CONDITIONNEMENT DES SUBSTANCES MEDICINALES.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61194151A JPH0798521B2 (ja) | 1986-08-20 | 1986-08-20 | 回転式重量充填装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2603017A1 true FR2603017A1 (fr) | 1988-02-26 |
FR2603017B1 FR2603017B1 (fr) | 1990-08-31 |
Family
ID=16319764
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR878711729A Expired - Lifetime FR2603017B1 (fr) | 1986-08-20 | 1987-08-19 | Appareil de remplissage ponderal de type rotatif |
Country Status (6)
Country | Link |
---|---|
US (3) | US4832092A (fr) |
JP (1) | JPH0798521B2 (fr) |
KR (1) | KR900004982B1 (fr) |
DE (1) | DE3727866A1 (fr) |
FR (1) | FR2603017B1 (fr) |
GB (1) | GB2195779B (fr) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1219936A1 (fr) * | 2000-12-28 | 2002-07-03 | Wipotec Wiege- und Positioniersysteme GmbH | Balance avec un mécanisme de dégagement |
WO2007093878A1 (fr) * | 2006-02-14 | 2007-08-23 | Azionaria Costruzioni Macchine Automatiche A.C.M.A. S.P.A. | Dispositif de soutien et de pesage pour contenants |
WO2009016499A2 (fr) | 2007-08-02 | 2009-02-05 | Azionaria Costruzioni Macchine Automatiche A.C.M.A. S.Pa. | Carrousel conçu pour servir de support à des contenants et pour les peser |
WO2013023788A1 (fr) * | 2011-08-17 | 2013-02-21 | Khs Gmbh | Dispositif de pesée pour machines de remplissage pour le remplissage de contenants en fonction du poids |
Families Citing this family (69)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5591267A (en) * | 1988-01-11 | 1997-01-07 | Ohmi; Tadahiro | Reduced pressure device |
US5906688A (en) * | 1989-01-11 | 1999-05-25 | Ohmi; Tadahiro | Method of forming a passivation film |
JP2779937B2 (ja) * | 1988-06-20 | 1998-07-23 | 大和製衡株式会社 | 重量式計量充填包装機 |
US5683072A (en) * | 1988-11-01 | 1997-11-04 | Tadahiro Ohmi | Thin film forming equipment |
JPH02139391A (ja) * | 1988-11-11 | 1990-05-29 | Shigeo Kanetani | 液体供給装置 |
US5789086A (en) * | 1990-03-05 | 1998-08-04 | Ohmi; Tadahiro | Stainless steel surface having passivation film |
JPH0395922A (ja) * | 1989-09-07 | 1991-04-22 | Canon Inc | 半導体薄膜の形成方法 |
US5300460A (en) * | 1989-10-03 | 1994-04-05 | Applied Materials, Inc. | UHF/VHF plasma for use in forming integrated circuit structures on semiconductor wafers |
JP2758948B2 (ja) * | 1989-12-15 | 1998-05-28 | キヤノン株式会社 | 薄膜形成方法 |
US5707486A (en) * | 1990-07-31 | 1998-01-13 | Applied Materials, Inc. | Plasma reactor using UHF/VHF and RF triode source, and process |
US5302882A (en) * | 1991-09-09 | 1994-04-12 | Sematech, Inc. | Low pass filter for plasma discharge |
EP0609237A1 (fr) * | 1991-09-09 | 1994-08-10 | Sematech, Inc. | Isolator d'harmonique et d'harmonique inferieur pour decharge de plasma |
US5490910A (en) * | 1992-03-09 | 1996-02-13 | Tulip Memory Systems, Inc. | Circularly symmetric sputtering apparatus with hollow-cathode plasma devices |
US5203385A (en) * | 1992-03-31 | 1993-04-20 | Donald Waber | Apparatus and process for automatically reconstituting dry materials, especially pharmaceuticals |
JPH0653137A (ja) * | 1992-07-31 | 1994-02-25 | Canon Inc | 水素化アモルファスシリコン膜の形成方法 |
US5325019A (en) * | 1992-08-21 | 1994-06-28 | Sematech, Inc. | Control of plasma process by use of harmonic frequency components of voltage and current |
US6022458A (en) * | 1992-12-07 | 2000-02-08 | Canon Kabushiki Kaisha | Method of production of a semiconductor substrate |
JP3351843B2 (ja) * | 1993-02-24 | 2002-12-03 | 忠弘 大見 | 成膜方法 |
JPH06279185A (ja) * | 1993-03-25 | 1994-10-04 | Canon Inc | ダイヤモンド結晶およびダイヤモンド結晶膜の形成方法 |
US5911856A (en) * | 1993-09-03 | 1999-06-15 | Canon Kabushiki Kaisha | Method for forming thin film |
JP3387616B2 (ja) * | 1994-04-18 | 2003-03-17 | キヤノン株式会社 | プラズマ処理装置 |
JP3419899B2 (ja) * | 1994-07-26 | 2003-06-23 | 東京エレクトロン株式会社 | スパッタリング方法及びスパッタリング装置 |
EP0715334B1 (fr) * | 1994-11-30 | 1999-04-14 | Applied Materials, Inc. | Réacteurs à plasma pour le traitement de plaquettes semi-conductrices |
JPH08220304A (ja) | 1995-02-13 | 1996-08-30 | Tadahiro Omi | 光学物品及びそれを用いた露光装置又は光学系並びにその製造方法 |
US6224724B1 (en) | 1995-02-23 | 2001-05-01 | Tokyo Electron Limited | Physical vapor processing of a surface with non-uniformity compensation |
US5800688A (en) * | 1997-04-21 | 1998-09-01 | Tokyo Electron Limited | Apparatus for ionized sputtering |
JP3630982B2 (ja) * | 1997-05-22 | 2005-03-23 | キヤノン株式会社 | プラズマ処理方法及びプラズマ処理装置 |
US5921759A (en) * | 1997-10-14 | 1999-07-13 | Sandeep Khan | Liquid metering piston pump and valves capable of being cleaned and sterilized without disassembly |
JP3565311B2 (ja) * | 1997-12-17 | 2004-09-15 | アルプス電気株式会社 | プラズマ処理装置 |
US6287977B1 (en) * | 1998-07-31 | 2001-09-11 | Applied Materials, Inc. | Method and apparatus for forming improved metal interconnects |
US6236001B1 (en) * | 1999-08-03 | 2001-05-22 | Wayne W. Shymko | Scoop with weigh scale |
US6631693B2 (en) * | 2001-01-30 | 2003-10-14 | Novellus Systems, Inc. | Absorptive filter for semiconductor processing systems |
US7100532B2 (en) * | 2001-10-09 | 2006-09-05 | Plasma Control Systems, Llc | Plasma production device and method and RF driver circuit with adjustable duty cycle |
US7132996B2 (en) * | 2001-10-09 | 2006-11-07 | Plasma Control Systems Llc | Plasma production device and method and RF driver circuit |
US7084832B2 (en) * | 2001-10-09 | 2006-08-01 | Plasma Control Systems, Llc | Plasma production device and method and RF driver circuit with adjustable duty cycle |
JP4207543B2 (ja) * | 2002-11-21 | 2009-01-14 | 澁谷工業株式会社 | 回転式重量充填装置 |
US7405521B2 (en) * | 2003-08-22 | 2008-07-29 | Lam Research Corporation | Multiple frequency plasma processor method and apparatus |
US7042311B1 (en) | 2003-10-10 | 2006-05-09 | Novellus Systems, Inc. | RF delivery configuration in a plasma processing system |
JP4703965B2 (ja) * | 2004-03-22 | 2011-06-15 | 大和製衡株式会社 | 回転式重量充填装置および回転式重量充填方法 |
WO2007018555A2 (fr) * | 2004-09-10 | 2007-02-15 | Carnegie Institution Of Washington | Diamant monocristallin depose par voie chimique en phase vapeur (cvd) ultradur et croissance tridimensionnelle de ce dernier |
US7214619B2 (en) * | 2004-10-05 | 2007-05-08 | Applied Materials, Inc. | Method for forming a barrier layer in an integrated circuit in a plasma with source and bias power frequencies applied through the workpiece |
US7268076B2 (en) * | 2004-10-05 | 2007-09-11 | Applied Materials, Inc. | Apparatus and method for metal plasma vapor deposition and re-sputter with source and bias power frequencies applied through the workpiece |
US7399943B2 (en) * | 2004-10-05 | 2008-07-15 | Applied Materials, Inc. | Apparatus for metal plasma vapor deposition and re-sputter with source and bias power frequencies applied through the workpiece |
JP4675612B2 (ja) * | 2004-11-18 | 2011-04-27 | 大和製衡株式会社 | 回転式重量計 |
US7820020B2 (en) * | 2005-02-03 | 2010-10-26 | Applied Materials, Inc. | Apparatus for plasma-enhanced physical vapor deposition of copper with RF source power applied through the workpiece with a lighter-than-copper carrier gas |
US20070074968A1 (en) * | 2005-09-30 | 2007-04-05 | Mirko Vukovic | ICP source for iPVD for uniform plasma in combination high pressure deposition and low pressure etch process |
JPWO2007072853A1 (ja) | 2005-12-21 | 2009-05-28 | 株式会社イシダ | 回転式計量装置 |
DE102006002711C5 (de) * | 2006-01-19 | 2009-11-12 | Wipotec Wiege- Und Positioniersysteme Gmbh | Wägeaufnehmer |
US7837838B2 (en) * | 2006-03-09 | 2010-11-23 | Applied Materials, Inc. | Method of fabricating a high dielectric constant transistor gate using a low energy plasma apparatus |
US7678710B2 (en) | 2006-03-09 | 2010-03-16 | Applied Materials, Inc. | Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system |
US20070209930A1 (en) * | 2006-03-09 | 2007-09-13 | Applied Materials, Inc. | Apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system |
US7645710B2 (en) | 2006-03-09 | 2010-01-12 | Applied Materials, Inc. | Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system |
US9856558B2 (en) * | 2008-03-14 | 2018-01-02 | Applied Materials, Inc. | Physical vapor deposition method with a source of isotropic ion velocity distribution at the wafer surface |
US8568571B2 (en) * | 2008-05-21 | 2013-10-29 | Applied Materials, Inc. | Thin film batteries and methods for manufacturing same |
DE102008030721A1 (de) | 2008-07-01 | 2010-01-07 | Krones Ag | Vorrichtung zum Abfüllen von zähfließenden Medien |
US8920611B2 (en) * | 2008-07-15 | 2014-12-30 | Applied Materials, Inc. | Method for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuning |
US9017533B2 (en) * | 2008-07-15 | 2015-04-28 | Applied Materials, Inc. | Apparatus for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuning |
JP5773346B2 (ja) * | 2009-03-12 | 2015-09-02 | 株式会社アルバック | セルフイオンスパッタリング装置 |
IT1393740B1 (it) * | 2009-03-27 | 2012-05-08 | Cft Packaging S P A | Dispositivo di riempimento ponderale e riempitrice ponderale |
FR2946623B1 (fr) * | 2009-06-11 | 2016-07-01 | Serac Group | Dispositif de delivrance suspendu et installation de remplissage de recipients comportant de tels dispositifs. |
JP5064533B2 (ja) * | 2010-06-07 | 2012-10-31 | 大和製衡株式会社 | 回転式重量充填装置および回転式重量充填方法 |
KR101942961B1 (ko) | 2011-06-17 | 2019-01-28 | 어플라이드 머티어리얼스, 인코포레이티드 | 핀홀 없는 유전체 박막 제조 |
US9735280B2 (en) * | 2012-03-02 | 2017-08-15 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, method for manufacturing semiconductor device, and method for forming oxide film |
WO2013158888A1 (fr) | 2012-04-18 | 2013-10-24 | Applied Materials, Inc. | Électrolyte à l'état solide sans piqûre à conductivité ionique élevée |
JP6196529B2 (ja) * | 2013-10-31 | 2017-09-13 | 澁谷工業株式会社 | ピストン式充填機 |
GB201319654D0 (en) * | 2013-11-07 | 2013-12-25 | Spts Technologies Ltd | Deposition of silicon dioxide |
DE102013020638A1 (de) * | 2013-12-16 | 2015-06-18 | Merck Patent Gmbh | Abfüllvorrichtung und deren Verwendung zur Abfüllung eines Fluids |
US10264663B1 (en) | 2017-10-18 | 2019-04-16 | Lam Research Corporation | Matchless plasma source for semiconductor wafer fabrication |
JP7060796B6 (ja) * | 2018-05-09 | 2022-05-17 | 慶應義塾 | 重量充填装置 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0052546A2 (fr) * | 1980-11-13 | 1982-05-26 | S.E.R.A.C. Group | Procédé et dispositif de contrôle de dosage de matériaux de remplissage dans une machine de remplissage à dosage pondéral |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3704219A (en) * | 1971-04-07 | 1972-11-28 | Mcdowell Electronics Inc | Impedance matching network for use with sputtering apparatus |
US3785412A (en) * | 1972-01-26 | 1974-01-15 | Richardson Co | Mill apron automatic can filling machine |
US4060109A (en) * | 1976-05-14 | 1977-11-29 | Kewpie Kabushiki Kaisha | Filling quantity regulating system in container filling apparatus |
JPS5873821A (ja) * | 1981-10-28 | 1983-05-04 | Yamato Scale Co Ltd | ロ−ドセル式はかり |
US4525262A (en) * | 1982-01-26 | 1985-06-25 | Materials Research Corporation | Magnetron reactive bias sputtering method and apparatus |
US4453575A (en) * | 1982-02-05 | 1984-06-12 | Hi-Speed Checkweigher Co., Inc. | Container filling system |
US4579618A (en) * | 1984-01-06 | 1986-04-01 | Tegal Corporation | Plasma reactor apparatus |
JPS61246631A (ja) * | 1985-04-25 | 1986-11-01 | Tokyo Electric Co Ltd | マルチレンジロ−ドセル秤 |
US4718287A (en) * | 1985-05-07 | 1988-01-12 | Esselte Moreau | Force sensing device for measurement apparatus |
US4703780A (en) * | 1986-10-20 | 1987-11-03 | Velasco Scale Company | Drum filling apparatus and method |
-
1986
- 1986-08-20 JP JP61194151A patent/JPH0798521B2/ja not_active Expired - Lifetime
-
1987
- 1987-08-07 US US07/083,572 patent/US4832092A/en not_active Expired - Lifetime
- 1987-08-12 GB GB8719067A patent/GB2195779B/en not_active Expired - Lifetime
- 1987-08-14 US US07/085,157 patent/US4824546A/en not_active Ceased
- 1987-08-19 FR FR878711729A patent/FR2603017B1/fr not_active Expired - Lifetime
- 1987-08-20 DE DE19873727866 patent/DE3727866A1/de active Granted
- 1987-08-20 KR KR1019870009117A patent/KR900004982B1/ko not_active IP Right Cessation
-
1991
- 1991-04-23 US US07/690,541 patent/USRE34106E/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0052546A2 (fr) * | 1980-11-13 | 1982-05-26 | S.E.R.A.C. Group | Procédé et dispositif de contrôle de dosage de matériaux de remplissage dans une machine de remplissage à dosage pondéral |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1219936A1 (fr) * | 2000-12-28 | 2002-07-03 | Wipotec Wiege- und Positioniersysteme GmbH | Balance avec un mécanisme de dégagement |
WO2007093878A1 (fr) * | 2006-02-14 | 2007-08-23 | Azionaria Costruzioni Macchine Automatiche A.C.M.A. S.P.A. | Dispositif de soutien et de pesage pour contenants |
US8256473B2 (en) | 2006-02-14 | 2012-09-04 | Azionaria Costruzioni Macchine Automatiche A.C.M.A. S.P.A. | Supporting and weighing device for containers |
WO2009016499A2 (fr) | 2007-08-02 | 2009-02-05 | Azionaria Costruzioni Macchine Automatiche A.C.M.A. S.Pa. | Carrousel conçu pour servir de support à des contenants et pour les peser |
WO2009016499A3 (fr) * | 2007-08-02 | 2009-03-26 | Azionaria Costruzioni Acma Spa | Carrousel conçu pour servir de support à des contenants et pour les peser |
CN101821192B (zh) * | 2007-08-02 | 2012-09-26 | 建筑自动机械制造A.C.M.A.股份公司 | 用于对容器进行支承和称重的旋转式传送盘 |
US8288668B2 (en) | 2007-08-02 | 2012-10-16 | Azionaria Costruzioni Macchine Automatiche A.C.M.A. S.P.A. | Carousel for supporting and weighing containers |
WO2013023788A1 (fr) * | 2011-08-17 | 2013-02-21 | Khs Gmbh | Dispositif de pesée pour machines de remplissage pour le remplissage de contenants en fonction du poids |
Also Published As
Publication number | Publication date |
---|---|
FR2603017B1 (fr) | 1990-08-31 |
US4824546A (en) | 1989-04-25 |
DE3727866C2 (fr) | 1989-05-11 |
KR880002720A (ko) | 1988-05-10 |
JPH0798521B2 (ja) | 1995-10-25 |
USRE34106E (en) | 1992-10-20 |
GB2195779A (en) | 1988-04-13 |
DE3727866A1 (de) | 1988-02-25 |
JPS6355002A (ja) | 1988-03-09 |
KR900004982B1 (ko) | 1990-07-16 |
GB8719067D0 (en) | 1987-09-16 |
US4832092A (en) | 1989-05-23 |
GB2195779B (en) | 1991-03-13 |
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