FR2414791A1 - Appareil de lithographie a rayons x et procede d'utilisation - Google Patents
Appareil de lithographie a rayons x et procede d'utilisationInfo
- Publication number
- FR2414791A1 FR2414791A1 FR7900521A FR7900521A FR2414791A1 FR 2414791 A1 FR2414791 A1 FR 2414791A1 FR 7900521 A FR7900521 A FR 7900521A FR 7900521 A FR7900521 A FR 7900521A FR 2414791 A1 FR2414791 A1 FR 2414791A1
- Authority
- FR
- France
- Prior art keywords
- ray lithography
- lithography
- lithography apparatus
- line
- tungsten
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
- G03F7/2039—X-ray radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/167—X-ray
- Y10S430/168—X-ray exposure process
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Plasma & Fusion (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- X-Ray Techniques (AREA)
- Radiography Using Non-Light Waves (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/869,541 US4215192A (en) | 1978-01-16 | 1978-01-16 | X-ray lithography apparatus and method of use |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2414791A1 true FR2414791A1 (fr) | 1979-08-10 |
FR2414791B1 FR2414791B1 (US06534493-20030318-C00166.png) | 1984-11-09 |
Family
ID=25353753
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7900521A Granted FR2414791A1 (fr) | 1978-01-16 | 1979-01-10 | Appareil de lithographie a rayons x et procede d'utilisation |
Country Status (8)
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4342917A (en) * | 1978-01-16 | 1982-08-03 | The Perkin-Elmer Corporation | X-ray lithography apparatus and method of use |
US4388728A (en) * | 1978-11-20 | 1983-06-14 | The Machlett Laboratories, Incorporated | Soft X-ray lithography system |
US4357364A (en) * | 1981-04-27 | 1982-11-02 | Rockwell International Corporation | High rate resist polymerization method |
US4477921A (en) * | 1981-11-27 | 1984-10-16 | Spire Corporation | X-Ray lithography source tube |
JPS58111318A (ja) * | 1981-12-25 | 1983-07-02 | Hitachi Ltd | 現像方法 |
US4439870A (en) * | 1981-12-28 | 1984-03-27 | Bell Telephone Laboratories, Incorporated | X-Ray source and method of making same |
US4493097A (en) * | 1982-08-30 | 1985-01-08 | The Perkin-Elmer Corporation | Electron gun assembly |
US4665541A (en) * | 1983-06-06 | 1987-05-12 | The University Of Rochester | X-ray lithography |
DE3330806A1 (de) * | 1983-08-26 | 1985-03-14 | Feinfocus Röntgensysteme GmbH, 3050 Wunstorf | Roentgenlithographiegeraet |
ATE49322T1 (de) * | 1983-08-26 | 1990-01-15 | Feinfocus Verwaltung | Roentgenlithographiegeraet. |
US4539695A (en) * | 1984-01-06 | 1985-09-03 | The Perkin-Elmer Corporation | X-Ray lithography system |
US4534047A (en) * | 1984-01-06 | 1985-08-06 | The Perkin-Elmer Corporation | Mask ring assembly for X-ray lithography |
US4610020A (en) * | 1984-01-06 | 1986-09-02 | The Perkin-Elmer Corporation | X-ray mask ring and apparatus for making same |
GB2155201B (en) * | 1984-02-24 | 1988-07-13 | Canon Kk | An x-ray exposure apparatus |
US5821035A (en) * | 1996-03-06 | 1998-10-13 | Sony Corporation | Resist developing apparatus and resist developing method |
JP3702108B2 (ja) * | 1998-10-07 | 2005-10-05 | 株式会社東芝 | レジストパターン形成方法 |
EP3696845A1 (en) * | 2019-02-12 | 2020-08-19 | Malvern Panalytical B.V. | X-ray tube and x-ray analysis system |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3742229A (en) * | 1972-06-29 | 1973-06-26 | Massachusetts Inst Technology | Soft x-ray mask alignment system |
FR2168053A5 (US06534493-20030318-C00166.png) * | 1972-01-14 | 1973-08-24 | Massachusett Inst Technolog | |
FR2244196A1 (US06534493-20030318-C00166.png) * | 1973-09-17 | 1975-04-11 | Siemens Ag | |
GB1415811A (en) * | 1973-01-03 | 1975-11-26 | Machlett Lab Inc | Rotating anode x-ray tube |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3742230A (en) * | 1972-06-29 | 1973-06-26 | Massachusetts Inst Technology | Soft x-ray mask support substrate |
US4035522A (en) * | 1974-07-19 | 1977-07-12 | International Business Machines Corporation | X-ray lithography mask |
US4061829A (en) * | 1976-04-26 | 1977-12-06 | Bell Telephone Laboratories, Incorporated | Negative resist for X-ray and electron beam lithography and method of using same |
-
1978
- 1978-01-16 US US05/869,541 patent/US4215192A/en not_active Expired - Lifetime
- 1978-12-06 CA CA000317483A patent/CA1118914A/en not_active Expired
- 1978-12-18 DE DE19782854693 patent/DE2854693A1/de not_active Ceased
-
1979
- 1979-01-09 JP JP45879A patent/JPS54103346A/ja active Pending
- 1979-01-10 FR FR7900521A patent/FR2414791A1/fr active Granted
- 1979-01-12 GB GB791199A patent/GB2012452B/en not_active Expired
- 1979-01-12 GB GB8100063A patent/GB2073901A/en not_active Withdrawn
- 1979-01-12 CH CH296/79A patent/CH652236A5/de not_active IP Right Cessation
- 1979-01-16 IT IT47655/79A patent/IT1114336B/it active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2168053A5 (US06534493-20030318-C00166.png) * | 1972-01-14 | 1973-08-24 | Massachusett Inst Technolog | |
US3742229A (en) * | 1972-06-29 | 1973-06-26 | Massachusetts Inst Technology | Soft x-ray mask alignment system |
GB1415811A (en) * | 1973-01-03 | 1975-11-26 | Machlett Lab Inc | Rotating anode x-ray tube |
FR2244196A1 (US06534493-20030318-C00166.png) * | 1973-09-17 | 1975-04-11 | Siemens Ag |
Also Published As
Publication number | Publication date |
---|---|
CA1118914A (en) | 1982-02-23 |
FR2414791B1 (US06534493-20030318-C00166.png) | 1984-11-09 |
JPS54103346A (en) | 1979-08-14 |
IT1114336B (it) | 1986-01-27 |
GB2012452A (en) | 1979-07-25 |
CH652236A5 (de) | 1985-10-31 |
US4215192A (en) | 1980-07-29 |
DE2854693A1 (de) | 1979-07-19 |
IT7947655A0 (it) | 1979-01-16 |
GB2012452B (en) | 1983-01-06 |
GB2073901A (en) | 1981-10-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |