GB2162365B - Ion source - Google Patents

Ion source

Info

Publication number
GB2162365B
GB2162365B GB8518922A GB8518922A GB2162365B GB 2162365 B GB2162365 B GB 2162365B GB 8518922 A GB8518922 A GB 8518922A GB 8518922 A GB8518922 A GB 8518922A GB 2162365 B GB2162365 B GB 2162365B
Authority
GB
United Kingdom
Prior art keywords
ion source
ion
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8518922A
Other versions
GB2162365A (en
GB8518922D0 (en
Inventor
Dr Thomas Stanley Green
Michael Inman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UK Atomic Energy Authority
Original Assignee
UK Atomic Energy Authority
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB848419039A external-priority patent/GB8419039D0/en
Priority claimed from GB848419070A external-priority patent/GB8419070D0/en
Application filed by UK Atomic Energy Authority filed Critical UK Atomic Energy Authority
Publication of GB8518922D0 publication Critical patent/GB8518922D0/en
Publication of GB2162365A publication Critical patent/GB2162365A/en
Application granted granted Critical
Publication of GB2162365B publication Critical patent/GB2162365B/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
GB8518922A 1984-07-26 1985-07-26 Ion source Expired GB2162365B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB848419039A GB8419039D0 (en) 1984-07-26 1984-07-26 Ion source
GB848419070A GB8419070D0 (en) 1984-07-26 1984-07-26 Magnetic analyser

Publications (3)

Publication Number Publication Date
GB8518922D0 GB8518922D0 (en) 1985-09-04
GB2162365A GB2162365A (en) 1986-01-29
GB2162365B true GB2162365B (en) 1989-06-01

Family

ID=26288028

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8518922A Expired GB2162365B (en) 1984-07-26 1985-07-26 Ion source

Country Status (2)

Country Link
EP (1) EP0169744A3 (en)
GB (1) GB2162365B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6023038A (en) 1997-09-16 2000-02-08 Applied Materials, Inc. Resistive heating of powered coil to reduce transient heating/start up effects multiple loadlock system

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR920003562B1 (en) * 1986-03-31 1992-05-04 가부시끼가이샤 도시바 Non-ferrous metal mechanical part having a wear resistant and smooth surface
JPS62296332A (en) * 1986-06-16 1987-12-23 Hitachi Ltd Ion source
DE3632340C2 (en) * 1986-09-24 1998-01-15 Leybold Ag Inductively excited ion source
GB8905073D0 (en) * 1989-03-06 1989-04-19 Nordiko Ltd Ion gun
GB2235086A (en) * 1989-06-01 1991-02-20 Ion Tech Ltd Ion beam source
US5208512A (en) * 1990-10-16 1993-05-04 International Business Machines Corporation Scanned electron cyclotron resonance plasma source
US6264812B1 (en) 1995-11-15 2001-07-24 Applied Materials, Inc. Method and apparatus for generating a plasma
KR100489918B1 (en) 1996-05-09 2005-08-04 어플라이드 머티어리얼스, 인코포레이티드 Coils for generating a plasma and for sputtering
US6254746B1 (en) 1996-05-09 2001-07-03 Applied Materials, Inc. Recessed coil for generating a plasma
US6368469B1 (en) 1996-05-09 2002-04-09 Applied Materials, Inc. Coils for generating a plasma and for sputtering
US6254737B1 (en) 1996-10-08 2001-07-03 Applied Materials, Inc. Active shield for generating a plasma for sputtering
US6190513B1 (en) 1997-05-14 2001-02-20 Applied Materials, Inc. Darkspace shield for improved RF transmission in inductively coupled plasma sources for sputter deposition
US6514390B1 (en) 1996-10-17 2003-02-04 Applied Materials, Inc. Method to eliminate coil sputtering in an ICP source
US5961793A (en) * 1996-10-31 1999-10-05 Applied Materials, Inc. Method of reducing generation of particulate matter in a sputtering chamber
TW358964B (en) 1996-11-21 1999-05-21 Applied Materials Inc Method and apparatus for improving sidewall coverage during sputtering in a chamber having an inductively coupled plasma
US6451179B1 (en) 1997-01-30 2002-09-17 Applied Materials, Inc. Method and apparatus for enhancing sidewall coverage during sputtering in a chamber having an inductively coupled plasma
US6599399B2 (en) 1997-03-07 2003-07-29 Applied Materials, Inc. Sputtering method to generate ionized metal plasma using electron beams and magnetic field
US6103070A (en) * 1997-05-14 2000-08-15 Applied Materials, Inc. Powered shield source for high density plasma
US6210539B1 (en) 1997-05-14 2001-04-03 Applied Materials, Inc. Method and apparatus for producing a uniform density plasma above a substrate
US6361661B2 (en) 1997-05-16 2002-03-26 Applies Materials, Inc. Hybrid coil design for ionized deposition
US6077402A (en) * 1997-05-16 2000-06-20 Applied Materials, Inc. Central coil design for ionized metal plasma deposition
US6579426B1 (en) 1997-05-16 2003-06-17 Applied Materials, Inc. Use of variable impedance to control coil sputter distribution
US6652717B1 (en) 1997-05-16 2003-11-25 Applied Materials, Inc. Use of variable impedance to control coil sputter distribution
US6235169B1 (en) 1997-08-07 2001-05-22 Applied Materials, Inc. Modulated power for ionized metal plasma deposition
US6345588B1 (en) 1997-08-07 2002-02-12 Applied Materials, Inc. Use of variable RF generator to control coil voltage distribution
US6375810B2 (en) 1997-08-07 2002-04-23 Applied Materials, Inc. Plasma vapor deposition with coil sputtering
US6565717B1 (en) 1997-09-15 2003-05-20 Applied Materials, Inc. Apparatus for sputtering ionized material in a medium to high density plasma
US6042700A (en) * 1997-09-15 2000-03-28 Applied Materials, Inc. Adjustment of deposition uniformity in an inductively coupled plasma source
US6280579B1 (en) 1997-12-19 2001-08-28 Applied Materials, Inc. Target misalignment detector
US6254738B1 (en) 1998-03-31 2001-07-03 Applied Materials, Inc. Use of variable impedance having rotating core to control coil sputter distribution
US6146508A (en) * 1998-04-22 2000-11-14 Applied Materials, Inc. Sputtering method and apparatus with small diameter RF coil
TW434636B (en) 1998-07-13 2001-05-16 Applied Komatsu Technology Inc RF matching network with distributed outputs
US6132566A (en) * 1998-07-30 2000-10-17 Applied Materials, Inc. Apparatus and method for sputtering ionized material in a plasma
US6231725B1 (en) 1998-08-04 2001-05-15 Applied Materials, Inc. Apparatus for sputtering material onto a workpiece with the aid of a plasma
US6238528B1 (en) 1998-10-13 2001-05-29 Applied Materials, Inc. Plasma density modulator for improved plasma density uniformity and thickness uniformity in an ionized metal plasma source
US6217718B1 (en) 1999-02-17 2001-04-17 Applied Materials, Inc. Method and apparatus for reducing plasma nonuniformity across the surface of a substrate in apparatus for producing an ionized metal plasma
DE10058326C1 (en) 2000-11-24 2002-06-13 Astrium Gmbh Inductively coupled high-frequency electron source with reduced power requirements due to electrostatic confinement of electrons
DE102008022181B4 (en) * 2008-05-05 2019-05-02 Arianegroup Gmbh Ion engine

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3302026A (en) * 1963-07-25 1967-01-31 Exxon Production Research Co Ion source neutron generator having magnetically stabilized plasma
GB1399603A (en) * 1971-09-07 1975-07-02 Boswell R W Christiansen P J N Ion sources
GB2069230A (en) * 1980-02-13 1981-08-19 Commissariat Energie Atomique Process and apparatus for producing highly charged large ions and an application utilizing this process

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4017403A (en) * 1974-07-31 1977-04-12 United Kingdom Atomic Energy Authority Ion beam separators
US4447773A (en) * 1981-06-22 1984-05-08 California Institute Of Technology Ion beam accelerator system
JPS6043620B2 (en) * 1982-11-25 1985-09-28 日新ハイボルテージ株式会社 microwave ion source

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3302026A (en) * 1963-07-25 1967-01-31 Exxon Production Research Co Ion source neutron generator having magnetically stabilized plasma
GB1399603A (en) * 1971-09-07 1975-07-02 Boswell R W Christiansen P J N Ion sources
GB2069230A (en) * 1980-02-13 1981-08-19 Commissariat Energie Atomique Process and apparatus for producing highly charged large ions and an application utilizing this process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6023038A (en) 1997-09-16 2000-02-08 Applied Materials, Inc. Resistive heating of powered coil to reduce transient heating/start up effects multiple loadlock system

Also Published As

Publication number Publication date
GB2162365A (en) 1986-01-29
EP0169744A2 (en) 1986-01-29
EP0169744A3 (en) 1987-06-10
GB8518922D0 (en) 1985-09-04

Similar Documents

Publication Publication Date Title
GB2162365B (en) Ion source
EP0217361A3 (en) Ion source
EP0164715A3 (en) Microwave ion source
EP0154824A3 (en) Ion source
GB8518738D0 (en) Power source
DE3277662D1 (en) An ion source assembly
EP0156473A3 (en) Electron-impact type of ion source
GB2180093B (en) Ion implanter
EP0291185A3 (en) Improved ion source
DE3167131D1 (en) Ion source
GB2115219B (en) High current ion source
GB2180686B (en) Ion source
GB2156398B (en) Two-part joist-hanger
DE3270023D1 (en) Field-emission-type ion source
GB2212520B (en) Ion source
GB8711801D0 (en) Ion source
GB8419039D0 (en) Ion source
GB8603585D0 (en) Ion beam arrangement
GB8419588D0 (en) Ion source
GB8306032D0 (en) Ion source
GB2162697B (en) Slot ionizer
SU1245152A2 (en) Ion source
GB8426652D0 (en) Ion sources
BG39447A1 (en) Ion source
BG37203A1 (en) Ion source

Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee