WO2005046296A3 - Dispositif pour controler la temperature electronique dans un plasma rce - Google Patents

Dispositif pour controler la temperature electronique dans un plasma rce Download PDF

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Publication number
WO2005046296A3
WO2005046296A3 PCT/FR2004/002821 FR2004002821W WO2005046296A3 WO 2005046296 A3 WO2005046296 A3 WO 2005046296A3 FR 2004002821 W FR2004002821 W FR 2004002821W WO 2005046296 A3 WO2005046296 A3 WO 2005046296A3
Authority
WO
WIPO (PCT)
Prior art keywords
electronic temperature
controlling
ecr plasma
electrons
plasma
Prior art date
Application number
PCT/FR2004/002821
Other languages
English (en)
Other versions
WO2005046296A2 (fr
Inventor
Denis Hitz
David Cormier
Original Assignee
Commissariat Energie Atomique
Denis Hitz
David Cormier
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat Energie Atomique, Denis Hitz, David Cormier filed Critical Commissariat Energie Atomique
Priority to US10/578,529 priority Critical patent/US20070266948A1/en
Priority to JP2006537371A priority patent/JP2007511041A/ja
Priority to EP04805372A priority patent/EP1680948A2/fr
Publication of WO2005046296A2 publication Critical patent/WO2005046296A2/fr
Publication of WO2005046296A3 publication Critical patent/WO2005046296A3/fr

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/16—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields
    • H05H1/18—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields wherein the fields oscillate at very high frequency, e.g. in the microwave range, e.g. using cyclotron resonance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)

Abstract

La présente invention concerne un dispositif pour contrôler la température électronique dans une chambre à plasma RCE (1). Ce dispositif comprend au moins un modérateur (100) placé sur la trajectoire d’électrons dont l’énergie est supérieure à une énergie prédéterminée, de façon à former obstacle à ces électrons. Application aux sources d’ions et aux machines à plasma.
PCT/FR2004/002821 2003-11-04 2004-11-03 Dispositif pour controler la temperature electronique dans un plasma rce WO2005046296A2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US10/578,529 US20070266948A1 (en) 2003-11-04 2004-11-03 Device for Controlling Electron Temperature in an Ecr Plasma
JP2006537371A JP2007511041A (ja) 2003-11-04 2004-11-03 Ｅｃｒプラズマ中の電子温度制御装置
EP04805372A EP1680948A2 (fr) 2003-11-04 2004-11-03 Dispositif pour contrôler la temperature electronique dans un plasma rce

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0312934 2003-11-04
FR0312934A FR2861947B1 (fr) 2003-11-04 2003-11-04 Dispositif pour controler la temperature electronique dans un plasma rce

Publications (2)

Publication Number Publication Date
WO2005046296A2 WO2005046296A2 (fr) 2005-05-19
WO2005046296A3 true WO2005046296A3 (fr) 2005-12-15

Family

ID=34429886

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/FR2004/002821 WO2005046296A2 (fr) 2003-11-04 2004-11-03 Dispositif pour controler la temperature electronique dans un plasma rce

Country Status (7)

Country Link
US (1) US20070266948A1 (fr)
EP (1) EP1680948A2 (fr)
JP (1) JP2007511041A (fr)
KR (1) KR20060108650A (fr)
CN (1) CN1875668A (fr)
FR (1) FR2861947B1 (fr)
WO (1) WO2005046296A2 (fr)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2475798A1 (fr) * 1980-02-13 1981-08-14 Commissariat Energie Atomique Procede et dispositif de production d'ions lourds fortement charges et une application mettant en oeuvre le procede

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4447732A (en) * 1982-05-04 1984-05-08 The United States Of America As Represented By The United States Department Of Energy Ion source
FR2556498B1 (fr) * 1983-12-07 1986-09-05 Commissariat Energie Atomique Source d'ions multicharges a plusieurs zones de resonance cyclotronique electronique
US4717178A (en) * 1986-06-03 1988-01-05 Mueller Co. Frangible coupling for barrel sections of a fire hydrant
JPH0270064A (ja) * 1988-09-02 1990-03-08 Nippon Telegr & Teleph Corp <Ntt> プラズマバッチ処理装置
FR2681186B1 (fr) * 1991-09-11 1993-10-29 Commissariat A Energie Atomique Source d'ions a resonance cyclotronique electronique et a injection coaxiale d'ondes electromagnetiques.
US5391962A (en) * 1992-07-13 1995-02-21 The United States Of America As Represented By The Secretary Of The Army Electron beam driven negative ion source
JPH06333523A (ja) * 1993-05-26 1994-12-02 Nichimen Denshi Koken Kk Ｅｃｒ放電イオン源
US5506475A (en) * 1994-03-22 1996-04-09 Martin Marietta Energy Systems, Inc. Microwave electron cyclotron electron resonance (ECR) ion source with a large, uniformly distributed, axially symmetric, ECR plasma volume
JPH1074600A (ja) * 1996-05-02 1998-03-17 Tokyo Electron Ltd プラズマ処理装置
US5703375A (en) * 1996-08-02 1997-12-30 Eaton Corporation Method and apparatus for ion beam neutralization
US6335535B1 (en) * 1998-06-26 2002-01-01 Nissin Electric Co., Ltd Method for implanting negative hydrogen ion and implanting apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2475798A1 (fr) * 1980-02-13 1981-08-14 Commissariat Energie Atomique Procede et dispositif de production d'ions lourds fortement charges et une application mettant en oeuvre le procede

Non-Patent Citations (7)

* Cited by examiner, † Cited by third party
Title
ANTONI V ET AL: "Edge plasma investigation on the reversed field pinch ETA BETA II", J. NUCL. MATER. (NETHERLANDS), JOURNAL OF NUCLEAR MATERIALS, NETHERLANDS, vol. 176-177, December 1990 (1990-12-01), pages 1076 - 1082, XP002283926, ISSN: 0022-3115 *
GOTOH Y ET AL: "Studies on properties of low-Z ceramics as limiter materials-electron beam and TEXTOR limiter tests", J. NUCL. MATER. (NETHERLANDS), JOURNAL OF NUCLEAR MATERIALS, NETHERLANDS, vol. 133-134, 1985, pages 257 - 262, XP002283930, ISSN: 0022-3115 *
MAEKAWA T ET AL: "Heat flux of fast electrons to the limiter in lower hybrid current drive plasma on WT-3", NUCL. FUSION (AUSTRIA), NUCLEAR FUSION, AUSTRIA, vol. 32, no. 10, October 1982 (1982-10-01), pages 1755 - 1768, XP002283928, ISSN: 0029-5515 *
MCGUIRE K ET AL: "ELM activity during limiter H-modes on TFTR", J. NUCL. MATER. (NETHERLANDS), JOURNAL OF NUCLEAR MATERIALS, NETHERLANDS, vol. 176-177, December 1990 (1990-12-01), pages 711 - 715, XP002283932, ISSN: 0022-3115 *
SHIMADA T ET AL: "Large-amplitude oscillations of soft X-rays in a high current density plasma on TPE-1RM15 reversed field pinch", PLASMA PHYS. CONTROL. FUSION (UK), PLASMA PHYSICS AND CONTROLLED FUSION, UK, vol. 36, no. 3, March 1994 (1994-03-01), pages 561 - 572, XP002283927, ISSN: 0741-3335 *
VOLKOV T F ET AL: "Analytical study of the scrape-off layer and the plasma column periphery", PETIT-LANCY, SWITZERLAND, EUROPEAN PHYS. SOC, SWITZERLAND, 1981, pages G - 7/39, XP002283929 *
YANG J G ET AL: "Plasma sources and characterization in the r.f. test facility", SURF. COAT. TECHNOL. (SWITZERLAND), SURFACE AND COATINGS TECHNOLOGY, ELSEVIER, SWITZERLAND, vol. 112, no. 1-3, February 1999 (1999-02-01), pages 52 - 55, XP002283931, ISSN: 0257-8972 *

Also Published As

Publication number Publication date
FR2861947B1 (fr) 2007-11-09
US20070266948A1 (en) 2007-11-22
WO2005046296A2 (fr) 2005-05-19
FR2861947A1 (fr) 2005-05-06
CN1875668A (zh) 2006-12-06
JP2007511041A (ja) 2007-04-26
KR20060108650A (ko) 2006-10-18
EP1680948A2 (fr) 2006-07-19

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