FR2435810A1 - Perfectionnements aux dispositifs de pulverisation cathodique, notamment pour le depot de couches minces - Google Patents

Perfectionnements aux dispositifs de pulverisation cathodique, notamment pour le depot de couches minces

Info

Publication number
FR2435810A1
FR2435810A1 FR7825960A FR7825960A FR2435810A1 FR 2435810 A1 FR2435810 A1 FR 2435810A1 FR 7825960 A FR7825960 A FR 7825960A FR 7825960 A FR7825960 A FR 7825960A FR 2435810 A1 FR2435810 A1 FR 2435810A1
Authority
FR
France
Prior art keywords
tube
appts
sputtering
gas
sight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7825960A
Other languages
English (en)
Other versions
FR2435810B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bpifrance Financement SA
Original Assignee
Agence National de Valorisation de la Recherche ANVAR
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agence National de Valorisation de la Recherche ANVAR filed Critical Agence National de Valorisation de la Recherche ANVAR
Priority to FR7825960A priority Critical patent/FR2435810A1/fr
Publication of FR2435810A1 publication Critical patent/FR2435810A1/fr
Application granted granted Critical
Publication of FR2435810B1 publication Critical patent/FR2435810B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/354—Introduction of auxiliary energy into the plasma
    • C23C14/355—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

L'invention concerne un dispositif pour pulvériser une substance à partir d'une cible 5 à l'aide d'ions d'un plasma engendré par décharge d'électrons dans un gaz raréfié. On fait comprendre à ce dispositif, en plus d'un manchon 6 en silice s'étendant horizontalement de la cathode 7 à l'anode 8, du côté de la cathode, un masque 15 en silice en forme de tronc de cône ou de pyramide convergeant vers cette cathode et l'on constitue l'anode par un tube annulaire entourant une extrémité du manchon de façon qu'aucune de ces deux électrodes ne puisse être vue directement depuis l'intérieur du manchon. Application préférée : dépôts de couches minces exemptes d'impuretés en provenance de l'environnement du plasma et en particulier des deux électrodes.
FR7825960A 1978-09-08 1978-09-08 Perfectionnements aux dispositifs de pulverisation cathodique, notamment pour le depot de couches minces Granted FR2435810A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7825960A FR2435810A1 (fr) 1978-09-08 1978-09-08 Perfectionnements aux dispositifs de pulverisation cathodique, notamment pour le depot de couches minces

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7825960A FR2435810A1 (fr) 1978-09-08 1978-09-08 Perfectionnements aux dispositifs de pulverisation cathodique, notamment pour le depot de couches minces

Publications (2)

Publication Number Publication Date
FR2435810A1 true FR2435810A1 (fr) 1980-04-04
FR2435810B1 FR2435810B1 (fr) 1981-12-24

Family

ID=9212476

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7825960A Granted FR2435810A1 (fr) 1978-09-08 1978-09-08 Perfectionnements aux dispositifs de pulverisation cathodique, notamment pour le depot de couches minces

Country Status (1)

Country Link
FR (1) FR2435810A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0247397A2 (fr) * 1986-05-06 1987-12-02 dos Santos Pereira Ribeiro, Carlos Antonio, Dipl.-Ing. Dispositif à traitement de surface de pièces à usiner
US4885068A (en) * 1988-09-08 1989-12-05 Joshin Uramoto Sheet plasma sputtering method and an apparatus for carrying out the method

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3296115A (en) * 1964-03-02 1967-01-03 Schjeldahl Co G T Sputtering of metals wherein gas flow is confined to increase the purity of deposition
US3336211A (en) * 1963-04-30 1967-08-15 Litton Systems Inc Reduction of oxides by ion bombardment
FR1537229A (fr) * 1966-09-01 1968-08-23 Western Electric Co Dépôt d'une pellicule isolante mince
US3487000A (en) * 1967-02-27 1969-12-30 Bendix Corp Sputtering apparatus
US3583899A (en) * 1968-12-18 1971-06-08 Norton Co Sputtering apparatus
US3779801A (en) * 1971-03-26 1973-12-18 Ford Motor Co High mobility epitaxial layers of pbte and pb{11 {118 {11 {11 sn{11 {11 te prepared by post- growth annealing
US4111783A (en) * 1977-11-08 1978-09-05 Bell Telephone Laboratories, Incorporated Triode sputtering system

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3336211A (en) * 1963-04-30 1967-08-15 Litton Systems Inc Reduction of oxides by ion bombardment
US3296115A (en) * 1964-03-02 1967-01-03 Schjeldahl Co G T Sputtering of metals wherein gas flow is confined to increase the purity of deposition
FR1537229A (fr) * 1966-09-01 1968-08-23 Western Electric Co Dépôt d'une pellicule isolante mince
US3487000A (en) * 1967-02-27 1969-12-30 Bendix Corp Sputtering apparatus
US3583899A (en) * 1968-12-18 1971-06-08 Norton Co Sputtering apparatus
US3779801A (en) * 1971-03-26 1973-12-18 Ford Motor Co High mobility epitaxial layers of pbte and pb{11 {118 {11 {11 sn{11 {11 te prepared by post- growth annealing
US4111783A (en) * 1977-11-08 1978-09-05 Bell Telephone Laboratories, Incorporated Triode sputtering system

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NV400/75 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0247397A2 (fr) * 1986-05-06 1987-12-02 dos Santos Pereira Ribeiro, Carlos Antonio, Dipl.-Ing. Dispositif à traitement de surface de pièces à usiner
EP0247397A3 (en) * 1986-05-06 1989-02-01 Carlos Antonio Dipl.-Ing. Dos Santos Pereira Ribeiro Apparatus for the surface treatment of work pieces
US4885068A (en) * 1988-09-08 1989-12-05 Joshin Uramoto Sheet plasma sputtering method and an apparatus for carrying out the method
EP0357824A1 (fr) * 1988-09-08 1990-03-14 Joshin Uramoto Méthode de pulvérisation par flux de plasma en ruban et appareil pour la mise en oeuvre de cette méthode

Also Published As

Publication number Publication date
FR2435810B1 (fr) 1981-12-24

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Legal Events

Date Code Title Description
ST Notification of lapse