FR2534079B1 - Dispositif laser a semi-conducteur - Google Patents
Dispositif laser a semi-conducteurInfo
- Publication number
- FR2534079B1 FR2534079B1 FR8315257A FR8315257A FR2534079B1 FR 2534079 B1 FR2534079 B1 FR 2534079B1 FR 8315257 A FR8315257 A FR 8315257A FR 8315257 A FR8315257 A FR 8315257A FR 2534079 B1 FR2534079 B1 FR 2534079B1
- Authority
- FR
- France
- Prior art keywords
- semiconductor laser
- laser device
- semiconductor
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2232—Buried stripe structure with inner confining structure between the active layer and the lower electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/16—Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2054—Methods of obtaining the confinement
- H01S5/2059—Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Geometry (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57172202A JPS5961982A (ja) | 1982-09-30 | 1982-09-30 | 半導体レ−ザ− |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2534079A1 FR2534079A1 (fr) | 1984-04-06 |
FR2534079B1 true FR2534079B1 (fr) | 1987-11-13 |
Family
ID=15937472
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8315257A Expired FR2534079B1 (fr) | 1982-09-30 | 1983-09-26 | Dispositif laser a semi-conducteur |
Country Status (7)
Country | Link |
---|---|
US (1) | US4608695A (fr) |
JP (1) | JPS5961982A (fr) |
KR (1) | KR850002706A (fr) |
DE (1) | DE3335371A1 (fr) |
FR (1) | FR2534079B1 (fr) |
GB (1) | GB2128402B (fr) |
NL (1) | NL8303337A (fr) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60150682A (ja) * | 1984-01-17 | 1985-08-08 | Sharp Corp | 半導体レ−ザ素子 |
JPS60192379A (ja) * | 1984-03-12 | 1985-09-30 | Mitsubishi Electric Corp | 半導体レ−ザ装置 |
US4686679A (en) * | 1984-03-21 | 1987-08-11 | Sharp Kabushiki Kaisha | Window VSIS semiconductor laser |
JPS61135184A (ja) * | 1984-12-05 | 1986-06-23 | Sharp Corp | 半導体レ−ザ装置 |
US4827483A (en) * | 1985-08-12 | 1989-05-02 | Hitachi, Ltd. | Semiconductor laser device and method of fabricating the same |
FR2606223B1 (fr) * | 1986-10-29 | 1996-03-01 | Seiko Epson Corp | Laser a semiconducteur et son procede de fabrication |
US5275968A (en) * | 1987-08-05 | 1994-01-04 | Mitsubishi Denki Kabushiki Kaisha | Method of producing a semiconductor light emitting device disposed in an insulating substrate |
US5194399A (en) * | 1987-08-05 | 1993-03-16 | Mitsubishi Denki Kabushiki Kaisha | Method of producing a semiconductor light emitting device disposed in an insulating substrate |
JPH0716081B2 (ja) * | 1987-08-05 | 1995-02-22 | 三菱電機株式会社 | 半導体発光装置 |
DE3732822A1 (de) * | 1987-09-29 | 1989-04-06 | Siemens Ag | Laserdiode mit indexfuehrung, insbesondere laserdioden-array mit wellenleiterstruktur |
US5351257A (en) * | 1993-03-08 | 1994-09-27 | Motorola, Inc. | VCSEL with vertical offset operating region providing a lateral waveguide and current limiting and method of fabrication |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3838359A (en) * | 1973-11-23 | 1974-09-24 | Bell Telephone Labor Inc | Gain asymmetry in heterostructure junction lasers operating in a fundamental transverse mode |
US4280106A (en) * | 1979-05-15 | 1981-07-21 | Xerox Corporation | Striped substrate planar laser |
JPS57211791A (en) * | 1981-06-24 | 1982-12-25 | Sharp Corp | Semiconductor laser element |
-
1982
- 1982-09-30 JP JP57172202A patent/JPS5961982A/ja active Pending
-
1983
- 1983-09-26 US US06/535,788 patent/US4608695A/en not_active Expired - Fee Related
- 1983-09-26 FR FR8315257A patent/FR2534079B1/fr not_active Expired
- 1983-09-28 KR KR1019830004537A patent/KR850002706A/ko not_active Application Discontinuation
- 1983-09-29 DE DE19833335371 patent/DE3335371A1/de not_active Withdrawn
- 1983-09-29 GB GB08326055A patent/GB2128402B/en not_active Expired
- 1983-09-29 NL NL8303337A patent/NL8303337A/nl not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
GB8326055D0 (en) | 1983-11-02 |
JPS5961982A (ja) | 1984-04-09 |
FR2534079A1 (fr) | 1984-04-06 |
DE3335371A1 (de) | 1984-04-05 |
NL8303337A (nl) | 1984-04-16 |
KR850002706A (ko) | 1985-05-15 |
GB2128402A (en) | 1984-04-26 |
GB2128402B (en) | 1986-03-05 |
US4608695A (en) | 1986-08-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |