FR2446501A1 - Materiau photographique comportant une couche antistatique a base de polymere acide carboxylique - Google Patents
Materiau photographique comportant une couche antistatique a base de polymere acide carboxyliqueInfo
- Publication number
- FR2446501A1 FR2446501A1 FR8000550A FR8000550A FR2446501A1 FR 2446501 A1 FR2446501 A1 FR 2446501A1 FR 8000550 A FR8000550 A FR 8000550A FR 8000550 A FR8000550 A FR 8000550A FR 2446501 A1 FR2446501 A1 FR 2446501A1
- Authority
- FR
- France
- Prior art keywords
- antistatic layer
- carboxylic acid
- photographic material
- acid polymer
- layer based
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/06—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom
- C07D213/16—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom containing only one pyridine ring
- C07D213/20—Quaternary compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/46—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with hetero atoms directly attached to the ring nitrogen atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D215/00—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
- C07D215/02—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
- C07D215/16—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D215/20—Oxygen atoms
- C07D215/22—Oxygen atoms attached in position 2 or 4
- C07D215/227—Oxygen atoms attached in position 2 or 4 only one oxygen atom which is attached in position 2
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
- G03C1/89—Macromolecular substances therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Laminated Bodies (AREA)
Abstract
L'invention concerne les matériaux photographiques. Le matériau photographique suivant l'invention comporte une couche antistatique contenant un polymère filmogène soluble dans l'eau, portant des groupes acides carboxyliques, de la gélatine, ainsi qu'un activateur de condensation d'acide carboxylique agissant sur le polymère pour améliorer les propriétés de la couche antistatique. Application aux matériaux photographiques comportant une couche antistatique.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP54001930A JPS5950986B2 (ja) | 1979-01-11 | 1979-01-11 | カルボン酸ポリマ−層を有する写真感光材料 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2446501A1 true FR2446501A1 (fr) | 1980-08-08 |
Family
ID=11515316
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8000550A Withdrawn FR2446501A1 (fr) | 1979-01-11 | 1980-01-11 | Materiau photographique comportant une couche antistatique a base de polymere acide carboxylique |
Country Status (5)
Country | Link |
---|---|
US (1) | US4268623A (fr) |
JP (1) | JPS5950986B2 (fr) |
DE (1) | DE3000620A1 (fr) |
FR (1) | FR2446501A1 (fr) |
GB (1) | GB2045959B (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0318909A2 (fr) * | 1987-11-30 | 1989-06-07 | E.I. Du Pont De Nemours And Company | Couche dorsale antistatique pour film photographique avec couche auxiliaire |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56159640A (en) * | 1980-05-13 | 1981-12-09 | Konishiroku Photo Ind Co Ltd | Electrophotographic sensitive material |
JPS5745460A (en) * | 1980-09-02 | 1982-03-15 | Fuji Photo Film Co Ltd | Inspection sheet for measuring trace component and inspecting method using said sheet |
JPS57204540A (en) * | 1981-06-12 | 1982-12-15 | Fuji Photo Film Co Ltd | Photographic sensitive material |
JPS58166341A (ja) * | 1982-03-27 | 1983-10-01 | Konishiroku Photo Ind Co Ltd | ハロゲン化銀写真感光材料 |
DE3416897A1 (de) * | 1984-05-08 | 1985-11-14 | Agfa-Gevaert Ag, 5090 Leverkusen | Photographisches material |
JPS61178784U (fr) * | 1985-04-25 | 1986-11-07 | ||
EP0247648B1 (fr) * | 1986-05-26 | 1989-08-23 | Agfa-Gevaert N.V. | Feuille ou voile portant une couche antistatique |
JPS63153538A (ja) * | 1986-08-21 | 1988-06-25 | Fuji Photo Film Co Ltd | ハロゲン化銀写真感光材料 |
JPH0375740A (ja) * | 1989-08-18 | 1991-03-29 | Konica Corp | 写真用印画紙支持体 |
JP2796862B2 (ja) * | 1989-11-15 | 1998-09-10 | コニカ株式会社 | 帯電防止性と耐圧性を改良したハロゲン化銀写真感光材料 |
JP2794513B2 (ja) * | 1992-05-26 | 1998-09-10 | 富士写真フイルム株式会社 | ハロゲン化銀写真感光材料 |
EP0576911A3 (en) * | 1992-06-29 | 1994-06-15 | Du Pont | In situ modification of gelatin amine groups |
US5589324A (en) * | 1993-07-13 | 1996-12-31 | International Paper Company | Antistatic layer for photographic elements comprising polymerized polyfunctional aziridine monomers |
US5529891A (en) * | 1995-05-12 | 1996-06-25 | Eastman Kodak Company | Photographic element having improved scratch resistance |
US5541048A (en) * | 1995-05-12 | 1996-07-30 | Eastman Kodak Company | Lubricant particles, method of preparation, and photographic elements |
US5683862A (en) * | 1996-10-31 | 1997-11-04 | Eastman Kodak Company | Poly(ethylene oxide) and alkali metal salt antistatic backing layer for photographic paper coated with polyolefin layer |
US6077655A (en) † | 1999-03-25 | 2000-06-20 | Eastman Kodak Company | Antistatic layer for imaging element containing electrically conductive polymer and modified gelatin |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3446651A (en) * | 1965-02-18 | 1969-05-27 | Bexford Ltd | Plastic film coated with antistatic agent |
FR2084593A5 (fr) * | 1970-03-12 | 1971-12-17 | Agfa Gevaert Ag | |
DE2408813A1 (de) * | 1974-02-23 | 1975-09-04 | Agfa Gevaert Ag | N-carbamoyloxypyridiniumsalze und verfahren zur herstellung derselben |
DE2408814A1 (de) * | 1974-02-23 | 1975-09-04 | Agfa Gevaert Ag | Haertung photographischer schichten |
GB1496027A (en) * | 1974-07-24 | 1977-12-21 | Eastman Kodak Co | Photographic support materials |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2725297A (en) * | 1952-10-08 | 1955-11-29 | Eastman Kodak Co | Antistatic photographic film |
US3062649A (en) * | 1958-08-26 | 1962-11-06 | Eastman Kodak Co | Photographic film with antistatic layer |
US3573083A (en) * | 1969-03-28 | 1971-03-30 | Conwed Corp | Surface-layered felted fiber substrate and method of producing same |
-
1979
- 1979-01-11 JP JP54001930A patent/JPS5950986B2/ja not_active Expired
-
1980
- 1980-01-09 DE DE19803000620 patent/DE3000620A1/de not_active Withdrawn
- 1980-01-09 GB GB8000675A patent/GB2045959B/en not_active Expired
- 1980-01-11 US US06/111,498 patent/US4268623A/en not_active Expired - Lifetime
- 1980-01-11 FR FR8000550A patent/FR2446501A1/fr not_active Withdrawn
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3446651A (en) * | 1965-02-18 | 1969-05-27 | Bexford Ltd | Plastic film coated with antistatic agent |
FR2084593A5 (fr) * | 1970-03-12 | 1971-12-17 | Agfa Gevaert Ag | |
DE2408813A1 (de) * | 1974-02-23 | 1975-09-04 | Agfa Gevaert Ag | N-carbamoyloxypyridiniumsalze und verfahren zur herstellung derselben |
DE2408814A1 (de) * | 1974-02-23 | 1975-09-04 | Agfa Gevaert Ag | Haertung photographischer schichten |
FR2262036A1 (fr) * | 1974-02-23 | 1975-09-19 | Agfa Gevaert Ag | |
FR2262327A1 (fr) * | 1974-02-23 | 1975-09-19 | Agfa Gevaert Ag | |
GB1496027A (en) * | 1974-07-24 | 1977-12-21 | Eastman Kodak Co | Photographic support materials |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0318909A2 (fr) * | 1987-11-30 | 1989-06-07 | E.I. Du Pont De Nemours And Company | Couche dorsale antistatique pour film photographique avec couche auxiliaire |
EP0318909A3 (en) * | 1987-11-30 | 1989-09-27 | E.I. Du Pont De Nemours And Company | Photographic film antistatic backing layer with auxiliary layer having improved properties |
Also Published As
Publication number | Publication date |
---|---|
JPS5595942A (en) | 1980-07-21 |
JPS5950986B2 (ja) | 1984-12-11 |
GB2045959B (en) | 1983-05-05 |
US4268623A (en) | 1981-05-19 |
GB2045959A (en) | 1980-11-05 |
DE3000620A1 (de) | 1980-07-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |