FR2396093A1 - Appareil pour le depot en phase de vapeurs sous vide - Google Patents

Appareil pour le depot en phase de vapeurs sous vide

Info

Publication number
FR2396093A1
FR2396093A1 FR7819740A FR7819740A FR2396093A1 FR 2396093 A1 FR2396093 A1 FR 2396093A1 FR 7819740 A FR7819740 A FR 7819740A FR 7819740 A FR7819740 A FR 7819740A FR 2396093 A1 FR2396093 A1 FR 2396093A1
Authority
FR
France
Prior art keywords
phase
vacuum
vapors
vacuum vapors
nacelles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7819740A
Other languages
English (en)
Other versions
FR2396093B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP7791377A external-priority patent/JPS5413478A/ja
Priority claimed from JP8096877A external-priority patent/JPS5431089A/ja
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of FR2396093A1 publication Critical patent/FR2396093A1/fr
Application granted granted Critical
Publication of FR2396093B1 publication Critical patent/FR2396093B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D5/00—Control of dimensions of material
    • G05D5/02—Control of dimensions of material of thickness, e.g. of rolled material
    • G05D5/03—Control of dimensions of material of thickness, e.g. of rolled material characterised by the use of electric means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

L'appareil pour dépôt de vapeurs sous vide selon l'invention comprend : un plateau tournant 9 pour supporter des substrats 8 sur lesquels doit être déposée la vapeur, des nacelles d'évaporation 10 et 11, des sources d'alimentation 25 et 26 destinées au chauffage des nacelles, des obturateurs 16 et 17 entraînés par des moyens d'entraînement 35 et 36, au moins un dispositif de contrôle de dépôt 18 à quartz, un dispositif de couplage 19, un compteur de fréquence numérique 29.
FR7819740A 1977-07-01 1978-06-30 Appareil pour le depot en phase de vapeurs sous vide Granted FR2396093A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP7791377A JPS5413478A (en) 1977-07-01 1977-07-01 Vacuum depositing apparatus
JP8096877A JPS5431089A (en) 1977-07-08 1977-07-08 Vacuum metallizer

Publications (2)

Publication Number Publication Date
FR2396093A1 true FR2396093A1 (fr) 1979-01-26
FR2396093B1 FR2396093B1 (fr) 1982-09-17

Family

ID=26418962

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7819740A Granted FR2396093A1 (fr) 1977-07-01 1978-06-30 Appareil pour le depot en phase de vapeurs sous vide

Country Status (4)

Country Link
US (1) US4207836A (fr)
DE (1) DE2828651C2 (fr)
FR (1) FR2396093A1 (fr)
GB (1) GB2000882B (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0124063A1 (fr) * 1983-04-29 1984-11-07 Siemens Aktiengesellschaft Procédé pour mesurer l'application et l'enlèvement des conches minces

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH644722A5 (de) * 1980-07-21 1984-08-15 Balzers Hochvakuum Schwingquarzmesskopf.
DE3028123A1 (de) * 1980-07-24 1982-02-25 Siemens AG, 1000 Berlin und 8000 München Verfahren und vorrichtung zur herstellung von schichtkondensatoren
JPS5998520A (ja) * 1982-11-27 1984-06-06 Toshiba Mach Co Ltd 半導体気相成長装置
US4478174A (en) * 1983-02-25 1984-10-23 Canadian Patents & Development Limited Vacuum coating vessel with movable shutter plate
US5125138A (en) * 1983-12-19 1992-06-30 Spectrum Control, Inc. Miniaturized monolithic multi-layer capacitor and apparatus and method for making same
US5032461A (en) * 1983-12-19 1991-07-16 Spectrum Control, Inc. Method of making a multi-layered article
US5018048A (en) * 1983-12-19 1991-05-21 Spectrum Control, Inc. Miniaturized monolithic multi-layer capacitor and apparatus and method for making
US4842893A (en) * 1983-12-19 1989-06-27 Spectrum Control, Inc. High speed process for coating substrates
US5097800A (en) * 1983-12-19 1992-03-24 Spectrum Control, Inc. High speed apparatus for forming capacitors
US4579083A (en) * 1984-01-21 1986-04-01 Canadian Patents And Development Limited Automatic variable rate evaporation source for thin film deposition
JPS60178616A (ja) * 1984-02-27 1985-09-12 Hitachi Ltd 分子線エピタキシ装置の試料回転ホルダ
US4553853A (en) * 1984-02-27 1985-11-19 International Business Machines Corporation End point detector for a tin lead evaporator
DE3412724A1 (de) * 1984-04-04 1985-10-17 Siemens AG, 1000 Berlin und 8000 München Verfahren und anordnung zum messen der schichtdicke und/oder der konzentration von auf substraten abgeschiedenen duennen schichten waehrend ihrer herstellung
DE3613112A1 (de) * 1986-04-18 1987-10-22 Grundig Emv Einrichtung zum messen der magnetischen eigenschaften von durch sputtern oder bedampfen aufgebrachten schichten waehrend des bearbeitungsvorganges
US4669418A (en) * 1986-05-19 1987-06-02 Gte Laboratories Incorporated Optical coating apparatus
US4954371A (en) * 1986-06-23 1990-09-04 Spectrum Control, Inc. Flash evaporation of monomer fluids
US4858556A (en) * 1986-09-15 1989-08-22 Siebert Jerome F Method and apparatus for physical vapor deposition of thin films
US5117192A (en) * 1990-01-12 1992-05-26 Leybold Inficon Inc. Control circuitry for quartz crystal deposition monitor
JP2633106B2 (ja) * 1991-05-24 1997-07-23 シャープ株式会社 レジスト塗布装置
US5948983A (en) * 1997-07-25 1999-09-07 Leybold Inficon, Inc. Wall deposition monitoring system
JPH11189874A (ja) * 1997-12-25 1999-07-13 Tdk Corp 薄膜形成方法および装置
US6090444A (en) * 1999-02-08 2000-07-18 Saunders & Associates, Inc. Base plater or vacuum deposition apparatus with individually and selectively controlled work holders and capacitively coupled crystal monitor
US6370955B1 (en) 1999-06-15 2002-04-16 Massachusetts Institute Of Technology High-temperature balance
US7828929B2 (en) * 2004-12-30 2010-11-09 Research Electro-Optics, Inc. Methods and devices for monitoring and controlling thin film processing
EP2309220A1 (fr) * 2009-10-02 2011-04-13 Applied Materials, Inc. Dispositif et procédé pour mesurer l'épaisseur d'une couche
EP2418545B1 (fr) 2010-08-12 2018-10-10 Applied Materials, Inc. Module de manipulation de masques
JP5888919B2 (ja) * 2010-11-04 2016-03-22 キヤノン株式会社 成膜装置及び成膜方法
AT512949B1 (de) * 2012-06-04 2016-06-15 Leica Microsysteme Gmbh Verfahren zur Beschichtung mit einem Verdampfungsmaterial
WO2019003499A1 (fr) * 2017-06-28 2019-01-03 株式会社アルバック Tête de capteur d'un dispositif de surveillance d'épaisseur de film de type à oscillation de cristal
US20190062902A1 (en) * 2017-08-22 2019-02-28 Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. Evaporation source device

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1478820A (fr) * 1966-05-04 1967-04-28 Smidth & Co As F L Procédé et appareil de transfert de données
FR1538598A (fr) * 1967-07-27 1968-09-06 Sfim Dispositif de transmission d'un signal électrique entre une pièce tournante et une pièce fixe
FR1586500A (fr) * 1967-09-30 1970-02-20
FR2027049A1 (fr) * 1968-12-24 1970-09-25 Barmag Barmer Maschf
FR2117066A5 (fr) * 1970-12-09 1972-07-21 Ibm
FR2292517A1 (fr) * 1974-11-29 1976-06-25 Instrumentarium Oy Procede et appareil de formation de pellicules minces de composes
FR2344643A1 (fr) * 1976-03-19 1977-10-14 Hitachi Ltd Appareil de depot sous vide

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1478820A (fr) * 1966-05-04 1967-04-28 Smidth & Co As F L Procédé et appareil de transfert de données
FR1538598A (fr) * 1967-07-27 1968-09-06 Sfim Dispositif de transmission d'un signal électrique entre une pièce tournante et une pièce fixe
FR1586500A (fr) * 1967-09-30 1970-02-20
FR2027049A1 (fr) * 1968-12-24 1970-09-25 Barmag Barmer Maschf
FR2117066A5 (fr) * 1970-12-09 1972-07-21 Ibm
FR2292517A1 (fr) * 1974-11-29 1976-06-25 Instrumentarium Oy Procede et appareil de formation de pellicules minces de composes
FR2344643A1 (fr) * 1976-03-19 1977-10-14 Hitachi Ltd Appareil de depot sous vide

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0124063A1 (fr) * 1983-04-29 1984-11-07 Siemens Aktiengesellschaft Procédé pour mesurer l'application et l'enlèvement des conches minces

Also Published As

Publication number Publication date
GB2000882A (en) 1979-01-17
US4207836A (en) 1980-06-17
DE2828651A1 (de) 1979-01-18
DE2828651C2 (de) 1982-04-29
FR2396093B1 (fr) 1982-09-17
GB2000882B (en) 1982-04-07

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