FR2515429B1 - Transistor a effet de champ de puissance - Google Patents
Transistor a effet de champ de puissanceInfo
- Publication number
- FR2515429B1 FR2515429B1 FR8217784A FR8217784A FR2515429B1 FR 2515429 B1 FR2515429 B1 FR 2515429B1 FR 8217784 A FR8217784 A FR 8217784A FR 8217784 A FR8217784 A FR 8217784A FR 2515429 B1 FR2515429 B1 FR 2515429B1
- Authority
- FR
- France
- Prior art keywords
- field effect
- effect transistor
- power field
- power
- transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005669 field effect Effects 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0684—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
- H01L29/0692—Surface layout
- H01L29/0696—Surface layout of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/1095—Body region, i.e. base region, of DMOS transistors or IGBTs
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US31480081A | 1981-10-26 | 1981-10-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2515429A1 FR2515429A1 (fr) | 1983-04-29 |
FR2515429B1 true FR2515429B1 (fr) | 1986-09-26 |
Family
ID=23221492
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8217784A Expired FR2515429B1 (fr) | 1981-10-26 | 1982-10-25 | Transistor a effet de champ de puissance |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS5882574A (fr) |
DE (1) | DE3239204A1 (fr) |
FR (1) | FR2515429B1 (fr) |
GB (1) | GB2108758B (fr) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4833513A (en) * | 1985-01-20 | 1989-05-23 | Tdk Corporation | MOS FET semiconductor device having a cell pattern arrangement for optimizing channel width |
US5317184A (en) * | 1992-11-09 | 1994-05-31 | Harris Corporation | Device and method for improving current carrying capability in a semiconductor device |
EP0823735A1 (fr) * | 1996-08-05 | 1998-02-11 | Sgs-Thomson Microelectronics S.A. | Dispositif de puissance en technologie MOS |
JP2006339516A (ja) | 2005-06-03 | 2006-12-14 | Rohm Co Ltd | 半導体装置およびその製造方法 |
CN110676317B (zh) * | 2019-09-30 | 2022-10-11 | 福建省福联集成电路有限公司 | 一种晶体管管芯结构及制作方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4055884A (en) * | 1976-12-13 | 1977-11-01 | International Business Machines Corporation | Fabrication of power field effect transistors and the resulting structures |
FR2460542A1 (fr) * | 1979-06-29 | 1981-01-23 | Thomson Csf | Transistor a effet de champ vertical de puissance pour hautes frequences et procede de realisation d'un tel transistor |
FR2461360A1 (fr) * | 1979-07-10 | 1981-01-30 | Thomson Csf | Procede de fabrication d'un transistor a effet de champ du type dmos a fonctionnement vertical et transistor obtenu par ce procede |
US4364073A (en) * | 1980-03-25 | 1982-12-14 | Rca Corporation | Power MOSFET with an anode region |
-
1982
- 1982-10-05 GB GB08228337A patent/GB2108758B/en not_active Expired
- 1982-10-22 DE DE19823239204 patent/DE3239204A1/de active Granted
- 1982-10-25 FR FR8217784A patent/FR2515429B1/fr not_active Expired
- 1982-10-25 JP JP57187341A patent/JPS5882574A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
GB2108758A (en) | 1983-05-18 |
DE3239204A1 (de) | 1983-05-19 |
JPS5882574A (ja) | 1983-05-18 |
FR2515429A1 (fr) | 1983-04-29 |
GB2108758B (en) | 1985-08-21 |
DE3239204C2 (fr) | 1987-07-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse | ||
RC | Opposition against decision of lapse | ||
DA | Annulment of decision of lapse | ||
ST | Notification of lapse |