FR2549495B1 - Source de revetement par pulverisation a magnetron pour des cibles magnetiques et non magnetiques - Google Patents

Source de revetement par pulverisation a magnetron pour des cibles magnetiques et non magnetiques

Info

Publication number
FR2549495B1
FR2549495B1 FR8411475A FR8411475A FR2549495B1 FR 2549495 B1 FR2549495 B1 FR 2549495B1 FR 8411475 A FR8411475 A FR 8411475A FR 8411475 A FR8411475 A FR 8411475A FR 2549495 B1 FR2549495 B1 FR 2549495B1
Authority
FR
France
Prior art keywords
magnetic
spray coating
coating source
targets
magnetron spray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR8411475A
Other languages
English (en)
French (fr)
Other versions
FR2549495A1 (fr
Inventor
Donald Rex Boys
Walter Edgar Graves Jr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Varian Medical Systems Inc
Original Assignee
Varian Associates Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Varian Associates Inc filed Critical Varian Associates Inc
Publication of FR2549495A1 publication Critical patent/FR2549495A1/fr
Application granted granted Critical
Publication of FR2549495B1 publication Critical patent/FR2549495B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3476—Testing and control
    • H01J37/3479—Detecting exhaustion of target material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3458—Electromagnets in particular for cathodic sputtering apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3497—Temperature of target

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Physical Vapour Deposition (AREA)
  • Microwave Tubes (AREA)
FR8411475A 1983-07-19 1984-07-19 Source de revetement par pulverisation a magnetron pour des cibles magnetiques et non magnetiques Expired - Fee Related FR2549495B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US51509383A 1983-07-19 1983-07-19

Publications (2)

Publication Number Publication Date
FR2549495A1 FR2549495A1 (fr) 1985-01-25
FR2549495B1 true FR2549495B1 (fr) 1990-06-08

Family

ID=24049949

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8411475A Expired - Fee Related FR2549495B1 (fr) 1983-07-19 1984-07-19 Source de revetement par pulverisation a magnetron pour des cibles magnetiques et non magnetiques

Country Status (6)

Country Link
JP (1) JP2583407B2 (ja)
CA (1) CA1242991A (ja)
DE (1) DE3425344A1 (ja)
FR (1) FR2549495B1 (ja)
GB (2) GB2144772B (ja)
NL (1) NL8402012A (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3331406A1 (de) * 1983-08-31 1985-03-14 Leybold-Heraeus GmbH, 5000 Köln Zerstaeubungskatode
DE3630737C1 (de) * 1986-09-10 1987-11-05 Philips & Du Pont Optical Kathodenzerstaeubungseinrichtung mit einer Vorrichtung zur Messung eines kritischen Target-Abtrages
CH669609A5 (ja) * 1986-12-23 1989-03-31 Balzers Hochvakuum
DE4133564C2 (de) * 1991-10-10 1999-11-18 Leybold Ag Vorrichtung zur lösbaren Befestigung eines Targets oder Targetgrundkörpers auf der Kathodenhalterung
DE4230291C2 (de) * 1992-09-10 1999-11-04 Leybold Ag Mikrowellenunterstützte Zerstäubungsanordnung
US5604888A (en) * 1994-04-07 1997-02-18 Zycad Corporation Emulation system employing motherboard and flexible daughterboards
TWI638758B (zh) * 2015-12-17 2018-10-21 日商愛發科股份有限公司 真空處理裝置

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3472074A (en) * 1966-12-29 1969-10-14 Ibm Maximum thermometer for surface temperature measurements
GB1217685A (en) * 1967-06-05 1970-12-31 Smiths Industries Ltd Improvements in or relating to methods and apparatus for sputtering of materials
GB1484384A (en) * 1974-10-23 1977-09-01 Nordiko Ltd Sputtering method and apparatus
US3956093A (en) * 1974-12-16 1976-05-11 Airco, Inc. Planar magnetron sputtering method and apparatus
US4166783A (en) * 1978-04-17 1979-09-04 Varian Associates, Inc. Deposition rate regulation by computer control of sputtering systems
US4265729A (en) * 1978-09-27 1981-05-05 Vac-Tec Systems, Inc. Magnetically enhanced sputtering device
US4457825A (en) * 1980-05-16 1984-07-03 Varian Associates, Inc. Sputter target for use in a sputter coating source
JPS583976A (ja) * 1981-06-29 1983-01-10 Hitachi Ltd スパツタリングによる成膜方法及びその装置
JPS583975A (ja) * 1981-06-29 1983-01-10 Hitachi Ltd スパツタリングによる成膜方法及びその装置
JPS5922788B2 (ja) * 1981-01-30 1984-05-29 株式会社日立製作所 プレ−ナマグネトロン方式のスパッタリング装置及びその方法
GB2096177B (en) * 1981-04-07 1985-07-17 Fournier Paul R Improved integrated sputtering apparatus and method
US4444635A (en) * 1981-07-22 1984-04-24 Hitachi, Ltd. Film forming method
JPS5816068A (ja) * 1981-07-22 1983-01-29 Hitachi Ltd プレ−ナマグネトロン方式のスパッタリング方法
JPS5871372A (ja) * 1981-10-23 1983-04-28 Hitachi Ltd スパッタリングによる成膜方法及びその装置
JPS5887270A (ja) * 1981-11-18 1983-05-25 Hitachi Ltd プレ−ナマグネトロン方式のスパッタリング電極
JPS58189372A (ja) * 1982-04-30 1983-11-05 Toshiba Corp マグネトロンスパツタ装置
US4385979A (en) * 1982-07-09 1983-05-31 Varian Associates, Inc. Target assemblies of special materials for use in sputter coating apparatus
US4391697A (en) * 1982-08-16 1983-07-05 Vac-Tec Systems, Inc. High rate magnetron sputtering of high permeability materials
JPS5976875A (ja) * 1982-10-22 1984-05-02 Hitachi Ltd マグネトロン型スパッタ装置とそれに用いるターゲット

Also Published As

Publication number Publication date
GB2179372B (en) 1987-09-23
GB8418028D0 (en) 1984-08-22
FR2549495A1 (fr) 1985-01-25
NL8402012A (nl) 1985-02-18
CA1242991A (en) 1988-10-11
GB2179372A (en) 1987-03-04
GB2144772A (en) 1985-03-13
GB2144772B (en) 1987-09-23
DE3425344A1 (de) 1985-01-31
JP2583407B2 (ja) 1997-02-19
GB8618716D0 (en) 1986-09-10
JPS6039160A (ja) 1985-02-28

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Legal Events

Date Code Title Description
ST Notification of lapse