JPS5576351A - Production of photosensitive lithographic printing plate - Google Patents
Production of photosensitive lithographic printing plateInfo
- Publication number
- JPS5576351A JPS5576351A JP14982978A JP14982978A JPS5576351A JP S5576351 A JPS5576351 A JP S5576351A JP 14982978 A JP14982978 A JP 14982978A JP 14982978 A JP14982978 A JP 14982978A JP S5576351 A JPS5576351 A JP S5576351A
- Authority
- JP
- Japan
- Prior art keywords
- solvent
- component
- composition
- printing plate
- materials
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE: To obtain the printing plate which is developable with water and has good ink receptivity by mixing the specific solution of photosensitive materials and film forming materials and the solution of hydrophobic arbarsion-resistant resins and coating the mixture on the a substrate followed by drying.
CONSTITUTION: The composition (A) of photosensitive materials (diazo compounds, o-quinone diazide compounds, etc.) and film forming materials (resins having functional groups of hydroxy, amino, etc.) is dissolved in the solvent (2- methoxy ethanol, dimethyl formamide, etc.) (a) which does not dissolve the resin composition B to be mentioned later and dissolves the abovementioned composition A. On the other hand, hydrophobic and abrasion-resistant resins (polyurethane, polyester, etc.) (B) are dissolved in the solvent (acetone, methyl acetate, etc.) (however the solvent b of a boiling point lower than that of the solvent a should be selected) (b) which dissolves the component B and is compatible with the solvent a. The abovementioned both solvents are mixed and the mixed solution is coated on a substrate followed by drying, whereby the photosensitive layer comprising dispersing the fine particles of the component B as non-continuous phases in the component A forming continuous phases is formed.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14982978A JPS5576351A (en) | 1978-12-04 | 1978-12-04 | Production of photosensitive lithographic printing plate |
GB7941515A GB2043281A (en) | 1978-12-04 | 1979-11-30 | Producing photosensitive lithographic printing plates |
DE19792948737 DE2948737A1 (en) | 1978-12-04 | 1979-12-04 | METHOD FOR PRODUCING LIGHT-SENSITIVE LITHOGRAPHIC PRINTING PLATES |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14982978A JPS5576351A (en) | 1978-12-04 | 1978-12-04 | Production of photosensitive lithographic printing plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5576351A true JPS5576351A (en) | 1980-06-09 |
Family
ID=15483578
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14982978A Pending JPS5576351A (en) | 1978-12-04 | 1978-12-04 | Production of photosensitive lithographic printing plate |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS5576351A (en) |
DE (1) | DE2948737A1 (en) |
GB (1) | GB2043281A (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56156831A (en) * | 1980-05-09 | 1981-12-03 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
DE3305923C2 (en) * | 1983-02-21 | 1986-10-30 | Siemens AG, 1000 Berlin und 8000 München | Process for prebaking substrates coated with positive photoresist based on naphtoquinonediazide and phenol-formaldehyde resin |
DE4126836A1 (en) * | 1991-08-14 | 1993-02-18 | Hoechst Ag | RADIATION-SENSITIVE RECORDING MATERIAL FROM LAYER SUPPORT AND POSITIVELY WORKING, RADIATION-SENSITIVE LAYER WITH ROUGH SURFACE |
DE10345362A1 (en) * | 2003-09-25 | 2005-04-28 | Kodak Polychrome Graphics Gmbh | Method for preventing coating defects |
-
1978
- 1978-12-04 JP JP14982978A patent/JPS5576351A/en active Pending
-
1979
- 1979-11-30 GB GB7941515A patent/GB2043281A/en not_active Withdrawn
- 1979-12-04 DE DE19792948737 patent/DE2948737A1/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
DE2948737A1 (en) | 1980-06-19 |
GB2043281A (en) | 1980-10-01 |
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