FR2403866B1 - - Google Patents

Info

Publication number
FR2403866B1
FR2403866B1 FR7827141A FR7827141A FR2403866B1 FR 2403866 B1 FR2403866 B1 FR 2403866B1 FR 7827141 A FR7827141 A FR 7827141A FR 7827141 A FR7827141 A FR 7827141A FR 2403866 B1 FR2403866 B1 FR 2403866B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7827141A
Other languages
French (fr)
Other versions
FR2403866A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SSIH Management Services SA
Original Assignee
SSIH Management Services SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SSIH Management Services SA filed Critical SSIH Management Services SA
Publication of FR2403866A1 publication Critical patent/FR2403866A1/fr
Application granted granted Critical
Publication of FR2403866B1 publication Critical patent/FR2403866B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67173—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/53—Means to assemble or disassemble
    • Y10T29/53096—Means to assemble or disassemble including means to provide a controlled environment

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
FR7827141A 1977-09-27 1978-09-12 Machine transfert pour le scellement sous vide de composants electroniques ou articles similaires Granted FR2403866A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/837,232 US4166563A (en) 1977-09-27 1977-09-27 Transfer machine for sealing electronic or like components under vacuum

Publications (2)

Publication Number Publication Date
FR2403866A1 FR2403866A1 (fr) 1979-04-20
FR2403866B1 true FR2403866B1 (enExample) 1982-03-12

Family

ID=25273887

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7827141A Granted FR2403866A1 (fr) 1977-09-27 1978-09-12 Machine transfert pour le scellement sous vide de composants electroniques ou articles similaires

Country Status (6)

Country Link
US (1) US4166563A (enExample)
JP (1) JPS5463695A (enExample)
CH (1) CH626489A5 (enExample)
DE (1) DE2841767A1 (enExample)
FR (1) FR2403866A1 (enExample)
GB (1) GB2007778B (enExample)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4392435A (en) * 1979-08-03 1983-07-12 United Kingdom Atomic Energy Authority Transport apparatus
DE3119037A1 (de) * 1981-05-13 1982-12-02 Ganzhorn u. Stirn GmbH + Co, 7170 Schwäbisch Hall Verfahren und vorrichtung zum sterilisieren
JPS57206046A (en) * 1981-06-15 1982-12-17 Hitachi Ltd Wafer conveying device
NL8203318A (nl) * 1982-08-24 1984-03-16 Integrated Automation Inrichting voor processing van substraten.
US4799911A (en) * 1987-07-13 1989-01-24 Varo, Inc. Image intensifier tube with integral CCD digital readout
US4540326A (en) * 1982-09-17 1985-09-10 Nacom Industries, Inc. Semiconductor wafer transport system
JPS60187485A (ja) * 1984-03-06 1985-09-24 Raifu Technol Kenkyusho 接合装置
US4619573A (en) * 1984-03-09 1986-10-28 Tegal Corporation Article transport apparatus
US4576828A (en) * 1984-05-17 1986-03-18 Geotel, Inc. Method and apparatus for plasma spray coating
US4624617A (en) * 1984-10-09 1986-11-25 David Belna Linear induction semiconductor wafer transportation apparatus
EP0178336B1 (en) * 1984-10-16 1987-09-09 International Business Machines Corporation Vacuum transfer device
DE3601408C1 (de) * 1986-01-18 1987-03-12 Sartorius Gmbh Oberschalige Analysenwaage mit Waegekammerschleuse
HU207175B (en) * 1986-02-12 1993-03-01 Tungsram Reszvenytarsasag Device for manufacturing discharge tube of a sodium vapour discharge lamp
US5090609A (en) * 1989-04-28 1992-02-25 Hitachi, Ltd. Method of bonding metals, and method and apparatus for producing semiconductor integrated circuit device using said method of bonding metals
NL8901598A (nl) * 1989-06-23 1991-01-16 Soltec Bv Met een beschermgas werkende soldeermachine, voorzien van automatisch werkende sluisdeuren.
JPH04262865A (ja) * 1991-01-22 1992-09-18 Kenji Kondo はんだ付け装置
SE469501B (sv) * 1992-03-02 1993-07-12 Quartz Proline Handelsbolag C Foerfarande och anlaeggning foer framstaellning av piezoelektriska resonatorer
SG47541A1 (en) 1992-06-26 1998-04-17 Materials Research Corp Transport system for wafer processing line
US5433639A (en) * 1993-08-18 1995-07-18 Santa Barbara Research Center Processing of vacuum-sealed dewar assembly
DE4432730A1 (de) * 1994-09-14 1996-03-21 Emitec Emissionstechnologie Verfahren zur Herstellung einer metallischen Struktur
US5799860A (en) * 1995-08-07 1998-09-01 Applied Materials, Inc. Preparation and bonding of workpieces to form sputtering targets and other assemblies
US6206176B1 (en) * 1998-05-20 2001-03-27 Applied Komatsu Technology, Inc. Substrate transfer shuttle having a magnetic drive
US6215897B1 (en) 1998-05-20 2001-04-10 Applied Komatsu Technology, Inc. Automated substrate processing system
US6517303B1 (en) 1998-05-20 2003-02-11 Applied Komatsu Technology, Inc. Substrate transfer shuttle
US6213704B1 (en) 1998-05-20 2001-04-10 Applied Komatsu Technology, Inc. Method and apparatus for substrate transfer and processing
US6298685B1 (en) 1999-11-03 2001-10-09 Applied Materials, Inc. Consecutive deposition system
US20030183490A1 (en) * 2000-05-09 2003-10-02 Friedrich Eschenweck Longitudinal conveyor
US6935828B2 (en) * 2002-07-17 2005-08-30 Transfer Engineering And Manufacturing, Inc. Wafer load lock and magnetically coupled linear delivery system
US7306133B2 (en) * 2003-04-25 2007-12-11 St Assembly Test Services Ltd. System for fabricating an integrated circuit package on a printed circuit board
DE102019211212B4 (de) 2019-07-29 2025-03-27 Rehm Thermal Systems Gmbh Mechatronischer Vorhang für eine Prozesskammer zur Durchführung thermischer Prozesse in der Fertigung elektronischer Baugruppen
CN119382649B (zh) * 2024-10-10 2025-08-01 东晶电子金华有限公司 一种小型石英晶体谐振器封装方法及设备

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3202406A (en) * 1960-07-27 1965-08-24 Clevite Corp Furnace apparatus and conveyor therefor
US3317106A (en) * 1963-08-19 1967-05-02 Dix Engineering Co Solder boat
US3717119A (en) * 1971-07-30 1973-02-20 Gen Motors Corp Vacuum processing machine for aluminizing headlamp reflectors
US3914836A (en) * 1974-06-21 1975-10-28 Us Army Method for processing quartz crystal resonators
US4030622A (en) * 1975-05-23 1977-06-21 Pass-Port Systems, Inc. Wafer transport system

Also Published As

Publication number Publication date
GB2007778B (en) 1982-03-10
JPS5724004B2 (enExample) 1982-05-21
CH626489A5 (enExample) 1981-11-13
FR2403866A1 (fr) 1979-04-20
JPS5463695A (en) 1979-05-22
DE2841767A1 (de) 1979-04-26
GB2007778A (en) 1979-05-23
US4166563A (en) 1979-09-04

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Legal Events

Date Code Title Description
ST Notification of lapse