|
JPS6134167Y2
(GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
*
|
1981-02-12 |
1986-10-06 |
|
|
|
JPS57150001U
(GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
*
|
1981-03-17 |
1982-09-20 |
|
|
|
JPS57157105A
(en)
*
|
1981-03-24 |
1982-09-28 |
Kokusai Electric Co Ltd |
Device for measuring thickness of thin film
|
|
DE3135443A1
(de)
*
|
1981-09-08 |
1983-03-24 |
Leybold-Heraeus GmbH, 5000 Köln |
Verfahren und fotometrische anordnung zur dickenmessung und -steuerung optisch wirksamer schichten
|
|
JPS5879401U
(ja)
*
|
1981-11-25 |
1983-05-28 |
本田技研工業株式会社 |
車両用ホイ−ル
|
|
JPS58115306A
(ja)
*
|
1981-12-29 |
1983-07-09 |
Chugai Ro Kogyo Kaisha Ltd |
塗膜厚連続測定装置
|
|
US4522510A
(en)
*
|
1982-07-26 |
1985-06-11 |
Therma-Wave, Inc. |
Thin film thickness measurement with thermal waves
|
|
JPS6037226A
(ja)
*
|
1983-08-10 |
1985-02-26 |
Hitachi Ltd |
二部材の結合方法
|
|
JPS60127403A
(ja)
*
|
1983-12-13 |
1985-07-08 |
Anritsu Corp |
厚み測定装置
|
|
EP0147481B1
(de)
*
|
1983-12-27 |
1987-09-02 |
Ibm Deutschland Gmbh |
Weisslicht-Interferometer
|
|
JPS61217705A
(ja)
*
|
1985-03-22 |
1986-09-27 |
Dainippon Screen Mfg Co Ltd |
膜厚測定装置
|
|
US4958930A
(en)
*
|
1985-12-11 |
1990-09-25 |
E. I. Du Pont De Nemours And Company |
Apparatus for monitoring thickness variations in a film web
|
|
JPH0617774B2
(ja)
*
|
1987-06-22 |
1994-03-09 |
大日本スクリ−ン製造株式会社 |
微小高低差測定装置
|
|
DE3728704A1
(de)
*
|
1987-08-28 |
1989-03-09 |
Agfa Gevaert Ag |
Vorrichtung zur bestimmung der dicke von schichttraegern
|
|
DE3728705A1
(de)
*
|
1987-08-28 |
1989-03-09 |
Agfa Gevaert Ag |
Vorrichtung zur ueberpruefung von beschichteten und unbeschichteten folien
|
|
DE3939877A1
(de)
*
|
1989-12-01 |
1991-06-06 |
Siemens Ag |
Messanordnung zur beruehrungslosen bestimmung der dicke und/oder thermischen eigenschaften von folien und duennen oberflaechenbeschichtungen
|
|
DE3939876A1
(de)
*
|
1989-12-01 |
1991-06-06 |
Siemens Ag |
Messanordnung zur beruehrungslosen bestimmung der dicke und/oder thermischen eigenschaften von folien und duennen oberflaechenbeschichtungen
|
|
JPH03285106A
(ja)
*
|
1990-03-31 |
1991-12-16 |
Photonics:Kk |
表面検査装置
|
|
US5293214A
(en)
*
|
1991-12-06 |
1994-03-08 |
Hughes Aircraft Company |
Apparatus and method for performing thin film layer thickness metrology by deforming a thin film layer into a reflective condenser
|
|
US5291269A
(en)
*
|
1991-12-06 |
1994-03-01 |
Hughes Aircraft Company |
Apparatus and method for performing thin film layer thickness metrology on a thin film layer having shape deformations and local slope variations
|
|
US5333049A
(en)
*
|
1991-12-06 |
1994-07-26 |
Hughes Aircraft Company |
Apparatus and method for interferometrically measuring the thickness of thin films using full aperture irradiation
|
|
US5290586A
(en)
*
|
1992-09-10 |
1994-03-01 |
International Business Machines Corporation |
Method to monitor Meta-Paete cure on metallized substrates
|
|
US5406090A
(en)
*
|
1993-02-22 |
1995-04-11 |
Mattson Instruments, Inc. |
Spectrometer and IR source therefor
|
|
US5452953A
(en)
*
|
1993-10-12 |
1995-09-26 |
Hughes Aircraft Company |
Film thickness measurement of structures containing a scattering surface
|
|
FR2716531B1
(fr)
*
|
1994-02-18 |
1996-05-03 |
Saint Gobain Cinematique Contr |
Procédé de mesure d'épaisseur d'un matériau transparent.
|
|
DE19601923C1
(de)
*
|
1996-01-12 |
1997-07-24 |
Inst Chemo Biosensorik |
Verfahren und Vorrichtung zum Erkennen organischer Substanzen
|
|
US5752607A
(en)
*
|
1996-03-18 |
1998-05-19 |
Moen Incorporated |
Process for distinguishing plumbing parts by the coatings applied thereto
|
|
KR20000016177A
(ko)
*
|
1996-05-31 |
2000-03-25 |
브룬닝 존 에이치. |
반도체 웨이퍼의 두께 변화를 측정하는 간섭계
|
|
US6034774A
(en)
*
|
1998-06-26 |
2000-03-07 |
Eastman Kodak Company |
Method for determining the retardation of a material using non-coherent light interferometery
|
|
FR2780778B3
(fr)
|
1998-07-03 |
2000-08-11 |
Saint Gobain Vitrage |
Procede et dispositif pour la mesure de l'epaisseur d'un materiau transparent
|
|
US6470294B1
(en)
*
|
1999-04-13 |
2002-10-22 |
Qualitek-Vib, Inc. |
System and method for the on-line measurement of glue application rate on a corrugator
|
|
GB0611156D0
(en)
*
|
2006-06-07 |
2006-07-19 |
Qinetiq Ltd |
Optical inspection
|
|
JP5009709B2
(ja)
*
|
2007-07-20 |
2012-08-22 |
富士フイルム株式会社 |
厚み測定用光干渉測定装置
|
|
US9581433B2
(en)
|
2013-12-11 |
2017-02-28 |
Honeywell Asca Inc. |
Caliper sensor and method using mid-infrared interferometry
|
|
DE102015007054A1
(de)
|
2015-06-02 |
2016-12-08 |
Thomas Huth-Fehre |
Verfahren und Vorrichtung zur Bestimmung der Dicke von dünnen organischen Schichten
|
|
DE102015118069B4
(de)
*
|
2015-10-22 |
2017-08-31 |
Precitec Optronik Gmbh |
Messvorrichtung und Verfahren zur Messung der Dicke einer flächigen Probe
|
|
CN108050947A
(zh)
*
|
2018-01-02 |
2018-05-18 |
京东方科技集团股份有限公司 |
一种膜层厚度的检测方法
|
|
WO2020128593A1
(en)
*
|
2018-12-20 |
2020-06-25 |
Arcelormittal |
Measure of the degree of crystallinity of a polymer coating on a metal substrate
|
|
JP7230540B2
(ja)
*
|
2019-01-31 |
2023-03-01 |
セイコーエプソン株式会社 |
分光システム
|