FR2397653A1 - Elements photopolymerisables et procedes de formation d'images - Google Patents

Elements photopolymerisables et procedes de formation d'images

Info

Publication number
FR2397653A1
FR2397653A1 FR7820503A FR7820503A FR2397653A1 FR 2397653 A1 FR2397653 A1 FR 2397653A1 FR 7820503 A FR7820503 A FR 7820503A FR 7820503 A FR7820503 A FR 7820503A FR 2397653 A1 FR2397653 A1 FR 2397653A1
Authority
FR
France
Prior art keywords
image formation
formation methods
photopolymerisable
elements
photopolymerisable elements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7820503A
Other languages
English (en)
Other versions
FR2397653B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of FR2397653A1 publication Critical patent/FR2397653A1/fr
Application granted granted Critical
Publication of FR2397653B1 publication Critical patent/FR2397653B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Abstract

L'invention se rapporte aux compositions photopolymérisables. Elle concerne une composition photopolymérisable qui comprend : 1. au moins un polyhydroxy polyéther de diester éthyléniquement non saturé de la formule :
FR7820503A 1977-07-11 1978-07-10 Elements photopolymerisables et procedes de formation d'images Granted FR2397653A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US81443477A 1977-07-11 1977-07-11
US89229578A 1978-03-31 1978-03-31

Publications (2)

Publication Number Publication Date
FR2397653A1 true FR2397653A1 (fr) 1979-02-09
FR2397653B1 FR2397653B1 (fr) 1981-12-11

Family

ID=27123842

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7820503A Granted FR2397653A1 (fr) 1977-07-11 1978-07-10 Elements photopolymerisables et procedes de formation d'images

Country Status (4)

Country Link
JP (1) JPS5417991A (fr)
DE (1) DE2830143C2 (fr)
FR (1) FR2397653A1 (fr)
GB (1) GB1587476A (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2933827A1 (de) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung.
JPS57148740A (en) * 1981-03-10 1982-09-14 Toyobo Co Ltd Image duplicating material
US4361640A (en) * 1981-10-02 1982-11-30 E. I. Du Pont De Nemours And Company Aqueous developable photopolymer compositions containing terpolymer binder
JPS5989367A (ja) * 1982-11-15 1984-05-23 Mitsui Petrochem Ind Ltd 被覆用硬化型樹脂組成物
JP2744643B2 (ja) * 1989-06-02 1998-04-28 旭化成工業株式会社 光重合性組成物
JPH0675372A (ja) * 1992-08-28 1994-03-18 Toppan Printing Co Ltd 感光性着色組成物およびカラーフィルターの製造方法およびカラーフィルター
JPH0675373A (ja) * 1992-08-28 1994-03-18 Toppan Printing Co Ltd 感光性着色組成物およびカラーフィルターの製造方法およびカラーフィルター
KR101359470B1 (ko) * 2013-03-08 2014-02-12 동우 화인켐 주식회사 감광성 수지 조성물 및 이로부터 제조된 스페이서

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1473367A (fr) * 1965-02-26 1967-03-17 Agfa Gevaert Procédé pour la production d'un matériel perfectionné sensible à la lumière
FR2009250A1 (fr) * 1968-05-24 1970-01-30 Du Pont
US3552973A (en) * 1967-07-20 1971-01-05 Du Pont Light sensitive hexaarylbiimidazole/p- aminophenyl ketone compositions

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3661576A (en) * 1970-02-09 1972-05-09 Brady Co W H Photopolymerizable compositions and articles

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1473367A (fr) * 1965-02-26 1967-03-17 Agfa Gevaert Procédé pour la production d'un matériel perfectionné sensible à la lumière
US3552973A (en) * 1967-07-20 1971-01-05 Du Pont Light sensitive hexaarylbiimidazole/p- aminophenyl ketone compositions
FR2009250A1 (fr) * 1968-05-24 1970-01-30 Du Pont

Also Published As

Publication number Publication date
JPS5417991A (en) 1979-02-09
DE2830143A1 (de) 1979-01-18
FR2397653B1 (fr) 1981-12-11
DE2830143C2 (de) 1983-01-05
JPS579725B2 (fr) 1982-02-23
GB1587476A (en) 1981-04-01

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Legal Events

Date Code Title Description
ST Notification of lapse