FR2408200A1 - Procede de fabrication de circuits resistifs a pellicule epaisse - Google Patents

Procede de fabrication de circuits resistifs a pellicule epaisse

Info

Publication number
FR2408200A1
FR2408200A1 FR7831177A FR7831177A FR2408200A1 FR 2408200 A1 FR2408200 A1 FR 2408200A1 FR 7831177 A FR7831177 A FR 7831177A FR 7831177 A FR7831177 A FR 7831177A FR 2408200 A1 FR2408200 A1 FR 2408200A1
Authority
FR
France
Prior art keywords
metal oxide
thick film
film resistive
metal
resistive circuits
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
FR7831177A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of FR2408200A1 publication Critical patent/FR2408200A1/fr
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/702—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof
    • H01L21/705—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof of thick-film circuits or parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/28—Apparatus or processes specially adapted for manufacturing resistors adapted for applying terminals
    • H01C17/281—Apparatus or processes specially adapted for manufacturing resistors adapted for applying terminals by thick film techniques
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y10T29/49099—Coating resistive material on a base

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

A.FABRICATION D'UN CIRCUIT RESISTIF A PELLICULE EPAISSE. B.AVANT DE DEPOSER LA MATIERE RESISTIVE SUR LE SUPPORT PORTANT UN MOTIF OU RESEAU CONDUCTEUR FORME D'UN OXYDE DE METAL, ON CHAUFFE L'ENSEMBLE EN ATMOSPHERE REDUCTRICE AFIN DE CONVERTIR L'OXYDE DE METAL EN METAL ET ON CHAUFFE L'ENSEMBLE DANS UNE ATMOSPHERE OXYDANTE AFIN DE RECONVERTIR LE METAL EN UN OXYDE DE METAL D'UNE DENSITE INFERIEURE A CELLE DE L'OXYDE DE METAL D'ORIGINE. C.L'INVENTION S'APPLIQUE A LA FABRICATION DE CIRCUITS COMPORTANT DES PARTIES RESISTANTES.
FR7831177A 1977-11-04 1978-11-03 Procede de fabrication de circuits resistifs a pellicule epaisse Pending FR2408200A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/848,509 US4140817A (en) 1977-11-04 1977-11-04 Thick film resistor circuits

Publications (1)

Publication Number Publication Date
FR2408200A1 true FR2408200A1 (fr) 1979-06-01

Family

ID=25303475

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7831177A Pending FR2408200A1 (fr) 1977-11-04 1978-11-03 Procede de fabrication de circuits resistifs a pellicule epaisse

Country Status (9)

Country Link
US (1) US4140817A (fr)
JP (1) JPS5475064A (fr)
BE (1) BE871760A (fr)
DE (1) DE2847851A1 (fr)
FR (1) FR2408200A1 (fr)
GB (1) GB2007918A (fr)
IT (1) IT1100905B (fr)
NL (1) NL7810842A (fr)
SE (1) SE7811095L (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2491715A1 (fr) * 1980-10-06 1982-04-09 Cts Corp Circuits a conducteur de cuivre en film epais et leur procede de fabrication

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4409261A (en) * 1980-02-07 1983-10-11 Cts Corporation Process for air firing oxidizable conductors
US4316920A (en) * 1980-07-03 1982-02-23 Bell Telephone Laboratories, Incorporated Thick film resistor circuits
US4322316A (en) * 1980-08-22 1982-03-30 Ferro Corporation Thick film conductor employing copper oxide
US4317750A (en) * 1980-08-22 1982-03-02 Ferro Corporation Thick film conductor employing nickel oxide
US4503090A (en) * 1983-02-23 1985-03-05 At&T Bell Laboratories Thick film resistor circuits
US4511601A (en) * 1983-05-13 1985-04-16 North American Philips Corporation Copper metallization for dielectric materials
US4503418A (en) * 1983-11-07 1985-03-05 Northern Telecom Limited Thick film resistor
JPS61194794A (ja) * 1985-02-22 1986-08-29 三菱電機株式会社 混成集積回路基板の製造方法
DE3537161C2 (de) * 1985-10-18 1995-08-03 Bosch Gmbh Robert Verfahren zur Herstellung festhaftender, lötfähiger und strukturierbarer Metallschichten auf Aluminiumoxid-haltiger Keramik
US4728534A (en) * 1986-08-04 1988-03-01 Motorola, Inc. Thick film conductor structure
DE3884756T2 (de) * 1987-05-20 1994-05-05 Matsushita Electric Ind Co Ltd Verfahren zur herstellung eines dünnen films von basismetall und dessen verwendung.
US4975301A (en) * 1987-08-07 1990-12-04 The O. Hommel Company Glass coating
JPH01151205A (ja) * 1987-12-08 1989-06-14 Matsushita Electric Ind Co Ltd 抵抗器の製造方法
JP2887318B2 (ja) * 1988-08-29 1999-04-26 松下電器産業株式会社 金属薄膜抵抗体の製造方法
JPH0795483B2 (ja) * 1989-05-18 1995-10-11 株式会社東芝 厚膜抵抗素子の製造方法
US5336444A (en) * 1992-05-29 1994-08-09 International Business Machines Corporation Ceramic via composition, multilayer ceramic circuit containing same, and process for using same
US5680092A (en) * 1993-11-11 1997-10-21 Matsushita Electric Industrial Co., Ltd. Chip resistor and method for producing the same
US6660680B1 (en) 1997-02-24 2003-12-09 Superior Micropowders, Llc Electrocatalyst powders, methods for producing powders and devices fabricated from same
US6338809B1 (en) * 1997-02-24 2002-01-15 Superior Micropowders Llc Aerosol method and apparatus, particulate products, and electronic devices made therefrom
JP2001513697A (ja) * 1997-02-24 2001-09-04 スーペリア マイクロパウダーズ リミテッド ライアビリティ カンパニー エアロゾル法及び装置、粒子製品、並びに該粒子製品から製造される電子装置
DE19750123C2 (de) * 1997-11-13 2000-09-07 Heraeus Electro Nite Int Verfahren zur Herstellung einer Sensoranordnung für die Temperaturmessung
US6967183B2 (en) 1998-08-27 2005-11-22 Cabot Corporation Electrocatalyst powders, methods for producing powders and devices fabricated from same
US7066976B2 (en) * 1998-02-24 2006-06-27 Cabot Corporation Method for the production of electrocatalyst powders
US6753108B1 (en) * 1998-02-24 2004-06-22 Superior Micropowders, Llc Energy devices and methods for the fabrication of energy devices
US20050097987A1 (en) * 1998-02-24 2005-05-12 Cabot Corporation Coated copper-containing powders, methods and apparatus for producing such powders, and copper-containing devices fabricated from same
CA2412426C (fr) * 2000-06-08 2007-09-04 Superior Micropowders, Llc Poudres electrocatalytiques, procedes permettant de les produire et dispositifs produits a partir desdites poudres
US6458669B1 (en) 2000-08-30 2002-10-01 Agere Systems Guardian Corp. Method of manufacturing an integrated circuit
US9113583B2 (en) 2012-07-31 2015-08-18 General Electric Company Electronic circuit board, assembly and a related method thereof
JP5766336B1 (ja) 2014-06-16 2015-08-19 株式会社マテリアル・コンセプト 銅ペーストの焼成方法
FR3044834A1 (fr) * 2015-12-02 2017-06-09 Pierre Guitton Dispositif de generation d'ions

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3481777A (en) * 1967-02-17 1969-12-02 Ibm Electroless coating method for making printed circuits
US3645783A (en) * 1970-06-03 1972-02-29 Infrared Ind Inc Thin film planar resistor
FR2332600A1 (fr) * 1975-11-24 1977-06-17 Trw Inc Resistance electrique a terminaison en couche mince et son procede de realisation

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3998980A (en) * 1972-05-05 1976-12-21 Hewlett-Packard Company Fabrication of thick film resistors

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3481777A (en) * 1967-02-17 1969-12-02 Ibm Electroless coating method for making printed circuits
US3645783A (en) * 1970-06-03 1972-02-29 Infrared Ind Inc Thin film planar resistor
FR2332600A1 (fr) * 1975-11-24 1977-06-17 Trw Inc Resistance electrique a terminaison en couche mince et son procede de realisation

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2491715A1 (fr) * 1980-10-06 1982-04-09 Cts Corp Circuits a conducteur de cuivre en film epais et leur procede de fabrication

Also Published As

Publication number Publication date
SE7811095L (sv) 1979-05-05
US4140817A (en) 1979-02-20
DE2847851A1 (de) 1979-05-10
NL7810842A (nl) 1979-05-08
JPS5475064A (en) 1979-06-15
IT1100905B (it) 1985-09-28
BE871760A (fr) 1979-03-01
IT7829432A0 (it) 1978-11-03
GB2007918A (en) 1979-05-23

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