FR2472208A1 - Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme - Google Patents

Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme Download PDF

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Publication number
FR2472208A1
FR2472208A1 FR7930935A FR7930935A FR2472208A1 FR 2472208 A1 FR2472208 A1 FR 2472208A1 FR 7930935 A FR7930935 A FR 7930935A FR 7930935 A FR7930935 A FR 7930935A FR 2472208 A1 FR2472208 A1 FR 2472208A1
Authority
FR
France
Prior art keywords
pattern
alignment
optical
projection
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7930935A
Other languages
English (en)
French (fr)
Other versions
FR2472208B1 (enExample
Inventor
Michel Lacombat
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR7930935A priority Critical patent/FR2472208A1/fr
Priority to EP80401675A priority patent/EP0030878B1/fr
Priority to DE8080401675T priority patent/DE3070084D1/de
Priority to US06/212,618 priority patent/US4367046A/en
Priority to JP17865880A priority patent/JPS5698831A/ja
Publication of FR2472208A1 publication Critical patent/FR2472208A1/fr
Application granted granted Critical
Publication of FR2472208B1 publication Critical patent/FR2472208B1/fr
Granted legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR7930935A 1979-12-18 1979-12-18 Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme Granted FR2472208A1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR7930935A FR2472208A1 (fr) 1979-12-18 1979-12-18 Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme
EP80401675A EP0030878B1 (fr) 1979-12-18 1980-11-21 Système optique d'alignement de deux motifs et photorépéteur mettant en oeuvre un tel système
DE8080401675T DE3070084D1 (en) 1979-12-18 1980-11-21 Optical aligning system for two patterns and photorepeater making use of such a system
US06/212,618 US4367046A (en) 1979-12-18 1980-12-03 Optical system for aligning two patterns and a photorepeater embodying such a system
JP17865880A JPS5698831A (en) 1979-12-18 1980-12-17 Optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7930935A FR2472208A1 (fr) 1979-12-18 1979-12-18 Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme

Publications (2)

Publication Number Publication Date
FR2472208A1 true FR2472208A1 (fr) 1981-06-26
FR2472208B1 FR2472208B1 (enExample) 1982-04-09

Family

ID=9232871

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7930935A Granted FR2472208A1 (fr) 1979-12-18 1979-12-18 Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme

Country Status (5)

Country Link
US (1) US4367046A (enExample)
EP (1) EP0030878B1 (enExample)
JP (1) JPS5698831A (enExample)
DE (1) DE3070084D1 (enExample)
FR (1) FR2472208A1 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4573791A (en) * 1979-04-03 1986-03-04 Optimetrix Corporation Step-and-repeat projection alignment and exposure system
US4452526A (en) * 1980-02-29 1984-06-05 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit
US4597664A (en) * 1980-02-29 1986-07-01 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit
JPS57142612A (en) * 1981-02-27 1982-09-03 Nippon Kogaku Kk <Nikon> Alignment optical system of projection type exposure device
JPS58116541A (ja) * 1981-12-29 1983-07-11 Canon Inc 整合方法
US4388386A (en) * 1982-06-07 1983-06-14 International Business Machines Corporation Mask set mismatch
US4577958A (en) * 1982-06-18 1986-03-25 Eaton Optimetrix, Inc. Bore-sighted step-and-repeat projection alignment and exposure system
US4577957A (en) * 1983-01-07 1986-03-25 Eaton-Optimetrix, Inc. Bore-sighted step-and-repeat projection alignment and exposure system
JPH0732109B2 (ja) * 1983-10-07 1995-04-10 株式会社日立製作所 光露光方法
US4704027A (en) * 1986-06-19 1987-11-03 Compact Spindle Bearing Corporation Dark field alignment and alignment mark systems
US4755053A (en) * 1986-11-12 1988-07-05 Hewlett-Packard Company Secondary alignment fiducials for automatic alignment using machine vision.
US5168306A (en) * 1989-04-04 1992-12-01 Asahi Kogaku Kogyo Kabushiki Kaisha Exposure apparatus
DE102004013886A1 (de) * 2004-03-16 2005-10-06 Carl Zeiss Smt Ag Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem
US7782442B2 (en) * 2005-12-06 2010-08-24 Nikon Corporation Exposure apparatus, exposure method, projection optical system and device producing method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3718396A (en) * 1971-12-28 1973-02-27 Licentia Gmbh System for photographic production of semiconductor micro structures

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52109875A (en) * 1976-02-25 1977-09-14 Hitachi Ltd Position matching system for mask and wafer and its unit
NL7606548A (nl) * 1976-06-17 1977-12-20 Philips Nv Werkwijze en inrichting voor het uitrichten van een i.c.-patroon ten opzichte van een halfgelei- dend substraat.
JPS602772B2 (ja) * 1976-11-01 1985-01-23 株式会社日立製作所 露光装置
FR2388249A1 (fr) * 1977-04-20 1978-11-17 Thomson Csf Dispositif de positionnement d'un objet dans un systeme optique de projection et systeme optique de projection comportant un tel dispositif
FR2450468A1 (fr) * 1979-02-27 1980-09-26 Thomson Csf Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3718396A (en) * 1971-12-28 1973-02-27 Licentia Gmbh System for photographic production of semiconductor micro structures

Also Published As

Publication number Publication date
EP0030878A1 (fr) 1981-06-24
EP0030878B1 (fr) 1985-01-30
JPH0140493B2 (enExample) 1989-08-29
FR2472208B1 (enExample) 1982-04-09
US4367046A (en) 1983-01-04
JPS5698831A (en) 1981-08-08
DE3070084D1 (en) 1985-03-14

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