FR2369881A1 - Procede et dispositif de revetement par centrifugation permettant d'eviter les accumulations laterales - Google Patents

Procede et dispositif de revetement par centrifugation permettant d'eviter les accumulations laterales

Info

Publication number
FR2369881A1
FR2369881A1 FR7729877A FR7729877A FR2369881A1 FR 2369881 A1 FR2369881 A1 FR 2369881A1 FR 7729877 A FR7729877 A FR 7729877A FR 7729877 A FR7729877 A FR 7729877A FR 2369881 A1 FR2369881 A1 FR 2369881A1
Authority
FR
France
Prior art keywords
coating
accumulations
centrifugation
substrate
avoid lateral
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7729877A
Other languages
English (en)
French (fr)
Other versions
FR2369881B1 (enExample
Inventor
Richard S Boeckl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2369881A1 publication Critical patent/FR2369881A1/fr
Application granted granted Critical
Publication of FR2369881B1 publication Critical patent/FR2369881B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
    • B05D1/005—Spin coating

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
FR7729877A 1976-11-08 1977-09-28 Procede et dispositif de revetement par centrifugation permettant d'eviter les accumulations laterales Granted FR2369881A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/739,756 US4068019A (en) 1976-11-08 1976-11-08 Spin coating process for prevention of edge buildup

Publications (2)

Publication Number Publication Date
FR2369881A1 true FR2369881A1 (fr) 1978-06-02
FR2369881B1 FR2369881B1 (enExample) 1979-04-27

Family

ID=24973654

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7729877A Granted FR2369881A1 (fr) 1976-11-08 1977-09-28 Procede et dispositif de revetement par centrifugation permettant d'eviter les accumulations laterales

Country Status (6)

Country Link
US (1) US4068019A (enExample)
JP (1) JPS5358768A (enExample)
DE (1) DE2744752C2 (enExample)
FR (1) FR2369881A1 (enExample)
GB (1) GB1535641A (enExample)
IT (1) IT1115743B (enExample)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4201149A (en) * 1974-12-17 1980-05-06 Basf Aktiengesellschaft Apparatus for spin coating in the production of thin magnetic layers for magnetic discs
US4190015A (en) * 1977-12-08 1980-02-26 Machine Technology, Inc. Apparatus for dispensing liquid to spinning workpieces
DE2944180A1 (de) * 1979-11-02 1981-05-07 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zum herstellen einer einen halbleiterkoerper einseitig bedeckenden isolierschicht
JPS5695569U (enExample) * 1979-12-20 1981-07-29
US4536240A (en) * 1981-12-02 1985-08-20 Advanced Semiconductor Products, Inc. Method of forming thin optical membranes
US4548646A (en) * 1982-11-15 1985-10-22 Sermatech International Incorporated Thixotropic coating compositions and methods
US4794021A (en) * 1986-11-13 1988-12-27 Microelectronics And Computer Technology Corporation Method of providing a planarized polymer coating on a substrate wafer
US4795543A (en) * 1987-05-26 1989-01-03 Transducer Research, Inc. Spin coating of electrolytes
US5238713A (en) * 1987-09-18 1993-08-24 Tokyo Ohka Kogyo Co., Ltd. Spin-on method and apparatus for applying coating material to a substrate, including an air flow developing and guiding step/means
FR2636546B1 (fr) * 1988-09-15 1991-03-15 Sulzer Electro Tech Procede et dispositif pour l'application uniformement reguliere d'une couche de resine sur un substrat
US5294257A (en) * 1991-10-28 1994-03-15 International Business Machines Corporation Edge masking spin tool
DE4203913C2 (de) * 1992-02-11 1996-09-19 Fairchild Convac Gmbh Geraete Verfahren und Vorrichtung zum Aufbringen und/oder zum partiellen Entfernen einer dünnen Schicht auf ein bzw. von einem Substrat
US7018943B2 (en) 1994-10-27 2006-03-28 Asml Holding N.V. Method of uniformly coating a substrate
KR100370728B1 (ko) * 1994-10-27 2003-04-07 실리콘 밸리 그룹, 인크. 기판을균일하게코팅하는방법및장치
US7030039B2 (en) 1994-10-27 2006-04-18 Asml Holding N.V. Method of uniformly coating a substrate
US6977098B2 (en) * 1994-10-27 2005-12-20 Asml Holding N.V. Method of uniformly coating a substrate
DE19522004A1 (de) * 1995-06-21 1997-01-02 Inst Mikrotechnik Mainz Gmbh Herstellungsverfahren von teilbeweglichen Mikrostrukturen auf der Basis einer trockenchemisch geätzten Opferschicht
US5803968A (en) * 1995-08-21 1998-09-08 Schwartz; Vladimir Compact disc spin coater
WO1998018568A1 (en) * 1996-10-28 1998-05-07 Robert Herpst Method and apparatus for the production of thin films
US6054356A (en) * 1996-12-10 2000-04-25 Advanced Micro Devices, Inc. Transistor and process of making a transistor having an improved LDD masking material
US5840365A (en) * 1997-02-07 1998-11-24 The Fairchild Corporation Method and apparatus for spin-coating compact discs
US5916368A (en) * 1997-02-27 1999-06-29 The Fairchild Corporation Method and apparatus for temperature controlled spin-coating systems
US5916631A (en) * 1997-05-30 1999-06-29 The Fairchild Corporation Method and apparatus for spin-coating chemicals
US5908661A (en) * 1997-05-30 1999-06-01 The Fairchild Corporation Apparatus and method for spin coating substrates
JP2003524275A (ja) * 2000-02-25 2003-08-12 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 円形の光学的記憶ディスクを製造する方法及び光学的記憶ディスク
AU2003226908A1 (en) * 2002-04-09 2003-10-27 Danfoss A/S Process for centrifugal distribution of liquid physiological specimens
CN101885216A (zh) * 2009-05-14 2010-11-17 鸿富锦精密工业（深圳）有限公司 挠式模具的制造方法
US20230124666A1 (en) * 2019-10-02 2023-04-20 Soroosh Mahmoodi Two-axis spin coating method and apparatus

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR793201A (fr) * 1935-07-31 1936-01-20 Hoh & Hahne Perfectionnements apportés aux appareils centrifuges destinés à la répartition uniforme et au séchage de la couche sensible à la lumière, appliquée à l'état frais, sur des pierres, gravures et autres objets similaires
GB449741A (en) * 1935-05-29 1936-07-02 Richard Walter Hoh Improvements in or relating to centrifugal apparatus for applying light-sensitive layers and the like
DE641582C (de) * 1935-12-04 1937-02-05 Hoh & Hahne Vorrichtung zum Schleudern von photographischen Druckplatten u. dgl.
US2580131A (en) * 1947-02-25 1951-12-25 Chandler & Price Co Method and apparatus for coating a lithographic plate
DE2634144A1 (de) * 1975-07-29 1977-02-17 Fuji Photo Film Co Ltd Photographisches, lichtempfindliches material und spinnbeschichtungsverfahren zu seiner herstellung
US4024835A (en) * 1975-10-06 1977-05-24 Hewlett-Packard Company Spinner chuck for non-circular substrates

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR54387E (fr) * 1944-09-01 1950-03-10 Leitz Ernst Gmbh Dispositif pour l'application de couches de revêtement sur des surfaces optiquement agissantes, notamment sur des surfaces de verre
US3323491A (en) * 1964-12-17 1967-06-06 Stewart E Granick Color spinner toy

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB449741A (en) * 1935-05-29 1936-07-02 Richard Walter Hoh Improvements in or relating to centrifugal apparatus for applying light-sensitive layers and the like
FR793201A (fr) * 1935-07-31 1936-01-20 Hoh & Hahne Perfectionnements apportés aux appareils centrifuges destinés à la répartition uniforme et au séchage de la couche sensible à la lumière, appliquée à l'état frais, sur des pierres, gravures et autres objets similaires
DE641582C (de) * 1935-12-04 1937-02-05 Hoh & Hahne Vorrichtung zum Schleudern von photographischen Druckplatten u. dgl.
US2580131A (en) * 1947-02-25 1951-12-25 Chandler & Price Co Method and apparatus for coating a lithographic plate
DE2634144A1 (de) * 1975-07-29 1977-02-17 Fuji Photo Film Co Ltd Photographisches, lichtempfindliches material und spinnbeschichtungsverfahren zu seiner herstellung
US4024835A (en) * 1975-10-06 1977-05-24 Hewlett-Packard Company Spinner chuck for non-circular substrates

Also Published As

Publication number Publication date
DE2744752C2 (de) 1983-02-03
IT1115743B (it) 1986-02-03
JPS5358768A (en) 1978-05-26
GB1535641A (en) 1978-12-13
FR2369881B1 (enExample) 1979-04-27
US4068019A (en) 1978-01-10
DE2744752A1 (de) 1978-05-11
JPS5337708B2 (enExample) 1978-10-11

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Legal Events

Date Code Title Description
ST Notification of lapse