FR2413479A1 - Dispositif pour pulverisation cathodique d'un revetement sur un cylindre - Google Patents
Dispositif pour pulverisation cathodique d'un revetement sur un cylindreInfo
- Publication number
- FR2413479A1 FR2413479A1 FR7836513A FR7836513A FR2413479A1 FR 2413479 A1 FR2413479 A1 FR 2413479A1 FR 7836513 A FR7836513 A FR 7836513A FR 7836513 A FR7836513 A FR 7836513A FR 2413479 A1 FR2413479 A1 FR 2413479A1
- Authority
- FR
- France
- Prior art keywords
- substrate
- coating
- chuck
- cylinder
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Photoreceptors In Electrophotography (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
L'INVENTION CONCERNE UN DISPOSITIF POUR LA PULVERISATION A HAUTE FREQUENCE DE CYLINDRES. SELON L'INVENTION, UN SUBSTRAT CYLINDRIQUE EN METAL EST MONTE SUR UN MANDRIN 28, QUI EST INSTALLE DANS UNE CHAMBRE DE PULVERISATION 20. DES CIBLES 30 SONT AGENCEES AUTOUR DU SUBSTRAT CYLINDRIQUE 24. LE SUBSTRAT FORME L'ANODE OU IL EST MONTE SUR L'ANODE. L'OPERATION DE PULVERISATION PERMET D'APPLIQUER UN REVETEMENT TRES UNIFORME D'UN MATERIAU PHOTOCONDUCTEUR SUR LE SUBSTRAT. LE CYLINDRE COMPLETE PEUT ETRE RETIRE DE LA CHAMBRE 20 EN MEME TEMPS QUE LE MANDRIN 28 ET ETRE REMPLACE PAR UN AUTRE SUBSTRAT ANALOGUE SUR UN AUTRE MANDRIN. LE CYLINDRE FINI 22 PEUT ETRE UN MANCHON EN METAL MINCE SANS SOUDURE AYANT UN REVETEMENT DE MATERIAU PHOTOCONDUCTEUR D'UNE EPAISSEUR ET DE PROPRIETES UNIFORMES. L'INVENTION S'APPLIQUE NOTAMMENT AUX CYLINDRES D'IMPRESSION.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/864,378 US4151064A (en) | 1977-12-27 | 1977-12-27 | Apparatus for sputtering cylinders |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2413479A1 true FR2413479A1 (fr) | 1979-07-27 |
FR2413479B1 FR2413479B1 (fr) | 1985-07-05 |
Family
ID=25343141
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7836513A Expired FR2413479B1 (fr) | 1977-12-27 | 1978-12-27 | Dispositif pour pulverisation cathodique d'un revetement sur un cylindre |
Country Status (6)
Country | Link |
---|---|
US (1) | US4151064A (fr) |
CH (1) | CH626456A5 (fr) |
DE (1) | DE2856364C2 (fr) |
FR (1) | FR2413479B1 (fr) |
NL (1) | NL7812572A (fr) |
SE (1) | SE447272B (fr) |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4298444A (en) * | 1978-10-11 | 1981-11-03 | Heat Mirror Associates | Method for multilayer thin film deposition |
US4204942A (en) * | 1978-10-11 | 1980-05-27 | Heat Mirror Associates | Apparatus for multilayer thin film deposition |
US4304983A (en) * | 1980-06-26 | 1981-12-08 | Rca Corporation | Plasma etching device and process |
US4290877A (en) * | 1980-09-08 | 1981-09-22 | The United States Of America As Represented By The Secretary Of The Interior | Sputtering apparatus for coating elongated tubes and strips |
DE3107914A1 (de) * | 1981-03-02 | 1982-09-16 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren und vorrichtung zum beschichten von formteilen durch katodenzerstaeubung |
JPS6037188B2 (ja) * | 1981-08-27 | 1985-08-24 | 三菱マテリアル株式会社 | スパツタリング装置 |
US4508053A (en) * | 1983-01-05 | 1985-04-02 | Xis, Incorporated | Vacuum deposition apparatus for manufacturing selenium photoreceptors |
DE3306738A1 (de) * | 1983-02-25 | 1984-08-30 | Berna AG Olten, Olten | Vorrichtung und verfahren zur beschichtung von substraten mittels glimmentladung, sowie deren anwendung |
GB8328858D0 (en) * | 1983-10-28 | 1983-11-30 | Atomic Energy Authority Uk | Metal vapour deposition |
GB2147973B (en) * | 1983-10-13 | 1986-06-18 | Atomic Energy Authority Uk | Metal vapour deposition drum construction |
US4560462A (en) * | 1984-06-22 | 1985-12-24 | Westinghouse Electric Corp. | Apparatus for coating nuclear fuel pellets with a burnable absorber |
GB8512455D0 (en) * | 1985-05-16 | 1985-06-19 | Atomic Energy Authority Uk | Coating apparatus |
NL8602759A (nl) * | 1986-10-31 | 1988-05-16 | Bekaert Sa Nv | Werkwijze en inrichting voor het behandelen van een langwerpig substraat, dat van een deklaag voorzien is; alsmede volgens die werkwijze behandelde substraten en met deze substraten versterkte voorwerpen uit polymeermateriaal. |
US4814056A (en) * | 1987-06-23 | 1989-03-21 | Vac-Tec Systems, Inc. | Apparatus for producing graded-composition coatings |
US5798027A (en) * | 1988-02-08 | 1998-08-25 | Optical Coating Laboratory, Inc. | Process for depositing optical thin films on both planar and non-planar substrates |
US4851095A (en) * | 1988-02-08 | 1989-07-25 | Optical Coating Laboratory, Inc. | Magnetron sputtering apparatus and process |
US5618388A (en) * | 1988-02-08 | 1997-04-08 | Optical Coating Laboratory, Inc. | Geometries and configurations for magnetron sputtering apparatus |
US5225057A (en) * | 1988-02-08 | 1993-07-06 | Optical Coating Laboratory, Inc. | Process for depositing optical films on both planar and non-planar substrates |
JPH08176821A (ja) * | 1994-12-26 | 1996-07-09 | Shincron:Kk | 薄膜形成方法および装置 |
US6401614B1 (en) * | 1996-03-14 | 2002-06-11 | Rotoincisa S.R.L. | Process for preparing removable metal sleeves for printing machines |
US5733600A (en) * | 1996-11-13 | 1998-03-31 | Powderject Vaccines, Inc. | Method and apparatus for preparing sample cartridges for a particle acceleration device |
WO2001053559A1 (fr) | 2000-01-24 | 2001-07-26 | Smart Therapeutics, Inc. | Dispositif d'alliage a memoire de forme a couche mince et procede |
WO2004005574A2 (fr) * | 2002-07-02 | 2004-01-15 | Academy Precision Materials A Division Of Academy Corporation | Cible rotative |
US20050276381A1 (en) * | 2003-07-02 | 2005-12-15 | Academy Corporation | Rotary target locking ring assembly |
US7169232B2 (en) * | 2004-06-01 | 2007-01-30 | Eastman Kodak Company | Producing repetitive coatings on a flexible substrate |
US20060118210A1 (en) * | 2004-10-04 | 2006-06-08 | Johnson A D | Portable energy storage devices and methods |
US7763342B2 (en) * | 2005-03-31 | 2010-07-27 | Tini Alloy Company | Tear-resistant thin film methods of fabrication |
PL1782951T3 (pl) * | 2005-11-03 | 2008-05-30 | Ball Europe Gmbh | Trzpień naprężający stosowany w druku cyfrowym |
US20070246233A1 (en) * | 2006-04-04 | 2007-10-25 | Johnson A D | Thermal actuator for fire protection sprinkler head |
US20080075557A1 (en) * | 2006-09-22 | 2008-03-27 | Johnson A David | Constant load bolt |
US20080213062A1 (en) * | 2006-09-22 | 2008-09-04 | Tini Alloy Company | Constant load fastener |
WO2008133738A2 (fr) | 2006-12-01 | 2008-11-06 | Tini Alloy Company | Procédé d'alliage de composants réactifs |
US8584767B2 (en) * | 2007-01-25 | 2013-11-19 | Tini Alloy Company | Sprinkler valve with active actuation |
US8684101B2 (en) * | 2007-01-25 | 2014-04-01 | Tini Alloy Company | Frangible shape memory alloy fire sprinkler valve actuator |
US8007674B2 (en) * | 2007-07-30 | 2011-08-30 | Tini Alloy Company | Method and devices for preventing restenosis in cardiovascular stents |
US8556969B2 (en) | 2007-11-30 | 2013-10-15 | Ormco Corporation | Biocompatible copper-based single-crystal shape memory alloys |
US7842143B2 (en) * | 2007-12-03 | 2010-11-30 | Tini Alloy Company | Hyperelastic shape setting devices and fabrication methods |
US8382917B2 (en) | 2007-12-03 | 2013-02-26 | Ormco Corporation | Hyperelastic shape setting devices and fabrication methods |
US10124197B2 (en) | 2012-08-31 | 2018-11-13 | TiNi Allot Company | Fire sprinkler valve actuator |
US11040230B2 (en) | 2012-08-31 | 2021-06-22 | Tini Alloy Company | Fire sprinkler valve actuator |
US10596492B2 (en) | 2014-07-09 | 2020-03-24 | Sudhin Biopharma | Particle settling devices |
CN109112487A (zh) * | 2017-12-08 | 2019-01-01 | 常州市知豆信息科技有限公司 | 一种具有高稳定性oled基板送入装置的oled蒸镀设备 |
CN114481047B (zh) * | 2022-01-26 | 2022-09-27 | 广东省新兴激光等离子体技术研究院 | 小尺寸工件镀膜装置、真空镀膜机及其镀膜方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1590800A (fr) * | 1967-11-06 | 1970-04-20 | ||
FR1602786A (fr) * | 1968-03-25 | 1971-01-25 | ||
US3911162A (en) * | 1972-04-17 | 1975-10-07 | Xerox Corp | System for vapor deposition of thin films |
FR2322666A1 (fr) * | 1973-01-12 | 1977-04-01 | Coulter Information Systems | Appareil pour deposer une pellicule mince en utilisant un moyen formant cible segmentee |
FR2354393A1 (fr) * | 1976-06-10 | 1978-01-06 | Univ Sydney | Procede et dispositif de pulverisation cathodique reactive |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2233070A (en) * | 1938-03-09 | 1941-02-25 | Atlantic Rayon Corp | Holder for hollow articles |
US2721535A (en) * | 1953-11-09 | 1955-10-25 | Owens Illinois Glass Co | Apparatus for decorating glassware |
AT258664B (de) * | 1964-08-25 | 1967-12-11 | Fritz Dr Grasenick | Vorrichtung zur Herstellung und bzw. oder zum Abbau von Schichten mittels elektrischer Gasentladungen |
DE1761462A1 (de) * | 1967-05-26 | 1971-06-16 | Zimmer Johannes | Einrichtung an Schablonendruckmaschinen |
US3649502A (en) * | 1969-08-14 | 1972-03-14 | Precision Instr Co | Apparatus for supported discharge sputter-coating of a substrate |
CH544274A (de) * | 1971-10-27 | 1973-11-15 | Balzers Patent Beteilig Ag | Einrichtung zum Kühlen von Werkstücken, die einer Behandlung im Vakuum unterworfen werden |
US4014779A (en) * | 1974-11-01 | 1977-03-29 | Coulter Information Systems, Inc. | Sputtering apparatus |
-
1977
- 1977-12-27 US US05/864,378 patent/US4151064A/en not_active Expired - Lifetime
-
1978
- 1978-12-27 DE DE2856364A patent/DE2856364C2/de not_active Expired
- 1978-12-27 NL NL7812572A patent/NL7812572A/xx not_active Application Discontinuation
- 1978-12-27 CH CH1317378A patent/CH626456A5/fr not_active IP Right Cessation
- 1978-12-27 FR FR7836513A patent/FR2413479B1/fr not_active Expired
- 1978-12-27 SE SE7813332A patent/SE447272B/sv not_active IP Right Cessation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1590800A (fr) * | 1967-11-06 | 1970-04-20 | ||
FR1602786A (fr) * | 1968-03-25 | 1971-01-25 | ||
US3911162A (en) * | 1972-04-17 | 1975-10-07 | Xerox Corp | System for vapor deposition of thin films |
FR2322666A1 (fr) * | 1973-01-12 | 1977-04-01 | Coulter Information Systems | Appareil pour deposer une pellicule mince en utilisant un moyen formant cible segmentee |
FR2354393A1 (fr) * | 1976-06-10 | 1978-01-06 | Univ Sydney | Procede et dispositif de pulverisation cathodique reactive |
Also Published As
Publication number | Publication date |
---|---|
DE2856364C2 (de) | 1986-01-09 |
CH626456A5 (fr) | 1981-11-13 |
DE2856364A1 (de) | 1979-07-05 |
FR2413479B1 (fr) | 1985-07-05 |
SE447272B (sv) | 1986-11-03 |
US4151064A (en) | 1979-04-24 |
NL7812572A (nl) | 1979-06-29 |
SE7813332L (sv) | 1979-06-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
TP | Transmission of property | ||
ST | Notification of lapse |