FR2482320B1 - Precurseur de plaque de tirage photosensible - Google Patents

Precurseur de plaque de tirage photosensible

Info

Publication number
FR2482320B1
FR2482320B1 FR8109173A FR8109173A FR2482320B1 FR 2482320 B1 FR2482320 B1 FR 2482320B1 FR 8109173 A FR8109173 A FR 8109173A FR 8109173 A FR8109173 A FR 8109173A FR 2482320 B1 FR2482320 B1 FR 2482320B1
Authority
FR
France
Prior art keywords
photosensitive
plate precursor
pull plate
pull
precursor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8109173A
Other languages
English (en)
French (fr)
Other versions
FR2482320A1 (fr
Inventor
Akira Nishioka
Takao Nakayama
Eiji Nakakita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of FR2482320A1 publication Critical patent/FR2482320A1/fr
Application granted granted Critical
Publication of FR2482320B1 publication Critical patent/FR2482320B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FR8109173A 1980-05-09 1981-05-08 Precurseur de plaque de tirage photosensible Expired FR2482320B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6144280A JPS56156831A (en) 1980-05-09 1980-05-09 Photosensitive printing plate

Publications (2)

Publication Number Publication Date
FR2482320A1 FR2482320A1 (fr) 1981-11-13
FR2482320B1 true FR2482320B1 (fr) 1988-08-12

Family

ID=13171178

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8109173A Expired FR2482320B1 (fr) 1980-05-09 1981-05-08 Precurseur de plaque de tirage photosensible

Country Status (4)

Country Link
JP (1) JPS56156831A (ja)
DE (1) DE3117702A1 (ja)
FR (1) FR2482320B1 (ja)
GB (1) GB2075702B (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4450235A (en) * 1982-04-21 1984-05-22 Cpc International Inc. Asporogenic mutant of bacillus subtilis useful as a host in a host-vector system
DE3377539D1 (en) * 1982-04-22 1988-09-01 Du Pont Overcoated photohardenable element having surface protuberances
DE3328019A1 (de) * 1982-09-21 1984-03-22 Polychrome Corp., 10702 Yonkers, N.Y. Mit wasser entwickelbare druckplatte
JPS5965837A (ja) * 1982-10-07 1984-04-14 Toppan Printing Co Ltd 画像形成用材料
JPH0719061B2 (ja) * 1983-08-23 1995-03-06 三洋電機株式会社 レジストパタ−ン形成方法
DE4126836A1 (de) * 1991-08-14 1993-02-18 Hoechst Ag Strahlungsempfindliches aufzeichnungsmaterial aus schichttraeger und positiv arbeitender, strahlungsempfindlicher schicht mit rauher oberflaeche
DE4335425A1 (de) * 1993-10-18 1995-04-20 Hoechst Ag Mattiertes, strahlungsempfindliches Aufzeichnungsmaterial
DE4439184A1 (de) * 1994-11-03 1996-05-09 Hoechst Ag Lichtempfindliches Aufzeichnungsmaterial

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3829315A (en) * 1968-05-27 1974-08-13 Kalle Ag Methods for making half-tone prints
US3615468A (en) * 1968-11-06 1971-10-26 Sylvania Electric Prod Photoprinting process and article
AT289152B (de) * 1968-12-09 1971-04-13 Kalle Ag Lichtempfindliches Kopiermaterial zum Herstellen einer Flachdruckform
JPS50125805A (ja) * 1974-03-19 1975-10-03
JPS5412905A (en) * 1978-06-09 1979-01-31 Fuji Photo Film Co Ltd Photosensitive printing plate
US4181883A (en) * 1978-07-03 1980-01-01 The Economy Engine Company Hourmeter-tachometer
JPS5512974A (en) * 1978-07-15 1980-01-29 Konishiroku Photo Ind Co Ltd Photosensitive printing plate
JPS5576351A (en) * 1978-12-04 1980-06-09 Fuji Photo Film Co Ltd Production of photosensitive lithographic printing plate
DE3009928A1 (de) * 1979-03-16 1980-09-25 Fuji Photo Film Co Ltd Verfahren zur herstellung von lichtempfindlichen druckplatten
DE2926236A1 (de) * 1979-06-29 1981-01-15 Hoechst Ag Lichtempfindliches, positiv arbeitendes kopiermaterial mit rauher oberflaeche
DE2926235A1 (de) * 1979-06-29 1981-01-08 Hoechst Ag Photopolymerisierbares kopiermaterial und verfahren zur herstellung von reliefbildern

Also Published As

Publication number Publication date
JPS6126655B2 (ja) 1986-06-21
DE3117702A1 (de) 1982-01-28
GB2075702B (en) 1983-11-23
FR2482320A1 (fr) 1981-11-13
GB2075702A (en) 1981-11-18
JPS56156831A (en) 1981-12-03

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Legal Events

Date Code Title Description
ST Notification of lapse