FR2375631A1 - Dispositif pour superposer des masques et des substrats en forme de plaquettes - Google Patents
Dispositif pour superposer des masques et des substrats en forme de plaquettesInfo
- Publication number
- FR2375631A1 FR2375631A1 FR7733802A FR7733802A FR2375631A1 FR 2375631 A1 FR2375631 A1 FR 2375631A1 FR 7733802 A FR7733802 A FR 7733802A FR 7733802 A FR7733802 A FR 7733802A FR 2375631 A1 FR2375631 A1 FR 2375631A1
- Authority
- FR
- France
- Prior art keywords
- support
- prodn
- aligning device
- semiconductor
- photolithography
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Dispositif destiné à superposer des masques et des substrats et permettant à des structures de masques d'être reproduites par projection sur une partie de la surface du substrat, lequel est fixé sur un porte-substrat qui, susceptible d'être déplacé dans les directions X et Y au moyen d'un mécanisme de réglage précis et d'être tourné dans le plan XY, est à son tour monte sur une table à mouvements croisés. La table à mouvements croisés 2 comporte un premier moyen de blocage 14 agissant lors du réglage approximatif et le mécanisme de réglage précis 9, qui comporte trois organes de réglage 9.1, 9.2 et 9.3, est relié à un deuxième moyen de blocage 11 agissant lors du réglage précis. L'invention est applicable entre autres à la fabrication photolithographique de dispsotifs à semiconducteurs.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DD19567476A DD128165B1 (de) | 1976-11-09 | 1976-11-09 | Vorrichtung zum ueberdecken von masken und substratscheiben |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2375631A1 true FR2375631A1 (fr) | 1978-07-21 |
Family
ID=5506232
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7733802A Withdrawn FR2375631A1 (fr) | 1976-11-09 | 1977-11-09 | Dispositif pour superposer des masques et des substrats en forme de plaquettes |
Country Status (4)
Country | Link |
---|---|
DD (1) | DD128165B1 (fr) |
DE (1) | DE2747439A1 (fr) |
FR (1) | FR2375631A1 (fr) |
SU (1) | SU911439A1 (fr) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0017759A2 (fr) * | 1979-04-03 | 1980-10-29 | Eaton-Optimetrix Inc. | Système amélioré d'alignement et d'exposition par projection pas à pas |
US4452526A (en) * | 1980-02-29 | 1984-06-05 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system with auxiliary optical unit |
US4473293A (en) * | 1979-04-03 | 1984-09-25 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system |
US4573791A (en) * | 1979-04-03 | 1986-03-04 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU191704U1 (ru) * | 2019-06-03 | 2019-08-19 | Открытое Акционерное Общество "Научно-Исследовательский Институт Полупроводникового Машиностроения (Оао "Ниипм") | Блок центрирования полупроводниковых пластин на вакуумном столике в кластерной линии фотолитографии перед проведением технологических операций |
-
1976
- 1976-11-09 DD DD19567476A patent/DD128165B1/xx unknown
-
1977
- 1977-10-21 DE DE19772747439 patent/DE2747439A1/de active Pending
- 1977-11-02 SU SU777770029A patent/SU911439A1/ru active
- 1977-11-09 FR FR7733802A patent/FR2375631A1/fr not_active Withdrawn
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0017759A2 (fr) * | 1979-04-03 | 1980-10-29 | Eaton-Optimetrix Inc. | Système amélioré d'alignement et d'exposition par projection pas à pas |
EP0017759A3 (en) * | 1979-04-03 | 1981-01-14 | Optimetrix Corporation | Improved step-and-repeat projection alignment and exposure system |
EP0111661A2 (fr) * | 1979-04-03 | 1984-06-27 | Eaton-Optimetrix Inc. | Appareil d'impression photométrique |
US4473293A (en) * | 1979-04-03 | 1984-09-25 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system |
EP0111661A3 (fr) * | 1979-04-03 | 1984-09-26 | Eaton-Optimetrix Inc. | Appareil d'impression photométrique |
US4573791A (en) * | 1979-04-03 | 1986-03-04 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system |
US4452526A (en) * | 1980-02-29 | 1984-06-05 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system with auxiliary optical unit |
Also Published As
Publication number | Publication date |
---|---|
DD128165B1 (de) | 1979-12-27 |
DE2747439A1 (de) | 1978-06-01 |
DD128165A1 (de) | 1977-11-02 |
SU911439A1 (ru) | 1982-03-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |