FR2369881A1 - Procede et dispositif de revetement par centrifugation permettant d'eviter les accumulations laterales - Google Patents
Procede et dispositif de revetement par centrifugation permettant d'eviter les accumulations lateralesInfo
- Publication number
- FR2369881A1 FR2369881A1 FR7729877A FR7729877A FR2369881A1 FR 2369881 A1 FR2369881 A1 FR 2369881A1 FR 7729877 A FR7729877 A FR 7729877A FR 7729877 A FR7729877 A FR 7729877A FR 2369881 A1 FR2369881 A1 FR 2369881A1
- Authority
- FR
- France
- Prior art keywords
- coating
- accumulations
- centrifugation
- substrate
- avoid lateral
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
- B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
- B05D1/005—Spin coating
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
Procédé et dispositif de revêtement d'un substrat par centrifugation. Le substrat 14 à revêtir est entouré d'un cadre 26 dont la hauteur est telle que la surface supérieure du cadre est surélevée par rapport à la surface superieure du substrat. Le matériau à déposer provient d'une source 26 et est appliqué par une conduite 24 sur le substrat, pendant que celui-ci est entraîné en rotation par un moteur 20. La presence du cadre évite les accumulations latérales de matériau de revêtement. Procédé et dispositif utilisables notamment dans la fabrication de pastilles semi-conductrices.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/739,756 US4068019A (en) | 1976-11-08 | 1976-11-08 | Spin coating process for prevention of edge buildup |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2369881A1 true FR2369881A1 (fr) | 1978-06-02 |
FR2369881B1 FR2369881B1 (fr) | 1979-04-27 |
Family
ID=24973654
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7729877A Granted FR2369881A1 (fr) | 1976-11-08 | 1977-09-28 | Procede et dispositif de revetement par centrifugation permettant d'eviter les accumulations laterales |
Country Status (6)
Country | Link |
---|---|
US (1) | US4068019A (fr) |
JP (1) | JPS5358768A (fr) |
DE (1) | DE2744752C2 (fr) |
FR (1) | FR2369881A1 (fr) |
GB (1) | GB1535641A (fr) |
IT (1) | IT1115743B (fr) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4201149A (en) * | 1974-12-17 | 1980-05-06 | Basf Aktiengesellschaft | Apparatus for spin coating in the production of thin magnetic layers for magnetic discs |
US4190015A (en) * | 1977-12-08 | 1980-02-26 | Machine Technology, Inc. | Apparatus for dispensing liquid to spinning workpieces |
DE2944180A1 (de) * | 1979-11-02 | 1981-05-07 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Verfahren zum herstellen einer einen halbleiterkoerper einseitig bedeckenden isolierschicht |
JPS5695569U (fr) * | 1979-12-20 | 1981-07-29 | ||
US4536240A (en) * | 1981-12-02 | 1985-08-20 | Advanced Semiconductor Products, Inc. | Method of forming thin optical membranes |
US4548646A (en) * | 1982-11-15 | 1985-10-22 | Sermatech International Incorporated | Thixotropic coating compositions and methods |
US4794021A (en) * | 1986-11-13 | 1988-12-27 | Microelectronics And Computer Technology Corporation | Method of providing a planarized polymer coating on a substrate wafer |
US4795543A (en) * | 1987-05-26 | 1989-01-03 | Transducer Research, Inc. | Spin coating of electrolytes |
US5238713A (en) * | 1987-09-18 | 1993-08-24 | Tokyo Ohka Kogyo Co., Ltd. | Spin-on method and apparatus for applying coating material to a substrate, including an air flow developing and guiding step/means |
FR2636546B1 (fr) * | 1988-09-15 | 1991-03-15 | Sulzer Electro Tech | Procede et dispositif pour l'application uniformement reguliere d'une couche de resine sur un substrat |
US5294257A (en) * | 1991-10-28 | 1994-03-15 | International Business Machines Corporation | Edge masking spin tool |
DE4203913C2 (de) * | 1992-02-11 | 1996-09-19 | Fairchild Convac Gmbh Geraete | Verfahren und Vorrichtung zum Aufbringen und/oder zum partiellen Entfernen einer dünnen Schicht auf ein bzw. von einem Substrat |
US6977098B2 (en) * | 1994-10-27 | 2005-12-20 | Asml Holding N.V. | Method of uniformly coating a substrate |
US7018943B2 (en) | 1994-10-27 | 2006-03-28 | Asml Holding N.V. | Method of uniformly coating a substrate |
KR100370728B1 (ko) * | 1994-10-27 | 2003-04-07 | 실리콘 밸리 그룹, 인크. | 기판을균일하게코팅하는방법및장치 |
US7030039B2 (en) | 1994-10-27 | 2006-04-18 | Asml Holding N.V. | Method of uniformly coating a substrate |
DE19522004A1 (de) * | 1995-06-21 | 1997-01-02 | Inst Mikrotechnik Mainz Gmbh | Herstellungsverfahren von teilbeweglichen Mikrostrukturen auf der Basis einer trockenchemisch geätzten Opferschicht |
US5803968A (en) * | 1995-08-21 | 1998-09-08 | Schwartz; Vladimir | Compact disc spin coater |
WO1998018568A1 (fr) * | 1996-10-28 | 1998-05-07 | Robert Herpst | Procede de production de films minces et appareil correspondant |
US6054356A (en) * | 1996-12-10 | 2000-04-25 | Advanced Micro Devices, Inc. | Transistor and process of making a transistor having an improved LDD masking material |
US5840365A (en) * | 1997-02-07 | 1998-11-24 | The Fairchild Corporation | Method and apparatus for spin-coating compact discs |
US5916368A (en) * | 1997-02-27 | 1999-06-29 | The Fairchild Corporation | Method and apparatus for temperature controlled spin-coating systems |
US5908661A (en) * | 1997-05-30 | 1999-06-01 | The Fairchild Corporation | Apparatus and method for spin coating substrates |
US5916631A (en) * | 1997-05-30 | 1999-06-29 | The Fairchild Corporation | Method and apparatus for spin-coating chemicals |
JP2003524275A (ja) * | 2000-02-25 | 2003-08-12 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 円形の光学的記憶ディスクを製造する方法及び光学的記憶ディスク |
EP1492628A1 (fr) * | 2002-04-09 | 2005-01-05 | Danfoss A/S | Procede de distribution centrifuge d'eprouvettes physiologiques liquides |
CN101885216A (zh) * | 2009-05-14 | 2010-11-17 | 鸿富锦精密工业(深圳)有限公司 | 挠式模具的制造方法 |
US20230124666A1 (en) * | 2019-10-02 | 2023-04-20 | Soroosh Mahmoodi | Two-axis spin coating method and apparatus |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR793201A (fr) * | 1935-07-31 | 1936-01-20 | Hoh & Hahne | Perfectionnements apportés aux appareils centrifuges destinés à la répartition uniforme et au séchage de la couche sensible à la lumière, appliquée à l'état frais, sur des pierres, gravures et autres objets similaires |
GB449741A (en) * | 1935-05-29 | 1936-07-02 | Richard Walter Hoh | Improvements in or relating to centrifugal apparatus for applying light-sensitive layers and the like |
DE641582C (de) * | 1935-12-04 | 1937-02-05 | Hoh & Hahne | Vorrichtung zum Schleudern von photographischen Druckplatten u. dgl. |
US2580131A (en) * | 1947-02-25 | 1951-12-25 | Chandler & Price Co | Method and apparatus for coating a lithographic plate |
DE2634144A1 (de) * | 1975-07-29 | 1977-02-17 | Fuji Photo Film Co Ltd | Photographisches, lichtempfindliches material und spinnbeschichtungsverfahren zu seiner herstellung |
US4024835A (en) * | 1975-10-06 | 1977-05-24 | Hewlett-Packard Company | Spinner chuck for non-circular substrates |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR54387E (fr) * | 1944-09-01 | 1950-03-10 | Leitz Ernst Gmbh | Dispositif pour l'application de couches de revêtement sur des surfaces optiquement agissantes, notamment sur des surfaces de verre |
US3323491A (en) * | 1964-12-17 | 1967-06-06 | Stewart E Granick | Color spinner toy |
-
1976
- 1976-11-08 US US05/739,756 patent/US4068019A/en not_active Expired - Lifetime
-
1977
- 1977-09-21 GB GB39390/77A patent/GB1535641A/en not_active Expired
- 1977-09-22 JP JP11342877A patent/JPS5358768A/ja active Granted
- 1977-09-28 FR FR7729877A patent/FR2369881A1/fr active Granted
- 1977-10-05 DE DE2744752A patent/DE2744752C2/de not_active Expired
- 1977-10-25 IT IT28932/77A patent/IT1115743B/it active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB449741A (en) * | 1935-05-29 | 1936-07-02 | Richard Walter Hoh | Improvements in or relating to centrifugal apparatus for applying light-sensitive layers and the like |
FR793201A (fr) * | 1935-07-31 | 1936-01-20 | Hoh & Hahne | Perfectionnements apportés aux appareils centrifuges destinés à la répartition uniforme et au séchage de la couche sensible à la lumière, appliquée à l'état frais, sur des pierres, gravures et autres objets similaires |
DE641582C (de) * | 1935-12-04 | 1937-02-05 | Hoh & Hahne | Vorrichtung zum Schleudern von photographischen Druckplatten u. dgl. |
US2580131A (en) * | 1947-02-25 | 1951-12-25 | Chandler & Price Co | Method and apparatus for coating a lithographic plate |
DE2634144A1 (de) * | 1975-07-29 | 1977-02-17 | Fuji Photo Film Co Ltd | Photographisches, lichtempfindliches material und spinnbeschichtungsverfahren zu seiner herstellung |
US4024835A (en) * | 1975-10-06 | 1977-05-24 | Hewlett-Packard Company | Spinner chuck for non-circular substrates |
Also Published As
Publication number | Publication date |
---|---|
FR2369881B1 (fr) | 1979-04-27 |
IT1115743B (it) | 1986-02-03 |
US4068019A (en) | 1978-01-10 |
JPS5337708B2 (fr) | 1978-10-11 |
DE2744752A1 (de) | 1978-05-11 |
DE2744752C2 (de) | 1983-02-03 |
JPS5358768A (en) | 1978-05-26 |
GB1535641A (en) | 1978-12-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |