FR2475798A1 - Procede et dispositif de production d'ions lourds fortement charges et une application mettant en oeuvre le procede - Google Patents
Procede et dispositif de production d'ions lourds fortement charges et une application mettant en oeuvre le procede Download PDFInfo
- Publication number
- FR2475798A1 FR2475798A1 FR8003153A FR8003153A FR2475798A1 FR 2475798 A1 FR2475798 A1 FR 2475798A1 FR 8003153 A FR8003153 A FR 8003153A FR 8003153 A FR8003153 A FR 8003153A FR 2475798 A1 FR2475798 A1 FR 2475798A1
- Authority
- FR
- France
- Prior art keywords
- cavity
- ions
- magnetic field
- extraction
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 19
- 150000002500 ions Chemical class 0.000 claims abstract description 42
- 230000005672 electromagnetic field Effects 0.000 claims abstract description 20
- 238000000605 extraction Methods 0.000 claims abstract description 18
- 238000004519 manufacturing process Methods 0.000 claims abstract description 5
- 230000007935 neutral effect Effects 0.000 claims description 21
- 230000005405 multipole Effects 0.000 claims description 2
- 238000010884 ion-beam technique Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000006378 damage Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 238000005215 recombination Methods 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- 241000238876 Acari Species 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- -1 for example Chemical class 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
- H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
- Particle Accelerators (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8003153A FR2475798A1 (fr) | 1980-02-13 | 1980-02-13 | Procede et dispositif de production d'ions lourds fortement charges et une application mettant en oeuvre le procede |
| GB8102420A GB2069230B (en) | 1980-02-13 | 1981-01-27 | Process and apparatus for producing highly charged large ions and an application utilizing this process |
| DE19813104461 DE3104461A1 (de) | 1980-02-13 | 1981-02-09 | Verfahren zur erzeugung von stark geladenen schweren ionen, vorrichtung zur durchfuehrung des verfahrens und eine verwendung dieses verfahrens |
| JP1888481A JPS56128600A (en) | 1980-02-13 | 1981-02-10 | Method and device for producing large ion highly charged and utility using same method |
| US06/458,645 US4417178A (en) | 1980-02-13 | 1983-01-17 | Process and apparatus for producing highly charged large ions and an application utilizing this process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8003153A FR2475798A1 (fr) | 1980-02-13 | 1980-02-13 | Procede et dispositif de production d'ions lourds fortement charges et une application mettant en oeuvre le procede |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2475798A1 true FR2475798A1 (fr) | 1981-08-14 |
| FR2475798B1 FR2475798B1 (enExample) | 1982-09-03 |
Family
ID=9238537
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR8003153A Granted FR2475798A1 (fr) | 1980-02-13 | 1980-02-13 | Procede et dispositif de production d'ions lourds fortement charges et une application mettant en oeuvre le procede |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4417178A (enExample) |
| JP (1) | JPS56128600A (enExample) |
| DE (1) | DE3104461A1 (enExample) |
| FR (1) | FR2475798A1 (enExample) |
| GB (1) | GB2069230B (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2512623A1 (fr) * | 1981-09-10 | 1983-03-11 | Commissariat Energie Atomique | Procede de fusion et/ou d'evaporation pulsee d'un materiau solide |
| EP0142414A2 (fr) | 1983-10-17 | 1985-05-22 | Commissariat A L'energie Atomique | Source d'ions, notamment métalliques fortement chargés dont le courant d'ions est régulé |
| WO2005046296A3 (fr) * | 2003-11-04 | 2005-12-15 | Commissariat Energie Atomique | Dispositif pour controler la temperature electronique dans un plasma rce |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4507588A (en) * | 1983-02-28 | 1985-03-26 | Board Of Trustees Operating Michigan State University | Ion generating apparatus and method for the use thereof |
| FR2546358B1 (fr) * | 1983-05-20 | 1985-07-05 | Commissariat Energie Atomique | Source d'ions a resonance cyclotronique des electrons |
| US4534842A (en) * | 1983-06-15 | 1985-08-13 | Centre National De La Recherche Scientifique (Cnrs) | Process and device for producing a homogeneous large-volume plasma of high density and of low electronic temperature |
| FR2547692B1 (fr) * | 1983-06-15 | 1988-07-15 | Centre Nat Rech Scient | Procede et dispositif de production d'un plasma de grand volume homogene, de grande densite et de faible temperature electronique |
| FR2548436B1 (fr) * | 1983-06-30 | 1986-01-10 | Commissariat Energie Atomique | Procede de production d'ions lourds multicharges et sources d'ions en regime impulsionnel, permettant la mise en oeuvre du procede |
| FR2556498B1 (fr) * | 1983-12-07 | 1986-09-05 | Commissariat Energie Atomique | Source d'ions multicharges a plusieurs zones de resonance cyclotronique electronique |
| GB2162365B (en) * | 1984-07-26 | 1989-06-01 | Atomic Energy Authority Uk | Ion source |
| US4641060A (en) * | 1985-02-11 | 1987-02-03 | Applied Microwave Plasma Concepts, Inc. | Method and apparatus using electron cyclotron heated plasma for vacuum pumping |
| FR2580427B1 (fr) * | 1985-04-11 | 1987-05-15 | Commissariat Energie Atomique | Source d'ions negatifs a resonance cyclotronique des electrons |
| FR2592518B1 (fr) * | 1985-12-26 | 1988-02-12 | Commissariat Energie Atomique | Sources d'ions a resonance cyclotronique electronique |
| FR2592520B1 (fr) * | 1985-12-27 | 1988-12-09 | Atelier Electro Thermie Const | Dispositif de creation d'un champ magnetique glissant, en particulier pour gravure ionique rapide sous champ magnetique |
| DE3708716C2 (de) * | 1987-03-18 | 1993-11-04 | Hans Prof Dr Rer Nat Oechsner | Hochfrequenz-ionenquelle |
| US4947085A (en) * | 1987-03-27 | 1990-08-07 | Mitsubishi Denki Kabushiki Kaisha | Plasma processor |
| DE3712971A1 (de) * | 1987-04-16 | 1988-11-03 | Plasonic Oberflaechentechnik G | Verfahren und vorrichtung zum erzeugen eines plasmas |
| US4778561A (en) * | 1987-10-30 | 1988-10-18 | Veeco Instruments, Inc. | Electron cyclotron resonance plasma source |
| FR2640411B1 (fr) * | 1988-12-08 | 1994-04-29 | Commissariat Energie Atomique | Procede et dispositif utilisant une source rce pour la production d'ions lourds fortement charges |
| US5111111A (en) * | 1990-09-27 | 1992-05-05 | Consortium For Surface Processing, Inc. | Method and apparatus for coupling a microwave source in an electron cyclotron resonance system |
| FR2668642B1 (fr) * | 1990-10-25 | 1993-11-05 | Commissariat A Energie Atomique | Source d'ions fortement charges a sonde polarisable et a resonance cyclotronique electronique. |
| ES2078735T3 (es) * | 1991-05-21 | 1995-12-16 | Materials Research Corp | Modulo de grabado suave mediante util de agrupacion y generador de plasma ecr para el mismo. |
| US5302803A (en) * | 1991-12-23 | 1994-04-12 | Consortium For Surface Processing, Inc. | Apparatus and method for uniform microwave plasma processing using TE1101 modes |
| DE4200235C1 (enExample) * | 1992-01-08 | 1993-05-06 | Hoffmeister, Helmut, Dr., 4400 Muenster, De | |
| AU5017293A (en) * | 1992-09-01 | 1994-03-29 | University Of North Carolina At Chapel Hill, The | High pressure magnetically assisted inductively coupled plasma |
| US6238533B1 (en) | 1995-08-07 | 2001-05-29 | Applied Materials, Inc. | Integrated PVD system for aluminum hole filling using ionized metal adhesion layer |
| US5962923A (en) | 1995-08-07 | 1999-10-05 | Applied Materials, Inc. | Semiconductor device having a low thermal budget metal filling and planarization of contacts, vias and trenches |
| US5646488A (en) * | 1995-10-11 | 1997-07-08 | Warburton; William K. | Differential pumping stage with line of sight pumping mechanism |
| FR2757310B1 (fr) * | 1996-12-18 | 2006-06-02 | Commissariat Energie Atomique | Systeme magnetique, en particulier pour les sources ecr, permettant la creation de surfaces fermees d'equimodule b de forme et de dimensions quelconques |
| KR20010032498A (ko) | 1997-11-26 | 2001-04-25 | 조셉 제이. 스위니 | 손상없는 스컵쳐 코팅 증착 |
| US7253109B2 (en) | 1997-11-26 | 2007-08-07 | Applied Materials, Inc. | Method of depositing a tantalum nitride/tantalum diffusion barrier layer system |
| DE19933762C2 (de) * | 1999-07-19 | 2002-10-17 | Juergen Andrae | Gepulste magnetische Öffnung von Elektronen-Zyklotron-Resonanz-Jonenquellen zur Erzeugung kurzer, stromstarker Pulse hoch geladener Ionen oder von Elektronen |
| US7461502B2 (en) | 2003-03-20 | 2008-12-09 | Elwing Llc | Spacecraft thruster |
| ATE454553T1 (de) * | 2004-09-22 | 2010-01-15 | Elwing Llc | Antriebssystem für raumfahrzeuge |
| US7679027B2 (en) * | 2005-03-17 | 2010-03-16 | Far-Tech, Inc. | Soft x-ray laser based on z-pinch compression of rotating plasma |
| US7999479B2 (en) * | 2009-04-16 | 2011-08-16 | Varian Semiconductor Equipment Associates, Inc. | Conjugated ICP and ECR plasma sources for wide ribbon ion beam generation and control |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2147497A5 (enExample) * | 1971-07-29 | 1973-03-09 | Commissariat Energie Atomique | |
| US3778658A (en) * | 1972-09-01 | 1973-12-11 | Gen Electric | Multibeam cathode ray tube utilizing d.a.m. grid |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3105899A (en) * | 1960-03-25 | 1963-10-01 | Siemens Ag | Electric mass filter |
| FR1506297A (fr) * | 1966-03-11 | 1967-12-22 | Commissariat Energie Atomique | Procédé de production et de confinement de gaz ionisé et dispositifs en faisant application |
| FR1481123A (fr) * | 1966-03-11 | 1967-05-19 | Commissariat Energie Atomique | Procédé de production, d'accélération et d'interaction de faisceaux de particules chargées et dispositif de mise en oeuvre dudit procédé |
| JPS5245639B2 (enExample) * | 1973-09-24 | 1977-11-17 | ||
| US3898496A (en) * | 1974-08-12 | 1975-08-05 | Us Energy | Means for obtaining a metal ion beam from a heavy-ion cyclotron source |
| JPS598959B2 (ja) * | 1975-06-02 | 1984-02-28 | 株式会社日立製作所 | 多重同軸型マイクロ波イオン源 |
| US4045677A (en) * | 1976-06-11 | 1977-08-30 | Cornell Research Foundation, Inc. | Intense ion beam generator |
| JPS537199A (en) * | 1976-07-09 | 1978-01-23 | Rikagaku Kenkyusho | Plasma generator |
| US4206383A (en) * | 1978-09-11 | 1980-06-03 | California Institute Of Technology | Miniature cyclotron resonance ion source using small permanent magnet |
-
1980
- 1980-02-13 FR FR8003153A patent/FR2475798A1/fr active Granted
-
1981
- 1981-01-27 GB GB8102420A patent/GB2069230B/en not_active Expired
- 1981-02-09 DE DE19813104461 patent/DE3104461A1/de not_active Ceased
- 1981-02-10 JP JP1888481A patent/JPS56128600A/ja active Granted
-
1983
- 1983-01-17 US US06/458,645 patent/US4417178A/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2147497A5 (enExample) * | 1971-07-29 | 1973-03-09 | Commissariat Energie Atomique | |
| US3778658A (en) * | 1972-09-01 | 1973-12-11 | Gen Electric | Multibeam cathode ray tube utilizing d.a.m. grid |
Non-Patent Citations (1)
| Title |
|---|
| EXRV/77 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2512623A1 (fr) * | 1981-09-10 | 1983-03-11 | Commissariat Energie Atomique | Procede de fusion et/ou d'evaporation pulsee d'un materiau solide |
| EP0142414A2 (fr) | 1983-10-17 | 1985-05-22 | Commissariat A L'energie Atomique | Source d'ions, notamment métalliques fortement chargés dont le courant d'ions est régulé |
| WO2005046296A3 (fr) * | 2003-11-04 | 2005-12-15 | Commissariat Energie Atomique | Dispositif pour controler la temperature electronique dans un plasma rce |
Also Published As
| Publication number | Publication date |
|---|---|
| GB2069230A (en) | 1981-08-19 |
| FR2475798B1 (enExample) | 1982-09-03 |
| US4417178A (en) | 1983-11-22 |
| GB2069230B (en) | 1984-03-14 |
| DE3104461A1 (de) | 1982-02-18 |
| JPH0341934B2 (enExample) | 1991-06-25 |
| JPS56128600A (en) | 1981-10-08 |
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